Photosensitive resin composition, photosensitive resin film, photosensitive dry film, patterning process, display, and micro-led display
US-2025328074-A1 · Oct 23, 2025 · US
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Maruyama Hitoshi patents
Maruyama Hitoshi is listed as an inventor on 53 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Maruyama Hitoshi |
| Total patents | 53 |
| First publication | Jan 4, 2018 |
| Latest publication | Oct 23, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, pattern formation method
US-12448485-B2 · Oct 21, 2025 · US
Siloxane-modified polyester resin and cured product thereof
US-2025313664-A1 · Oct 9, 2025 · US
Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, and pattern forming process
US-2025298315-A1 · Sep 25, 2025 · US
Power supply control system and industrial vehicle
US-12420668-B2 · Sep 23, 2025 · US
Photosensitive resin composition, photosensitive resin film, photosensitive dry film, and pattern forming process
US-2025251665-A1 · Aug 7, 2025 · US
Photosensitive resin composition, photosensitive resin film, photosensitive dry film, and pattern formation method
US-2025237952-A1 · Jul 24, 2025 · US
Photosensitive resin composition, photosensitive resin film, photosensitive dry film, and pattern-forming process
US-2025155812-A1 · May 15, 2025 · US
Fluorene skeleton-containing polymer
US-2025115719-A1 · Apr 10, 2025 · US
Photosensitive resin composition and pattern forming process
US-2025102915-A1 · Mar 27, 2025 · US
Recent patents
Latest publications not already listed above.
Photosensitive resin composition, photosensitive resin film, photosensitive dry film, patterning process, and light emitting device
US-12216405-B2 · Feb 4, 2025 · US
Polymer, resin coating, and dry film
US-2024409694-A1 · Dec 12, 2024 · US
Silphenylene-skeleton-containing polymer, photosensitive resin composition, pattern formation method, and method for manufacturing optical semiconductor device
US-2024345481-A1 · Oct 17, 2024 · US
Photosensitive resin composition, photosensitive resin film, photosensitive dry film, and pattern formation method
US-2024288772-A1 · Aug 29, 2024 · US
Power supply control system and industrial vehicle
US-2024270117-A1 · Aug 15, 2024 · US
Photosensitive resin composition, photosensitive resin film, photosensitive dry film, and pattern formation method
US-2024210831-A1 · Jun 27, 2024 · US
Laminate, method for manufacturing laminate, and method for patterning
US-2024184206-A1 · Jun 6, 2024 · US
Photosensitive resin composition, photosensitive resin film, photosensitive dry film, and pattern formation method
US-2024160105-A1 · May 16, 2024 · US
Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device
US-11693317-B2 · Jul 4, 2023 · US
Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, and black matrix
US-11693318-B2 · Jul 4, 2023 · US
Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, pattern formation method
US-2023076103-A1 · Mar 9, 2023 · US
Photosensitive resin composition, photosensitive resin film, photosensitive dry film, patterning process, and light emitting device
US-2023030194-A1 · Feb 2, 2023 · US
Siloxane polymer containing isocyanuric acid and polyether skeletons, photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device
US-11548985-B2 · Jan 10, 2023 · US
Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, laminate, and pattern forming process
US-11526078-B2 · Dec 13, 2022 · US
Silicone structure-containing polymer, photosensitive resin composition, photosensitive resin coating, photosensitive dry film, laminate, and pattern forming process
US-11402756-B2 · Aug 2, 2022 · US
Epoxy-containing, isocyanurate-modified silicone resin, photosensitive resin composition, photosensitive dry film, laminate, and pattern forming process
US-11294282-B2 · Apr 5, 2022 · US
Photosensitive resin composition and pattern forming process
US-11294284-B2 · Apr 5, 2022 · US
Photosensitive resin composition, photosensitive dry film, and pattern forming process
US-11262655-B2 · Mar 1, 2022 · US
Photosensitive resin composition, photosensitive dry film, and pattern forming process
US-11187982-B2 · Nov 30, 2021 · US
Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device
US-11156919-B2 · Oct 26, 2021 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Shinetsu Chemical Co | 48 |
| Mitsubishi Electric Corp | 2 |
| Toyota Jidoshokki Kk | 2 |
| Shinetsu Chemical Co | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/0757 | 43 |
| G03F7/20 | 35 |
| C08G77/52 | 33 |
| G03F7/004 | 33 |
| G03F7/0045 | 30 |