Apparatus for producing conditioned water

Patent metadata

Field	Value
Publication number	US-11198626-B2
Application number	US-201716497976-A
Country	US
Kind code	B2
Filing date	Sep 12, 2017
Priority date	Mar 30, 2017
Publication date	Dec 14, 2021
Grant date	Dec 14, 2021

Abstract

An apparatus for producing conditioned water configured to add a pH adjuster and/or a redox potential regulator to ultrapure water to produce conditioned water, the generator including: a chemical tank configured to store a chemical solution containing the pH adjuster and/or the redox potential regulator; a chemical injection pipe configured to inject the chemical solution in the chemical tank into the ultrapure water; and a degassing device configured to degas the chemical solution injected into the ultrapure water. When producing conditioned water useful as wash water for semiconductor wafers by adding a pH adjuster and/or a redox potential regulator into ultrapure water, the present invention can solve problems such as incorporation of DO from the chemical solution, injection failure and measurement failure of the flow meter due to foaming of the chemical solution, thereby enabling stable production of conditioned water with a low DO concentration and high water quality.

First claim

The invention claimed is:

1. An apparatus for producing conditioned water configured to add a pH adjuster and/or a redox potential regulator to ultrapure water to produce conditioned water, comprising:
a chemical tank configured to store a chemical solution containing the pH adjuster and/or the redox potential regulator;
a chemical injection pipe configured to inject the chemical solution in the chemical tank into the ultrapure water;
a degassing device configured to degas the chemical solution injected into the ultrapure water, and
a return pipe configured to return part of the chemical solution degassed by the degassing device to the chemical tank.

2. The apparatus for producing conditioned water according to claim 1 , wherein
the degassing device is provided in the chemical injection pipe, and
the chemical injection pipe comprises a chemical injection pump and a flow meter on a downstream side of the degassing device.

3. The apparatus for producing conditioned water according to claim 1 , wherein
the chemical tank is configured to store the chemical solution containing the pH adjuster and the pH adjuster is hydrochloric acid, acetic acid, nitric acid, phosphoric acid, sulfuric acid, hydrofluoric acid, ammonia, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, or ammonium carbonate.

4. The apparatus for producing conditioned water according to claim 1 , wherein
the chemical tank is configured to store the chemical solution containing the redox potential regulator and the redox potential regulator is hydrogen peroxide or nitric acid.

5. The apparatus for producing conditioned water according to claim 1 , wherein
the apparatus is configured to produce the conditioned water, so as to be useful as wash water or rinse water for semiconductor wafers.

6. The apparatus for producing conditioned water according to claim 1 , further comprising:
a water supply pipe configured to supply the ultrapure water to a use place, wherein
the chemical injection pipe is connected to the water supply pipe.

7. An apparatus for producing conditioned water configured to add a pH adjuster and/or a redox potential regulator to ultrapure water to produce conditioned water, comprising:
a chemical tank configured to store a chemical solution containing the pH adjuster and/or the redox potential regulator;
a chemical injection pipe attached to the chemical tank and configured to inject the chemical solution in the chemical tank into the ultrapure water; and
a degassing device attached to the chemical injection pipe and configured to degas the chemical solution injected into the ultrapure water,
wherein the chemical injection pipe includes a chemical injection pump and a flow meter on a downstream side of the degassing device.

8. An apparatus for producing conditioned water configured to add a pH adjuster and/or a redox potential regulator to ultrapure water to produce conditioned water, comprising:
a chemical tank configured to store a chemical solution containing the pH adjuster and/or
the redox potential regulator;
a water supply pipe through which the ultrapure water flows;
a chemical injection pipe arranged between the chemical tank and the water supply pipe, and configured to inject the chemical solution in the chemical tank into the water supply pipe;
a degassing device disposed in the chemical injection pipe and configured to degas the chemical solution injected into the ultrapure water; and
another degassing device disposed in the water supply pipe on a downstream side of a point where the chemical injection pipe is attached to the water supply pipe, configured to adjust dissolved oxygen in the ultrapure water.

Assignees

• Kurita Water Ind Ltd

Inventors

• Masaoka Tooru

Classifications

• H10P70/15

  by wet cleaning only (H10P70/52 takes precedence) · CPC title

• H10P52/00

  Grinding, lapping or polishing of wafers, substrates or parts of devices · CPC title

• B01F35/2111

  Flow rate · CPC title

• B01F25/50

  Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle · CPC title

• C02F1/70

  by reduction {(C02F1/4676 takes precedence)} · CPC title