Charged particle beam device

US11239052B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11239052-B2
Application numberUS-202016900176-A
CountryUS
Kind codeB2
Filing dateJun 12, 2020
Priority dateSep 26, 2013
Publication dateFeb 1, 2022
Grant dateFeb 1, 2022

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

First claim

Opening claim text (preview).

The invention claimed is: 1. A charged particle beam device for generating an image of a sample, comprising: a charged particle source for generating a charged particle beam; a deflector that scans the sample with the charged particle beam emitted from the charged particle source; a detector that detects a charged particle obtained upon irradiation of the sample with the charged particle beam; a computer system that processes an output of the detector and controls the deflector; and a graphical user interface that displays a setting field for setting a condition of beam irradiation, and also displays a display field for displaying at least one of layout data and the image generated based on the output of the detector, wherein: the graphical user interface is configured to allow a plurality of areas to be set on at least one of the layout data and the image, and the computer system controls the deflector so as to execute a beam scan based on the condition that has been set on the graphical user interface. 2. A charged particle beam device for generating an image of a sample, comprising: a charged particle source for generating a charged particle beam; a deflector that scans the sample with the charged particle beam emitted from the charged particle source; a detector that detects a charged particle obtained upon irradiation of the sample with the charged particle beam; one or more computer systems that controls the deflector and generates the image of the sample based on an output of the detector; and a graphical user interface that displays a parameter space and allows a user to select an operation parameter of the charged particle beam device, wherein: the parameter space includes a dimension, and the graphical user interface is configured to display an inside of the parameter space with the dimension in an identifiable manner in accordance with a signal of the image when the sample is scanned with the charged particle beam. 3. A charged particle beam device for generating an image of a sample, comprising: a charged particle source for generating a charged particle beam; a deflector that scans the sample with the charged particle beam emitted from the charged particle source; a detector that detects a charged particle obtained upon irradiation of the sample with the charged particle beam; one or more computer systems that controls the deflector and generates the image of the sample based on an output of the detector; and a graphical user interface that displays a setting field for setting a beam irradiation of the deflector, and also displays a display field for displaying at least one of layout data or the image generated based on the output of the detector, wherein: the graphical user interface is configured to allow a plurality of areas to be set on at least one of the layout data or the image, and the one or more computer systems controls the deflector based on a condition that has been set on the graphical user interface.

Assignees

Inventors

Classifications

  • H01J37/28Primary

    with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

  • characterised by the imaging method · CPC title

  • Arrangements for directing or deflecting the discharge along a desired path ({H01J37/045 take precedence;} lenses H01J37/10) · CPC title

  • Deflection calibration · CPC title

  • Pattern inspection · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11239052B2 cover?
The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation p…
Who is the assignee on this patent?
Hitachi High Tech Corp
What technology area does this patent fall under?
Primary CPC classification H01J37/28. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 01 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).