Ultrapure water production system, ultrapure water production feed system, and method for cleaning thereof

US10138149B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10138149-B2
Application numberUS-201414906441-A
CountryUS
Kind codeB2
Filing dateJul 22, 2014
Priority dateJul 24, 2013
Publication dateNov 27, 2018
Grant dateNov 27, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Contaminants present inside an ultrapure water production system are prevented from being fed into a feed pipe connected to a water use point and, after sterilization cleaning, the system is prevented from being contaminated by contaminants captured on a microparticle removal membrane during sterilization cleaning. Ultrapure water having high quality is thereby fed to a water use point within a short period of time. An ultrapure water production system is provided with a tank, a pump, a heat exchanger, an ultraviolet device, an ion-exchange device, a first microparticle removal membrane device, and a second microparticle removal membrane device. Parts of sterilization water and flush water are fed into the first microparticle removal membrane device and discharged from a feedwater-side potion to a concentrated-water-side portion without permeating through a microparticle removal membrane thereof, and the remaining part of the water is passed through the second microparticle removal membrane device.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for cleaning an ultrapure water production feed system including an ultrapure water production system including a tank, a pump, a heat exchanger, an ultraviolet device, an ion-exchange device, and a first microparticle removal membrane device; a feed pipe through which ultrapure water produced in the ultrapure water production system in a predetermined amount of time is fed to a water use point; and a return pipe through which excess water passed from the water use point is returned to the ultrapure water production system, the method comprising: attaching a microparticle removal membrane to the first microparticle removal membrane device through which sterilization water and flushing water are passed and permeated, thereby producing a permeated water and cleaning the feed pipe and the return pipe by the permeated water; and passing the sterilization water and the flushing water through the tank, the pump, the heat exchanger, the ultraviolet device, the ion-exchange device, and the first microparticle removal membrane device without passing the sterilization water and the flushing water through the first microparticle removal membrane device; and conducting any one of cleaning steps described in (IV-1) to (IV-3); (IV-1) the sterilization water or the flush water is fed into the first microparticle removal membrane device and discharged from a feedwater-side potion of the first microparticle removal membrane device to a concentrated-water-side portion of the first microparticle removal membrane device without permeating through the microparticle removal membrane included in the first microparticle removal membrane device, and the remaining part of the sterilization water or the flush water is passed through the second microparticle removal membrane device, or (IV-2) a whole amount of the sterilization water or the flush water is passed through the second microparticle removal membrane device, and the microparticle removal membrane of the first microparticle removal membrane device is replaced with a sterilized microparticle removal membrane, or (IV-3) after the microparticle removal membrane of the first microparticle removal membrane device is replaced with a pipe, the sterilization water or the flush water is passed through the first microparticle removal membrane device, the remaining part of the sterilization water or the flush water is passed through the second microparticle removal membrane device, and the pipe of the first microparticle removal membrane device is subsequently replaced with a sterilized microparticle removal membrane; and passing water through the heat exchanger, the ultraviolet device, the ion-exchange device, and the first microparticle removal membrane device without passing the water through the second microparticle removal membrane device in order to produce ultrapure water, wherein sterilization water or flush water that permeated through the second microparticle removal membrane device is passed through the feed pipe and the return pipe and subsequently discharged to an outside of the ultrapure water production feed system and the ultrapure water production system. 2. An ultrapure water production feed system, comprising: an ultrapure water production system comprising: a tank, a pump, a heat exchanger, an ultraviolet device, an ion-exchange device, and a first microparticle removal membrane device; a second microparticle removal membrane device disposed parallel to the first microparticle removal membrane device; a feed pipe supplying ultrapure water produced in the ultrapure water production system in a predetermined amount of time to a water use point; a return pipe returning excess water from the water use point to the ultrapure water production system; a first blow pipe through which water passed through the second microparticle removal membrane device is discharged to an outside of the ultrapure water production system before merging with water passed through the first microparticle removal membrane device; and a channel-switch device switching such that water passes through only the first microparticle removal membrane device, through only the second microparticle removal membrane device, or through both the first microparticle removal membrane device and the second microparticle removal membrane device, wherein, when ultrapure water is produced, the water passes through only the first microparticle removal membrane device, and when the water production feed system including the feed pipe and the return pipe is cleaned by sterilization cleaning and flushing cleaning, the water passes through only the second microparticle removal membrane device, or through both the first microparticle removal membrane device and the second microparticle removal membrane device. 3. The ultrapure water production feed system according to claim 2 , further comprising a second blow pipe branched from the return pipe. 4. An ultrapure water production feed system, comprising: an ultrapure water production system comprising a tank, a pump, a heat exchanger, an ultraviolet device, an ion-exchange device, and a first microparticle removal membrane device; a second microparticle removal membrane device disposed parallel to the ion-exchange device and interposed between a final pump of the ultrapure water production system and the first microparticle removal membrane device such that water is diverted from the second microparticle removal membrane device; a feed pipe supplying ultrapure water produced in the ultrapure water production system in a predetermined amount of time to a water use point; a return pipe returning excess water from the water use point to the ultrapure water production system; a bypass pipe branching the first microparticle removal membrane device; a channel-switch device switching such that the water passes through only the first microparticle removal membrane device, through only the bypass pipe branching the first microparticle removal membrane device, or through both the first microparticle removal membrane device and the bypass pipe branching the first microparticle removal membrane device; and another channel-switch device switching such that the water is passed through only the ion-exchange device, through only the second microparticle removal membrane device, or through both the ion-exchange device and the second microparticle removal membrane device., wherein, when ultrapure water is produced, the water bypasses the second microparticle removal membrane device and the water passes through only the first microparticle removal membrane device, and when the water production feed system including the feed pipe and the return pipe is cleaned by sterilization cleaning and flushing cleaning, the water passes through the second microparticle removal membrane device and such that the water passes through only the bypass pipe branching the first microparticle removal membrane device, or the water passes through both the first microparticle removal membrane device and the bypass pipe branching the first microparticle removal membrane device. 5. The ultrapure water production feed system according to claim 4 , further comprising a first blow pipe through which the water passed through the second microparticle removal membrane device is discharged to an outside of the ultrapure water production system before merging with water passed through the ion-exchange device. 6. A method for cleaning an ultrapure water production system including a tank, a pump, a heat exchanger, an ultraviolet device, an ion-exchange device, and a first microparticle removal membrane device, a feed pipe supplying ultrapure water produced in the ultrapure water production system to a water use p

Assignees

Inventors

Classifications

  • Disinfection · CPC title

  • Sterilization · CPC title

  • Membrane cleaning or sterilisation {; Membrane regeneration} · CPC title

  • Irradiation devices or lamp constructions · CPC title

  • Treatment of partial or bypass streams · CPC title

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What does patent US10138149B2 cover?
Contaminants present inside an ultrapure water production system are prevented from being fed into a feed pipe connected to a water use point and, after sterilization cleaning, the system is prevented from being contaminated by contaminants captured on a microparticle removal membrane during sterilization cleaning. Ultrapure water having high quality is thereby fed to a water use point within a…
Who is the assignee on this patent?
Kurita Water Ind Ltd
What technology area does this patent fall under?
Primary CPC classification C02F9/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 27 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).