Beam irradiation device

Patent metadata

Field	Value
Publication number	US-11239042-B2
Application number	US-202017060242-A
Country	US
Kind code	B2
Filing date	Oct 1, 2020
Priority date	Mar 19, 2018
Publication date	Feb 1, 2022
Grant date	Feb 1, 2022

Abstract

The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.

First claim

The invention claimed is:

1. A beam irradiation device comprising:
a chip configured to emit an electron;
an aperture lens array formed of a plurality of electrodes having a plurality of openings configured to divide a beam emitted from the chip into a plurality of beams;
one or more power supplies configured to apply a voltage to at least one of the plurality of electrodes; and
a first lens arranged on a side closer to a sample than the aperture lens array or arranged between the chip and the aperture lens array, the first lens being configured to focus a beam emitted from the chip,
wherein an intensity of the first lens and an intensity of the aperture lens array are adjusted so that the beam divided after passing through the aperture lens array focus on a same plane perpendicular to an optical axis.

2. The beam irradiation device according to claim 1 ,
wherein a radius of an opening of an electrode disposed nearest to a chip side among the plurality of electrodes is not more than half of a radius of the opening of other electrodes.

3. The beam irradiation device according to claim 1 ,
wherein the aperture lens array includes at least two electrodes which are grounded to a ground and closer to the chip side than the electrode to which the voltage is applied.

4. The beam irradiation device according to claim 1 , further comprising a second lens configured to further focus the beam passing through the first lens,
wherein an intensity of the second lens is weakened as a focusing point of the first lens approaches the chip.

5. A beam irradiation device comprising:
a chip configured to emit an electron;
an aperture lens array formed of a plurality of electrodes having a plurality of openings configured to divide a beam emitted from the chip into a plurality of beams;
one or more power supplies configured to apply a voltage to at least one of the plurality of electrodes; and
a first lens arranged on a side closer to a sample than the aperture lens array or arranged between the chip and the aperture lens array, the first lens being configured to focus a beam emitted from the chip,
wherein an intensity of the first lens and an intensity of the aperture lens array are adjusted so that a cross position of the beam divided after passing through the aperture lens array is fixed.

Assignees

• Hitachi High Tech Corp

Inventors

• Ikegami Akira
• Kawamoto Yuta
• Suzuki Naomasa
• Yano Manabu
• Ebizuka Yasushi
• Ban Naoma

Classifications

• H01J2237/0492

  Lens systems · CPC title

• H01J2237/1532

  Astigmatism · CPC title

• H01J37/28 Primary

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J2237/1534

  Aberrations · CPC title

• H01J37/153

  Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators · CPC title