High resistivity iron-based, thermally stable magnetic material for on-chip integrated inductors
US-10002919-B2 · Jun 19, 2018 · US
US11107878B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11107878-B2 |
| Application number | US-201514666612-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 24, 2015 |
| Priority date | Mar 24, 2015 |
| Publication date | Aug 31, 2021 |
| Grant date | Aug 31, 2021 |
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An on-chip magnetic structure includes a palladium activated seed layer and a substantially amorphous magnetic material disposed onto the palladium activated seed layer. The substantially amorphous magnetic material includes nickel in a range from about 50 to about 80 atomic % (at. %) based on the total number of atoms of the magnetic material, iron in a range from about 10 to about 50 at. % based on the total number of atoms of the magnetic material, and phosphorous in a range from about 0.1 to about 30 at. % based on the total number of atoms of the magnetic material. The magnetic material can include boron in a range from about 0.1 to about 5 at. % based on the total number of atoms of the magnetic material.
Opening claim text (preview).
What is claimed is: 1. An on-chip magnetic structure, comprising: a semiconductor substrate comprising at least one of gallium arsenide, indium phosphide, and silicon carbide; a seed layer arranged directly on the semiconductor substrate, the seed layer comprising a nickel iron alloy; an activated layer arranged directly on the seed layer, the activated layer comprising palladium nanoparticles; and an electroless plated layer arranged directly on the palladium nanoparticles, the electroless plated layer comprising amorphous magnetic material disposed directly onto the palladium nanoparticles to form a Pd/NiFeP material comprising nickel in a range from 20 to 71 atomic % (at. %) based on a total number of atoms of the magnetic material, iron in a range from 10 to 50 at. % based on the total number of atoms of the magnetic material, and phosphorous in a range of about 20 at. % based on the total number of atoms of the magnetic material, wherein the palladium nanoparticles pin a microstructure of the amorphous magnetic material to maintain an amorphous state at a temperature of about 250° C.; wherein the amorphous magnetic material has a thickness in a range from about 50 nanometers to about 5 micrometers. 2. The on-chip magnetic structure of claim 1 , wherein the magnetic material further comprises boron in an amount in a range from about 0.1 to about 5 at. % based on the total number of atoms of the magnetic material. 3. The on-chip magnetic structure of claim 1 , wherein the magnetic material has a resistivity of at least 100 micro-ohm·centimeters (μΩ·cm). 4. The on-chip magnetic structure of claim 1 , wherein the on-chip magnetic structure is a yoke or a coil. 5. The on-chip magnetic structure of claim 1 , wherein the palladium nanoparticles are formed by immersing the seed layer in a palladium-containing solution in a presence of an acid. 6. The on-chip magnetic structure of claim 5 , wherein the palladium-containing solution is palladium sulfate. 7. The on-chip magnetic structure of claim 5 , wherein the acid is sulfuric acid, hydrochloric acid, nitric acid, or any combination thereof.
using a liquid · CPC title
the principal metal being a noble metal, e.g. gold · CPC title
based on metals, e.g. alloys, metal silicides (H10W20/4484 takes precedence) · CPC title
Inductive arrangements or effects of, or between, wiring layers · CPC title
Inductors · CPC title
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