Plasma discharge reactor with flowing liquid and gas

US10610850B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10610850-B2
Application numberUS-201715837823-A
CountryUS
Kind codeB2
Filing dateDec 11, 2017
Priority dateMar 14, 2013
Publication dateApr 7, 2020
Grant dateApr 7, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The activation of the C—H bond using low temperature plasma with an inlet liquid stream such that value added products are formed effectively. An organic liquid (e.g., hexane which is immiscible with liquid water) is injected into a flowing gas (argon) stream followed by mixing with a liquid water stream. Thereafter, the mixture contacts a plasma region formed by a pulsed electric discharge. The plasma formed with the flowing liquid and gas between the two electrodes causes chemical reactions that generate various compounds.

First claim

Opening claim text (preview).

What is claimed is: 1. A reactor comprising: a tubular reactor body portion having one or more internal walls that define an internal cavity; at least one electrically-conductive inlet capillary having an inlet capillary body extending between a fluid-receiving tip and a fluid-injecting tip, wherein the fluid-receiving tip is positioned outside the internal cavity, and wherein the fluid-injecting tip is positioned inside the internal cavity; at least one electrically-conductive outlet capillary having an outlet capillary body extending between a fluid-collecting tip and a fluid-ejecting tip, wherein the fluid-collecting tip is positioned inside the internal cavity, and wherein the fluid-ejecting tip is positioned outside the internal cavity, the inlet capillary being aligned with the outlet capillary; the electrically-conductive inlet capillary having a first internal diameter, the tubular reactor body having a second internal diameter, and the electrically conductive outlet capillary having a third internal diameter, the third internal diameter being larger than the first internal diameter and smaller than the second internal diameter; a mixing chamber outside of the tubular reactor body having a gas inlet, a liquid inlet, and a mixed gas and liquid outlet, the mixed gas and liquid outlet being in fluid communication with the fluid-receiving tip of the electrically conductive inlet capillary; a power source supplying a voltage across the at least one electrically-conductive inlet capillary and the at least one electrically-conductive outlet capillary; wherein the fluid injecting tip is disposed relative to the fluid collecting tip to generate a flowing liquid film region on the one or more internal walls and a gas stream flowing through the flowing liquid film region, when a fluid is injected into the internal cavity via the at least one electrically conductive inlet capillary; wherein the fluid injecting tip is disposed relative to the fluid collecting tip to propagate a plasma discharge along the flowing liquid film region between the at least one electrically-conductive inlet capillary and the at least one electrically-conductive outlet capillary. 2. The reactor according to claim 1 , wherein the power source is adapted to provide a pulsed current between the at least one electrically-conductive inlet capillary and the at least one electrically-conductive outlet capillary. 3. The reactor according to claim 1 , wherein the power source is adapted to provide a D.C. current between the at least one electrically-conductive inlet capillary and the at least one electrically-conductive outlet capillary. 4. The reactor according to claim 1 , wherein the power source is adapted to provide an A.C. current between the at least one electrically-conductive inlet capillary and the at least one electrically-conductive outlet capillary. 5. The reactor according to claim 1 , wherein a gap separates the fluid-injecting tip and the fluid-collecting tip, wherein the gap has a length, and wherein a ratio of the voltage to the length is at least about 2.5×10 5 V/m. 6. The reactor according to claim 1 , wherein the body portion is cylindrical, wherein the body portion has a first diameter of from 1 mm to 1 cm, wherein the at least one electrically-conductive inlet capillary has a second diameter that is less than the first diameter, and wherein the at least one electrically-conductive outlet capillary has a third diameter that is greater than the second diameter and less than the first diameter. 7. A reactor system comprising: an electrically-conductive inlet capillary tube electrode for simultaneously charging a liquid and gas inside the electrode, the electrically-conductive inlet capillary tube electrode having a first internal diameter; a tubular plasma reactor having a second internal diameter and having one or more internal walls; an electrically conductive outlet capillary tube electrode having a third internal diameter, the third internal diameter being larger than the first internal diameter and smaller than the second internal diameter, the inlet capillary being aligned with the outlet capillary; a power source for supplying a voltage across the at least one electrically-conductive inlet capillary tube and the at least one electrically-conductive outlet capillary tube; a mixing chamber outside of the tubular reactor having a gas inlet, a liquid inlet, and a mixed gas and liquid outlet, the mixed gas and liquid outlet being in fluid communication with the electrically-conductive inlet capillary tube electrode being configured to inject a charged mixture comprising a liquid and a gas into the plasma reactor, the injecting of the charged liquid and gas generating a continuously flowing liquid film region on one or more internal walls, and a gas stream flowing along the flowing liquid film region, the injecting further propagating a plasma discharge channel pattern along the interface between the flowing liquid film region and the flowing gas stream inside the plasma reactor. 8. The reactor system of claim 7 , wherein the liquid comprises water and the reaction product comprises hydrogen peroxide. 9. The reactor system of claim 7 , wherein the power source provides a plasma discharge that is a pulsed discharge. 10. The reactor system of claim 7 , wherein at least one organic compound is injected with the liquid and the gas into the at least one electrically conductive inlet capillary tube electrode.

Assignees

Inventors

Classifications

  • Processes carried out in the presence of a plasma · CPC title

  • Details relating to the type of discharge · CPC title

  • Fertilisers containing other nitrates · CPC title

  • by oxidation reactions with formation of hydroxy groups · CPC title

  • B01J19/088Primary

    giving rise to electric discharges (for heating purposes H05B7/00; for the production of ozone C01B13/11, H01T19/00) · CPC title

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What does patent US10610850B2 cover?
The activation of the C—H bond using low temperature plasma with an inlet liquid stream such that value added products are formed effectively. An organic liquid (e.g., hexane which is immiscible with liquid water) is injected into a flowing gas (argon) stream followed by mixing with a liquid water stream. Thereafter, the mixture contacts a plasma region formed by a pulsed electric discharge. Th…
Who is the assignee on this patent?
Univ Florida State Res Found
What technology area does this patent fall under?
Primary CPC classification B01J19/088. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Apr 07 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).