Laser system and method forming a high purity fused silica glass sheet with micro-crenellations

US11274056B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11274056-B2
Application numberUS-201715678680-A
CountryUS
Kind codeB2
Filing dateAug 16, 2017
Priority dateAug 24, 2016
Publication dateMar 15, 2022
Grant dateMar 15, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A system and method for sintering a thin, high purity fused silica glass sheet having a thickness of 500 μm or less, includes a step of rastering a beam of a laser across a sheet of high purity fused silica soot; wherein a pattern of the rastering includes tightly spacing target locations on the sheet such that the laser sinters the soot and simultaneously forms tiny notches on a first major surface of the sheet when viewed in cross-section, wherein the tiny notches are crenellated such that at least some of the notches have generally flat bottom surfaces and at least some respective adjoining caps have generally plateau top surfaces offset from the bottom surfaces by steeply-angled sidewalls.

First claim

Opening claim text (preview).

What is claimed is: 1. A high purity fused silica glass sheet, comprising: a first major surface; a second major surface opposite the first major surface; at least 99.9 mole % silica, wherein the silica is at least generally amorphous, having less than 1% crystalline content by weight; and an average thickness between the first major surface and the second major surface of less than 500 um; wherein the first major surface, in cross section, has tiny notches along the first major surface, wherein at least ten of the tiny notches have: a depth that is at least 25 nm and no more than 1 um measured relative to a higher one of adjoining local caps on either side of the respective notch, a width between adjoining local caps that is at least 5 um, and a length of at least 500 um; wherein the tiny notches curve along the length thereof, and wherein the notches are crenellated such that at least some of the notches have generally flat bottom surfaces and at least some respective adjoining caps have generally plateau top surfaces offset from the bottom surfaces by steeply-angled sidewalls.

Assignees

Inventors

Classifications

  • Pure silica glass, e.g. pure fused quartz · CPC title

  • Ytterbium · CPC title

  • with more than 90% silica by weight, e.g. quartz {(C03C3/045 takes precedence)} · CPC title

  • Pure silica glass, e.g. pure fused quartz · CPC title

  • C03B19/066Primary

    for the production of quartz or fused silica articles (other processes specially adapted for the production of quartz or fused silica articles C03B20/00) · CPC title

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What does patent US11274056B2 cover?
A system and method for sintering a thin, high purity fused silica glass sheet having a thickness of 500 μm or less, includes a step of rastering a beam of a laser across a sheet of high purity fused silica soot; wherein a pattern of the rastering includes tightly spacing target locations on the sheet such that the laser sinters the soot and simultaneously forms tiny notches on a first major su…
Who is the assignee on this patent?
Corning Inc
What technology area does this patent fall under?
Primary CPC classification C03B19/066. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 15 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).