Plasma reactor with highly symmetrical four-fold gas injection

Patent metadata

Field	Value
Publication number	US-11244811-B2
Application number	US-201816226536-A
Country	US
Kind code	B2
Filing date	Dec 19, 2018
Priority date	Mar 15, 2013
Publication date	Feb 8, 2022
Grant date	Feb 8, 2022

Abstract

An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.

First claim

What is claimed is:

1. A plasma reactor, comprising:
a chamber having sidewalls;
a support to hold a workpiece for processing in the chamber;
an annular lid plate supported on the sidewalls, the annular lid plate including a first gas inlet, a second gas inlet, a first plurality of gas outlets coupled to the first gas inlet, and a second plurality of gas outlets coupled to the second gas inlet, the gas outlets of the first and second plurality of gas outlets being angularly spaced apart;
an annular window supported on the annular lid plate;
a gas distribution hub supported in an aperture in the annular window, the gas distribution hub having
a first plurality of gas supply ports and a second plurality of gas supply ports, each supply port of the first and second plurality of gas supply ports being angularly spaced apart,
a plurality of first gas injection passages coupled to the first plurality of gas supply ports and a plurality of second gas injection passages coupled to the second plurality of gas supply ports, each gas injection passage of the first gas injection passages and the second gas injection passages being open at a bottom surface of the hub, wherein the first plurality of gas injection passages are angularly spaced-apart arcuate channels at a first radial distance from a center of the hub, and the second plurality of gas injection passages are angularly spaced apart arcuate channels at a different second radial distance from the center of the hub, and

a plurality of radially extending conduits extending above the annular window to couple the first plurality of gas outlets to the first plurality of gas supply ports and couple the second plurality of gas outlets to the second plurality of gas supply ports.

2. The plasma reactor of claim 1 , wherein the conduits and the gas outlets of the first and second pluralities of gas outlets are spaced apart by equal angular intervals.

3. The plasma reactor of claim 1 , wherein the gas outlets of the first plurality of gas outlets are offset from each other by a half-circle arc length and the gas outlets of the second plurality of gas outlets are offset from each other by a half-circle arc length.

4. The plasma reactor of claim 3 , wherein the gas outlets of the first plurality of gas outlets are offset from gas outlets of the second plurality of gas outlets by a quarter-circle arc length.

5. The plasma reactor of claim 1 , wherein gas outlets of the first and second pluralities of gas outlets are arranged alternately along the annular lid plate.

6. The plasma reactor of claim 1 , wherein each gas flow path between the first gas inlet and each of the first plurality of gas outlets and each gas flow path between the second gas inlet and each of the second plurality of gas outlets have equal path length.

7. The plasma reactor of claim 1 , wherein the plurality of second gas injection passages are positioned radially outward of the plurality of first gas injection passages.

Assignees

• Applied Materials Inc

Inventors

• Rozenzon Yan
• Tantiwong Kyle
• Yousif Imad
• Knyazik Vladimir
• Keating Bojenna
• Banna Samer

Classifications

• C23C16/45578

  Elongated nozzles, tubes with holes · CPC title

• C23C16/45561

  Gas plumbing upstream of the reaction chamber · CPC title

• H01J37/3244 Primary

  Gas supply means · CPC title

• C23C16/4558

  Perforated rings · CPC title

• H01J37/32082

  Radio frequency generated discharge (H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence) · CPC title