Methods of generating drop patterns, systems for shaping films with the drop pattern, and methods of manufacturing an article with the drop pattern

Patent metadata

Field	Value
Publication number	US-11209730-B2
Application number	US-201916353433-A
Country	US
Kind code	B2
Filing date	Mar 14, 2019
Priority date	Mar 14, 2019
Publication date	Dec 28, 2021
Grant date	Dec 28, 2021

Abstract

One embodiment is a method that includes generating drop pattern information. The method may comprise receiving pattern information. The pattern information may include one or both of: a substrate pattern of a representative substrate; and a template pattern of a representative template. The method may further comprise receiving offset information about a particular substrate that is representative of a measured state of the particular substrate relative to a reference state. The drop pattern information may represent a plurality of positions to place droplets of formable material on the particular substrate. The method may further comprise outputting the drop pattern information that is representative of the formable material that fills a volume between the template and the particular substrate that is in the measured state and the formable material does not spread into a border region at an edge of the particular substrate.

First claim

What is claimed is:

1. A method comprising:
receiving pattern information that includes one or both of:
a substrate pattern of a representative substrate; and
a template pattern of a representative template;

receiving offset information about a particular substrate that is representative of a measured state of multiple of fields on the particular substrate relative to a reference state;
wherein drop pattern information represents a plurality of positions to place droplets of formable material onto a particular partial field of the particular substrate;
generating the drop pattern information that is representative of the formable material that fills a volume between a template and the particular substrate that is in the measured state and the formable material does not spread into a border region at an edge of the particular substrate; and
depositing the formable material onto the particular partial field of the particular substrate based on the drop pattern information.

2. The method according to claim 1 , wherein the measured state includes information that is representative of a measured offset of the substrate pattern on the particular substrate relative to a reference position of the substrate pattern on the representative substrate.

3. The method according to claim 2 , wherein the measured offset includes one or more of a distance along a first axis, a distance along a second axis and angle of rotation that are representative of the measured offset of the substrate pattern to the reference position.

4. The method according to claim 1 , wherein the measured state includes information that is representative of dimensions of a non-yielding peripheral portion of the particular substrate.

5. The method according to claim 4 , wherein the measured state includes one or more of: a radius, an eccentricity, an out-of-roundness, a width of the border region, an inner border region profile.

6. The method according to claim 1 , wherein the pattern information includes pattern layout information that is representative of:
a division of the representative substrate into a plurality of full fields and a plurality of partial fields that surround the plurality of full fields and each partial field is bounded by the border region and by one or more of the full fields;
wherein each full field among the plurality of full fields represents a particular portion of the particular substrate that is to be imprinted with the template; and
wherein each partial field among the plurality of partial fields represents a particular portion of the particular substrate that is to be imprinted with a portion of the template that intersects with the border region.

7. The method according to claim 6 , wherein the generating the drop pattern information comprises:
generating a full field drop pattern that represents a plurality of positions to place droplets of the formable material on a representative full field that fills a volume between the template and the representative full field and the formable material does not spread beyond the representative full field during imprinting; and
generating a plurality of partial field drop patterns, wherein each partial field drop pattern is generated by modifying the full field drop pattern based on the offset information to determine the intersection of the border region of the particular substrate with each partial field drop pattern.

8. The method according to claim 7 , wherein modifying the full field drop pattern to generate each partial drop pattern includes cropping the full field drop pattern at the intersection of the border region with each partial field on the particular substrate.

9. The method according to claim 8 , wherein modifying the full field drop pattern to generate each partial drop pattern further includes, in a region of the partial field that is adjacent to the border region, one or more of: adding droplets; removing droplets; and moving droplets.

10. The method according to claim 1 , wherein the pattern information includes pattern layout information that is representative of:
a division of the representative substrate into a plurality of full fields and a plurality of partial fields that surround the plurality of full fields and are bounded one side by intersection of the border region and by one or more of the full fields;
wherein each full field among the plurality of full fields has a similar full pattern; and
wherein each partial field among the plurality of partial fields represents a particular portion of the particular substrate that has a portion of the full pattern that intersects with the border region.

11. The method according to claim 10 , wherein the generating the drop pattern information comprises:
generating a full field drop pattern that represents a plurality of positions to place droplets of the formable material on a representative full field that fills a volume between the template and the representative full field; and
generating a plurality of partial field drop patterns, wherein each partial field drop pattern is generated by modifying the full field drop pattern based on the offset information to determine the intersection of the border region of the particular substrate with each partial field drop pattern;
wherein the formable material does not spread into the border region during imprinting.

12. The method according to claim 11 , wherein modifying the full field drop pattern to generate each partial drop pattern includes cropping the full field drop pattern at the intersection of the border region with each partial field on the particular substrate.

13. The method according to claim 12 , wherein modifying the full field drop pattern to generate each partial drop pattern further includes, in a region of the partial field that is adjacent to the border region, one or more of: adding droplets; removing droplets; and moving droplets.

14. The method according to claim 1 , wherein the substrate pattern is topography of the substrate to which the template is aligned during an imprinting process and the offset information includes a position of the substrate topography relative to one of a center of the particular substrate and a center of a layer on the substrate.

15. The method according to claim 1 , wherein the offset information is based on alignments of the template with the substrate pattern of the particular substrate in a plurality of full fields.

16. The method according to claim 1 , wherein the template pattern is featureless.

17. The method according to claim 1 , wherein the measured state includes information that is representative of a measured extent of a topmost film on the particular substrate relative to a reference edge of the representative substrate.

18. A method of manufacturing articles using the method of claim 1 , the method of manufacturing articles comprising:
contacting the formable material with the template;
curing the formable material under the template so as to form cured formable material on the substrate; and
processing the substrate with the cured formable material so as to manufacture the articles.

19. A system for shaping a film on a substrate comprising:
a processor configured to generate drop pattern information, comprising:
receiving pattern information that includes one or both of:
a substrate pattern of a representative substrate; and
a template pattern of a representative template;

receiving offset information about the particular substrate that is representative of a measured state of multiple of fields on the

Assignees

• Canon Kk

Inventors

• Simpson Logan L
• Burns Steven Wayne
• Battin Jason
• Khusnatdinov Niyaz
• Jones Christopher Ellis
• Cone Craig William
• Zhang Wei
• Irving James W

Classifications

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• B29C59/022

  characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor · CPC title

• B29C35/0805

  using electromagnetic radiation · CPC title