Tin or tin alloy plating solution

US11268203B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11268203-B2
Application numberUS-201816757872-A
CountryUS
Kind codeB2
Filing dateOct 23, 2018
Priority dateOct 24, 2017
Publication dateMar 8, 2022
Grant dateMar 8, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A tin or tin alloy plating solution includes: (A) a soluble salt containing at least a stannous salt; (B) an acid selected from an organic acid and an inorganic acid or a salt thereof; (C) a surfactant; and (D) a leveling agent. In addition, the surfactant contains polyoxyethylene polyoxypropylene alkylamine, an alkyl group of the polyoxyethylene polyoxypropylene alkylamine is CaH2a+1 (where a is 12 to 18). Further, in a case where a number of a functional group of polyoxypropylene of the polyoxyethylene polyoxypropylene alkylamine is set as p and a number of a functional group of polyoxyethylene of the polyoxyethylene polyoxypropylene alkylamine is set as q, the sum of p and q (p+q) is 8 to 21, and a ratio of p to q (p/q) is 0.1 to 1.6.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of forming a tin or tin alloy deposition layer comprising the step of forming a tin or tin alloy deposition layer on a substrate with vias having different via diameters by using a tin or tin alloy plating solution, wherein the tin or tin alloy plaiting solution comprises: (A) a soluble salt containing at least a stannous salt; (B) an acid selected from an organic acid and an inorganic acid or a salt thereof; (C) a surfactant; and (D) a leveling agent, wherein the surfactant contains polyoxyethylene polyoxypropylene alkylamine selected from the group consisting of general formulae (1), (3) and (4): wherein R 1 represents C a H 2a−1 , a is an integer from 12 to 18, p and q are each 1 or more, a sum of p and q is an integer from 8 to 21, and a ratio of p to q, p/q, is 0.1 to 1.6, the leveling agent is made of a first leveling agent and a second leveling agent, the first leveling agent is one or more selected from a group consisting of aliphatic aldehyde, aromatic aldehyde, aliphatic ketone and aromatic ketone, and the second leveling agent is α,β-unsaturated carboxylic acid or α,β-unsaturated carboxylic acid amide, or a salt thereof. 2. The method of forming a tin or tin alloy plating deposition layer according to claim 1 , wherein the tin or tin alloy plating solution further comprises two or more of: a surfactant other than the surfactant; an antioxidant; and an alcohol having 1 to 3 carbon atoms. 3. A method for forming a bump comprising the step of performing a reflow process on the tin or tin alloy plating deposition layer formed by the method of forming a tin or tin alloy deposition layer according to claim 1 . 4. A method for producing a circuit board using the bump formed by the method according to claim 3 . 5. A method for forming a bump performing a reflow process comprising the step of performing a reflow process on the tin or tin alloy plating deposition layer formed by the method of forming a tin or tin alloy deposition layer according to claim 2 . 6. A method for producing a circuit board using the bump formed by the method according to claim 5 . 7. The method of forming a tin or tin alloy deposition layer according to claim 1 , wherein the tin or tin alloy deposition layer is formed by electroplating under a single current density. 8. The method of forming a tin or tin alloy deposition layer according to claim 1 , wherein the polyoxyethylene polyoxypropylene alkylamine is selected from the group consisting of general formulae (1) and (3).

Assignees

Inventors

Classifications

  • Multiple bumps having different sizes · CPC title

  • of bump connectors, dummy bumps or thermal bumps · CPC title

  • Electroplating characterised by the article coated · CPC title

  • Transferring metal or conductive material other than a circuit pattern, e.g. bump, solder, printed component · CPC title

  • by electroless plating (adhesives therefor H05K3/387) · CPC title

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What does patent US11268203B2 cover?
A tin or tin alloy plating solution includes: (A) a soluble salt containing at least a stannous salt; (B) an acid selected from an organic acid and an inorganic acid or a salt thereof; (C) a surfactant; and (D) a leveling agent. In addition, the surfactant contains polyoxyethylene polyoxypropylene alkylamine, an alkyl group of the polyoxyethylene polyoxypropylene alkylamine is CaH2a+1 (where a …
Who is the assignee on this patent?
Mitsubishi Materials Corp
What technology area does this patent fall under?
Primary CPC classification C25D3/32. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 08 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).