Charged particle beam apparatus

US11211224B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11211224-B2
Application numberUS-201817049353-A
CountryUS
Kind codeB2
Filing dateApr 26, 2018
Priority dateApr 26, 2018
Publication dateDec 28, 2021
Grant dateDec 28, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

To improve detection efficiency of secondary particles without increasing a size of a charged particle beam apparatus, a charged particle beam apparatus according to the invention includes: a charged particle beam source configured to irradiate a sample with a primary particle beam; a scanning deflector configured to scan and deflect the primary particle beam to a desired position of the sample; and a detector configured to detect secondary particles emitted from the desired position. The charged particle beam apparatus further includes: a focusing lens electrode arranged coaxially with the primary particle beam and configured to generate a focusing electric field that is an electric field that focuses a trajectory of the secondary particles; and a mesh electrode configured to reduce leakage of the focusing electric field on a trajectory of the primary particle beam.

First claim

Opening claim text (preview).

The invention claimed is: 1. A charged particle beam apparatus, comprising: a charged particle beam source configured to irradiate a sample with a primary particle beam; a scanning deflector configured to scan and deflect the primary particle beam to a desired position of the sample; and a detector configured to detect secondary particles emitted from the desired position; wherein the charged particle beam apparatus further comprises: a focusing lens electrode arranged coaxially with the primary particle beam and configured to generate a focusing electric field that is an electric field that focuses a trajectory of the secondary particles; and a mesh electrode configured to reduce leakage of the focusing electric field on a trajectory of the primary particle beam. 2. The charged particle beam apparatus according to claim 1 , wherein the focusing lens electrode and the mesh electrode are arranged between the scanning deflector and the detector. 3. The charged particle beam apparatus according to claim 2 , wherein the mesh electrode is arranged at least one of between the focusing lens electrode and the detector, and between the focusing lens electrode and the scanning deflector. 4. The charged particle beam apparatus according to claim 3 , wherein the mesh electrode has a curved surface shape. 5. The charged particle beam apparatus according to claim 1 , wherein the focusing lens electrode and the mesh electrode are arranged between the scanning deflector and the sample. 6. The charged particle beam apparatus according to claim 5 , wherein the mesh electrode has a cylindrical shape or a truncated cone shape that forms a hole through which the primary particle beam passes. 7. The charged particle beam apparatus according to claim 6 , wherein the mesh electrode includes a surface arranged between the focusing lens electrode and the sample, and a surface arranged between the focusing lens electrode and the scanning deflector. 8. The charged particle beam apparatus according to claim 5 , wherein the focusing lens electrode and the mesh electrode are further arranged between the scanning deflector and the detector. 9. The charged particle beam apparatus according to claim 1 , wherein the focusing lens electrode has a cylindrical shape. 10. The charged particle beam apparatus according to claim 9 , wherein the focusing lens electrode is divided into a plurality along a circumferential direction. 11. The charged particle beam apparatus according to claim 1 , wherein the focusing lens electrode and the mesh electrode are electrically insulated from each other, and a voltage is independently applied to each of the focusing lens electrode and the mesh electrode. 12. The charged particle beam apparatus according to claim 1 , wherein the detector includes an upper detector that detects secondary particles passing through a hole of a diaphragm, and a lower detector that detects secondary particles colliding with the diaphragm, and the charged particle beam apparatus further comprises a display device on which a GUI including an adjustment unit that adjusts an amount of the secondary particles detected by the upper detector and a display unit that displays an image formed based on detection by the upper detector and the lower detector is displayed.

Assignees

Inventors

Classifications

  • Detector devices with moving charges in electric or magnetic fields · CPC title

  • electrostatic · CPC title

  • Scanning means · CPC title

  • H01J37/244Primary

    Detectors; Associated components or circuits therefor · CPC title

  • Bottom of trenches or holes · CPC title

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What does patent US11211224B2 cover?
To improve detection efficiency of secondary particles without increasing a size of a charged particle beam apparatus, a charged particle beam apparatus according to the invention includes: a charged particle beam source configured to irradiate a sample with a primary particle beam; a scanning deflector configured to scan and deflect the primary particle beam to a desired position of the sample…
Who is the assignee on this patent?
Hitachi High Tech Corp
What technology area does this patent fall under?
Primary CPC classification H01J37/244. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 28 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).