Chemical control features in wafer process equipment

Patent metadata

Field	Value
Publication number	US-11264213-B2
Application number	US-201916511990-A
Country	US
Kind code	B2
Filing date	Jul 15, 2019
Priority date	Sep 21, 2012
Publication date	Mar 1, 2022
Grant date	Mar 1, 2022

Abstract

Gas distribution assemblies are described including an annular body, an upper plate, and a lower plate. The upper plate may define a first plurality of apertures, and the lower plate may define a second and third plurality of apertures. The upper and lower plates may be coupled with one another and the annular body such that the first and second apertures produce channels through the gas distribution assemblies, and a volume is defined between the upper and lower plates.

First claim

What is claimed is:

1. A gas distribution assembly, comprising:
an annular body characterized by an inner annular wall located at an inner diameter, an outer annular wall located at an outer diameter, an upper surface defining an upper recess, and a lower surface defining a lower recess;
an upper plate coupled with the annular body along the upper recess of the upper surface of the annular body and defining a top surface of the gas distribution assembly, wherein the upper plate defines a plurality of first apertures, and wherein the upper plate defines a first recessed volume within a surface of the upper plate and about the first apertures;
an intermediate plate coupled with the upper plate along the surface of the upper plate defining the first recessed volume, wherein the intermediate plate couples with the upper plate to isolate the first recessed volume from the first apertures, wherein the intermediate plate defines a plurality of second apertures and a plurality of third apertures, wherein the plurality of second apertures are axially aligned with the plurality of first apertures, and wherein all third apertures of the plurality of third apertures are fluidly coupled with the first recessed volume; and
a lower plate coupled with the lower recess of the annular body and the intermediate plate and contacting the intermediate plate, wherein the lower plate defines a plurality of fourth apertures, a plurality of fifth apertures, and a plurality of sixth apertures, wherein the plurality of fourth apertures are axially aligned with the plurality of first apertures and the plurality of second apertures, wherein the plurality of fifth apertures are axially aligned with the plurality of third apertures, and wherein the upper plate, the intermediate plate, and the lower plate are coupled with one another such that the plurality of first apertures, the plurality of second apertures, and the plurality of fourth apertures form a plurality of first fluid channels extending vertically through the upper plate, the intermediate plate, and the lower plate in a straight vertical path through the entire gas distribution assembly.

2. The gas distribution assembly of claim 1 , wherein the plurality of third apertures and the plurality of fifth apertures form a plurality of second fluid channels extending through the intermediate plate and the lower plate.

3. The gas distribution assembly of claim 2 , wherein the plurality of sixth apertures form a plurality of third fluid channels extending through the lower plate.

4. The gas distribution assembly of claim 3 , wherein the plurality of first fluid channels, the plurality of second fluid channels, and the plurality of third fluid channels are fluidly isolated from one another.

5. The gas distribution assembly of claim 1 , wherein the intermediate plate and the lower plate define a second recessed volume between the intermediate plate and the lower plate.

6. The gas distribution assembly of claim 5 , wherein the plurality of sixth apertures provide fluid access from the second volume.

7. The gas distribution assembly of claim 1 , wherein each aperture of the plurality of sixth apertures comprise at least three sections of different shape or diameter.

8. A gas distribution assembly, comprising:
an annular body characterized by an inner annular wall located at an inner diameter, an outer annular wall located at an outer diameter, an upper surface defining an upper recess, and a lower surface defining a lower recess;
an upper plate coupled with the annular body along the upper recess of the upper surface of the annular body and defining a top surface of the gas distribution assembly, wherein the upper plate defines a first recessed volume from a surface of the upper plate opposite a surface defining the top surface of the gas distribution assembly, and wherein the upper plate defines a plurality of first apertures;
an intermediate plate coupled with the upper plate, wherein the intermediate plate defines a plurality of second apertures and a plurality of third apertures, and wherein each aperture of the plurality of second apertures align with an aperture of the plurality of first apertures of the upper plate; and
a lower plate coupled with the lower recess of the annular body and the intermediate plate, wherein the lower plate is in contact with the intermediate plate, the lower plate defining:
a plurality of fourth apertures that are axially aligned with the plurality of first apertures of the upper plate and the plurality of second apertures of the intermediate plate to form a first set of fluid channels through the upper plate, the intermediate plate, and the lower plate, wherein the first set of fluid channels extend vertically in a direct path through the gas distribution assembly from a top surface of the gas distribution assembly through a bottom surface of the gas distribution assembly,
a plurality of fifth apertures that align with the plurality of third apertures of the intermediate plate to form a second set of fluid channels through the intermediate plate and the lower plate, wherein the second set of fluid channels are fluidly isolated from the first set of fluid channels, and
a plurality of sixth apertures that form a third set of fluid channels through the lower plate, wherein the third set of fluid channels are fluidly isolated from the first set of fluid channels and the second set of fluid channels.

9. The gas distribution assembly of claim 8 , wherein each aperture of the plurality of sixth apertures comprise at least three sections of different shape or diameter.

10. The gas distribution assembly of claim 8 , wherein the lower plate includes an orientation of the plurality of fourth apertures, the plurality of fifth apertures, and the plurality of sixth apertures such that a majority of fourth apertures of the plurality of fourth apertures are each surrounded by at least four fifth apertures of the plurality of fifth apertures.

11. The gas distribution assembly of claim 10 , wherein the majority of fourth apertures of the plurality of fourth apertures are also each surrounded by at least four of the sixth apertures of the plurality of sixth apertures.

12. The gas distribution assembly of claim 11 , wherein the fifth apertures are located around the fourth apertures with centers of the fifth apertures at about 90° intervals from one another about a center of the fourth apertures, and wherein the sixth apertures are located around the fourth apertures with centers of the sixth apertures at about 90° intervals from one another about the center of the fourth apertures and offset from the fifth apertures by about 45°.

13. The gas distribution assembly of claim 11 , wherein the fifth apertures are located around the fourth apertures with centers of the fifth apertures at about 60° intervals from one another about a center of the fourth apertures, and wherein the sixth apertures are located around the fourth apertures with centers of the sixth apertures at about 60° intervals from one another about the center of the fourth apertures and offset from the fifth apertures by about 30°.

14. The gas distribution assembly of claim 8 , wherein each aperture of the plurality of third apertures extends from the first recessed volume of the upper plate.

15. The gas distribution assembly of claim 8 , wherein the intermediate plate defines a second recessed volume along a surface opposite a surface in contact with the upper plate, wherein the second recessed volume extends about each of the second apertures and each of the third apertures.

16. The gas distribution assembly

Assignees

• Applied Materials Inc

Inventors

• Liang Qiwei
• Chen Xinglong
• Chuc Kien
• Lubomirsky Dmitry
• Park Soonam
• Yang Jang-Gyoo
• Venkataraman Shankar
• Tran Toan
• Hinckley Kimberly
• Garg Saurabh

Classifications

• H10P72/0421

  for drying etching · CPC title

• H10P50/242 Primary

  of Group IV materials · CPC title

• C23C16/452

  by activating reactive gas streams before {their} introduction into the reaction chamber, e.g. by {ionisation} or addition of reactive species · CPC title

• H01J37/32449 Primary

  Gas control, e.g. control of the gas flow · CPC title

• C23C16/50

  using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} · CPC title