High resistivity iron-based, thermally stable magnetic material for on-chip integrated inductors

US11107878B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11107878-B2
Application numberUS-201514666612-A
CountryUS
Kind codeB2
Filing dateMar 24, 2015
Priority dateMar 24, 2015
Publication dateAug 31, 2021
Grant dateAug 31, 2021

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

An on-chip magnetic structure includes a palladium activated seed layer and a substantially amorphous magnetic material disposed onto the palladium activated seed layer. The substantially amorphous magnetic material includes nickel in a range from about 50 to about 80 atomic % (at. %) based on the total number of atoms of the magnetic material, iron in a range from about 10 to about 50 at. % based on the total number of atoms of the magnetic material, and phosphorous in a range from about 0.1 to about 30 at. % based on the total number of atoms of the magnetic material. The magnetic material can include boron in a range from about 0.1 to about 5 at. % based on the total number of atoms of the magnetic material.

First claim

Opening claim text (preview).

What is claimed is: 1. An on-chip magnetic structure, comprising: a semiconductor substrate comprising at least one of gallium arsenide, indium phosphide, and silicon carbide; a seed layer arranged directly on the semiconductor substrate, the seed layer comprising a nickel iron alloy; an activated layer arranged directly on the seed layer, the activated layer comprising palladium nanoparticles; and an electroless plated layer arranged directly on the palladium nanoparticles, the electroless plated layer comprising amorphous magnetic material disposed directly onto the palladium nanoparticles to form a Pd/NiFeP material comprising nickel in a range from 20 to 71 atomic % (at. %) based on a total number of atoms of the magnetic material, iron in a range from 10 to 50 at. % based on the total number of atoms of the magnetic material, and phosphorous in a range of about 20 at. % based on the total number of atoms of the magnetic material, wherein the palladium nanoparticles pin a microstructure of the amorphous magnetic material to maintain an amorphous state at a temperature of about 250° C.; wherein the amorphous magnetic material has a thickness in a range from about 50 nanometers to about 5 micrometers. 2. The on-chip magnetic structure of claim 1 , wherein the magnetic material further comprises boron in an amount in a range from about 0.1 to about 5 at. % based on the total number of atoms of the magnetic material. 3. The on-chip magnetic structure of claim 1 , wherein the magnetic material has a resistivity of at least 100 micro-ohm·centimeters (μΩ·cm). 4. The on-chip magnetic structure of claim 1 , wherein the on-chip magnetic structure is a yoke or a coil. 5. The on-chip magnetic structure of claim 1 , wherein the palladium nanoparticles are formed by immersing the seed layer in a palladium-containing solution in a presence of an acid. 6. The on-chip magnetic structure of claim 5 , wherein the palladium-containing solution is palladium sulfate. 7. The on-chip magnetic structure of claim 5 , wherein the acid is sulfuric acid, hydrochloric acid, nitric acid, or any combination thereof.

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Classifications

  • using a liquid · CPC title

  • the principal metal being a noble metal, e.g. gold · CPC title

  • based on metals, e.g. alloys, metal silicides (H10W20/4484 takes precedence) · CPC title

  • Inductive arrangements or effects of, or between, wiring layers · CPC title

  • H10D1/20Primary

    Inductors · CPC title

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What does patent US11107878B2 cover?
An on-chip magnetic structure includes a palladium activated seed layer and a substantially amorphous magnetic material disposed onto the palladium activated seed layer. The substantially amorphous magnetic material includes nickel in a range from about 50 to about 80 atomic % (at. %) based on the total number of atoms of the magnetic material, iron in a range from about 10 to about 50 at. % ba…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification H10D1/20. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 31 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).