Metal mask substrate, metal mask substrate control method, metal mask, and metal mask production method
US-2018066352-A1 · Mar 8, 2018 · US
Metal plate for manufacturing deposition mask and manufacturing method for metal plate, and deposition mask and manufacturing method for deposition mask
US11237481B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11237481-B2 |
| Application number | US-201916578291-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 21, 2019 |
| Priority date | Nov 14, 2017 |
| Publication date | Feb 1, 2022 |
| Grant date | Feb 1, 2022 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
The metal plate includes a plurality of pits located on the surface of the metal plate. The manufacturing method for a metal plate for use in manufacturing of a deposition mask includes an inspection step of determining a quality of the metal plate based on a sum of volumes of a plurality of pits located at a portion of the surface of the metal plate.
First claim
Opening claim text (preview).
The invention claimed is: 1. A metal plate for use in manufacturing of a deposition mask, the metal plate including pits located on a surface of the metal plate; wherein the surface includes an inspection area having an area of 0.1 mm 2 or more and some of the pits are located in the inspection area; wherein the metal plate has a corrected pit volume density of 15,000 μm 3 /mm 2 or less, the corrected pit volume density being calculated by dividing a corrected pit volume by the area of the inspection area; wherein the corrected pit volume is a sum of volumes of parts of the pits located in the inspection area, said parts of the pits being 0.2 μm or more away from the surface in the thickness direction of the metal plate; wherein the volumes of said part of the pits are calculated based on results for depths of the pits located in the inspection area, the depths being measured with a laser microscope. 2. The metal plate according to claim 1 , wherein the corrected pit volume density is 10 μm 3 /mm 2 or more. 3. The metal plate according to claim 1 , wherein the metal plate is composed of an iron alloy containing nickel. 4. A deposition mask, comprising a metal plate including pits located on a surface; and through-holes formed in the metal plate, wherein the surface includes an inspection area having an area of 0.1 mm 2 or more and some of the pits are located in the inspection area; wherein the metal plate has a corrected pit volume density of 15,000 μm 3 /mm 2 or less, the corrected pit volume density being calculated by dividing a corrected pit volume by the area of the inspection area; wherein the corrected pit volume is a sum of volumes of parts of the pits located in the inspection area, said parts of the pits being 0.2 μm or more away from the surface in the thickness direction of the metal plate; wherein the volumes of said parts of the pits are calculated based on results for depths of the pits located in the inspection area, the depths being measured with a laser microscope. 5. The deposition mask according to claim 4 , wherein the corrected pit volume density is 10 μm 3 /mm 2 or more.
Assignees
Inventors
Classifications
Cold rolling · CPC title
containing Co and Ni · CPC title
Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00 · CPC title
containing nickel {(C22C38/105 takes precedence)} · CPC title
- C23C14/042Primary
using masks · CPC title
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Frequently asked questions
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- What does patent US11237481B2 cover?
- The metal plate includes a plurality of pits located on the surface of the metal plate. The manufacturing method for a metal plate for use in manufacturing of a deposition mask includes an inspection step of determining a quality of the metal plate based on a sum of volumes of a plurality of pits located at a portion of the surface of the metal plate.
- Who is the assignee on this patent?
- Dainippon Printing Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification C23C14/042. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Feb 01 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).