Photosensitive resin composition and pattern forming process

Patent metadata

Field	Value
Publication number	US-11294284-B2
Application number	US-201916459905-A
Country	US
Kind code	B2
Filing date	Jul 2, 2019
Priority date	Jul 17, 2018
Publication date	Apr 5, 2022
Grant date	Apr 5, 2022

Abstract

A white photosensitive resin composition comprising (A) an acid crosslinkable group-containing silicone resin, (B) a photoacid generator, and (C) a white pigment has a sufficient reflectivity, good reliability with respect to adhesion and crack resistance, resolution, flexibility, and light resistance.

First claim

The invention claimed is:

1. A photosensitive resin composition comprising (A) an acid crosslinkable group-containing silicone resin, (B) a photoacid generator, and (C) a white pigment,
wherein component (A) contains a silicone resin comprising recurring units having the formulae (A1) to (A6):

wherein R 1 to R 4 are each independently a C 1 -C 20 monovalent hydrocarbon group which may contain a heteroatom, m is each independently an integer of 1 to 600, groups R 3 may be the same or different and groups R 4 may be the same or different when m is an integer of at least 2, a, b, c, d, e and f are numbers in the range: 0≤a≤1, 0≤b≤1, 0≤c≤1, 0≤d≤1, 0≤e≤1, 0≤f≤1, 0<c+d+e+f≤1, and a+b+c+d+e+f=1,
X 1 is a divalent group having the formula (X1):

wherein R 11 to R 14 are each independently a C 1 -C 20 monovalent hydrocarbon group which may contain a heteroatom, p is an integer of 1 to 600, groups R 13 may be the same or different and groups R 14 may be the same or different when p is an integer of at least 2, R 15 and R 16 are each independently hydrogen or methyl, x is each independently an integer of 0 to 7,
X 2 is a divalent group having the formula (X2):

wherein Y 1 is a single bond, methylene, propane-2,2-diyl, 1,1,1,3,3,3-hexafluoropropane-2,2-diyl or fluorene-9,9-diyl group, R 21 and R 22 are each independently a C 1 -C 4 alkyl or alkoxy group, groups R 21 may be the same or different when g is 2, groups R 22 may be the same or different when h is 2, R 23 and R 24 are each independently hydrogen or methyl, y is each independently an integer of 0 to 7, g and h are each independently 0, 1 or 2,
X 3 is a divalent group having the formula (X3):

wherein R 31 and R 32 are each independently hydrogen or methyl, z is each independently an integer of 0 to 7, and R 33 is a C 1 -C 8 divalent hydrocarbon group which may contain an ester bond or ether bond.

2. The photosensitive resin composition of claim 1 wherein the acid crosslinkable group is selected from epoxy, oxetane, and vinyl ether groups.

3. The photosensitive resin composition of claim 1 wherein 0<e+f≤1.

4. The photosensitive resin composition of claim 1 wherein the white pigment (C) has an average particle size of up to 1 μm.

5. The photosensitive resin composition of claim 1 wherein the white pigment (C) is titanium dioxide which is surface treated with at least one compound selected from the group consisting of hydrous oxides of Al, Si and Zr, polyols, and organosilicon compounds.

6. The photosensitive resin composition of claim 1 , containing 3 to 60% by weight of the white pigment (C).

7. The photosensitive resin composition of claim 1 , further comprising (D) a crosslinker.

8. The photosensitive resin composition of claim 1 , further comprising (E) an antioxidant.

9. The photosensitive resin composition of claim 1 , further comprising (F) a solvent.

10. A pattern forming process comprising the steps of:
(i) coating the photosensitive resin composition of claim 1 onto a substrate to form a photosensitive resin coating thereon,
(ii) exposing the photosensitive resin coating to radiation, and
(iii) developing the exposed resin coating in a developer.

Assignees

• Shinetsu Chemical Co

Inventors

• Maruyama Hitoshi
• Oowada Tamotsu

Classifications

• G03F7/0045

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

• G03F7/004 Primary

  Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title

• G03F7/0043

  Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof (G03F7/0044 takes precedence) · CPC title

• G03F7/075

  Silicon-containing compounds · CPC title

• G03F7/325

  Non-aqueous compositions · CPC title