Substrate Processing Method, Apparatus, and System
US-2024363405-A1 · Oct 31, 2024 · US
Method and apparatus for etching
US8937017B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8937017-B2 |
| Application number | US-69677310-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 29, 2010 |
| Priority date | Jan 31, 2009 |
| Publication date | Jan 20, 2015 |
| Grant date | Jan 20, 2015 |
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Abstract
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Embodiments of the invention relate to a substrate etching method and apparatus. In one embodiment, a method for etching a substrate in a plasma etch reactor is provided that include flowing a backside process gas between a substrate and a substrate support assembly, and cyclically etching a layer on the substrate.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for etching a substrate in a plasma etch reactor comprising. flowing O 2 gas out from between an edge of a substrate and a substrate support assembly and into a plasma processing chamber; cyclically etching a silicon layer on the substrate in the plasma processing chamber in the presence of the O 2 gas, wherein cyclically etching the silicon layer further comprises; at least one etch substep utilizing a plasma formed from a fluorine-containing…
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Classifications
Electricity · mapped topic
Electricity · mapped topic
- H01J37/32449Primary
Electricity · mapped topic
- H10P50/242Primary
Electricity · mapped topic
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Frequently asked questions
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- What does patent US8937017B2 cover?
- Embodiments of the invention relate to a substrate etching method and apparatus. In one embodiment, a method for etching a substrate in a plasma etch reactor is provided that include flowing a backside process gas between a substrate and a substrate support assembly, and cyclically etching a layer on the substrate.
- Who is the assignee on this patent?
- Cheshire Alan, Detmar Stanley, Applied Materials Inc
- What technology area does this patent fall under?
- Primary CPC classification H01J37/32449. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Jan 20 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).