Multi-station chamber lid with precise temperature and flow control

Patent metadata

Field	Value
Publication number	US-11098404-B2
Application number	US-201916585463-A
Country	US
Kind code	B2
Filing date	Sep 27, 2019
Priority date	Sep 29, 2018
Publication date	Aug 24, 2021
Grant date	Aug 24, 2021

Abstract

Multi-station process chamber lids comprising a plurality of station openings are described. A station separation purge channel is around the station openings. A plurality of angular purge channels separate station openings from adjacent station openings. A lid support beam can compensate for deflection of the chamber lid body.

First claim

What is claimed is:

1. A processing chamber lid comprising:
a lid body having a top surface and a bottom surface;
a plurality of station openings in the range of 2 to 6, the station openings extending from the top surface through the lid body to the bottom surface, each opening having an outer peripheral edge, the station openings having at least two different diameters;
a station separation purge channel extending around the outer peripheral edge of each of the plurality of station openings, the station separation purge channel having a plurality of apertures extending from the station separation purge channel to the bottom surface of the lid body, the plurality of apertures spaced around the plurality of station openings; and
a plurality of angular purge channels extending from a center portion of the lid body to an outer peripheral edge portion of the lid body between adjacent station openings, each of the angular purge channels comprising a plurality of spaced apertures extending from the angular purge channel to the bottom surface of the lid body.

2. The processing chamber lid of claim 1 , wherein the station separation purge channel comprising a plurality of circular portions around the station openings.

3. The processing chamber lid of claim 1 , wherein the station separation purge channel comprises a plurality of inlets.

4. The processing chamber lid of claim 1 , wherein the plurality of angular purge channels connects to a single inlet located in a center portion of the lid body.

5. The processing chamber lid of claim 1 , further comprising a lid support beam extending across a width of the lid body, the lid support beam connected to a center portion of the lid body.

6. The processing chamber lid of claim 1 , further comprising one or more sensors.

7. The processing chamber lid of claim 1 , wherein the bottom surface is coplanar within ±2 mm.

8. The processing chamber lid of claim 2 , wherein the circular portions have the same diameter around all of the station openings.

9. The processing chamber lid of claim 3 , wherein there are an equal number of inlets in the station separation purge channel as station openings.

10. The processing chamber lid of claim 9 , wherein each inlet in the station separation purge channel connects to two adjacent circular portions of the station separation purge channel.

11. The processing chamber lid of claim 5 , wherein the lid support beam is configured to provide deformation compensation for the lid body to compensate for deflection up to about 5 mm.

12. The processing chamber lid of claim 11 , wherein the lid support beam further comprises a motor/actuator in communication with a controller, the controller configured to provide top surface or bottom surface directed force on a center portion of the lid body.

13. The processing chamber lid of claim 6 , wherein the one or more sensors comprise one or more of pyrometers or level finders.

14. A processing method comprising:
flowing a purge gas through a station separation purge channel extending around an outer peripheral edge of a plurality of station openings in the range of 2 to 6, the plurality of station openings having at least two different diameters, the station separation purge channel having a plurality of apertures extending from the station separation purge channel to a bottom surface of a lid body into an interior volume of a processing chamber around process stations; and
flowing a purge gas through a plurality of angular purge channels extending from a center portion of the lid body to an outer peripheral edge portion of the lid body between adjacent station openings, each of the angular purge channels comprising a plurality of spaced apertures extending from the angular purge channel to the bottom surface of the lid body to flow the purge gas into the interior volume of the processing chamber between the process stations.

15. The processing method of claim 14 , further comprising controlling a temperature of the lid body.

16. The processing method of claim 14 , further comprising compensating for deflection of the lid body using a lid support beam configured to provide deformation compensation up to about 5 mm of deflection.

17. A non-transitory computer readable medium including instructions, that, when executed by a controller of a processing chamber, causes the processing chamber to perform operations of:
flowing a purge gas through a station separation purge channel extending around an outer peripheral edge of a plurality of station openings in the range of 2 to 6, the plurality of station openings having at least two different diameters, the station separation purge channel having a plurality of apertures extending from the station separation purge channel to a bottom surface of a lid body into an interior volume of a processing chamber around process stations; and
flowing a purge gas through a plurality of angular purge channels extending from a center portion of the lid body to an outer peripheral edge portion of the lid body between adjacent station openings, each of the angular purge channels comprising a plurality of spaced apertures extending from the angular purge channel to the bottom surface of the lid body to flow the purge gas into the interior volume of the processing chamber between the process stations.

Assignees

• Applied Materials Inc

Inventors

• Kashyap Dhritiman Subha
• Krishna Gopu
• Baluja Sanjeev
• Rice Michael

Classifications

• H10P72/0462 Primary

  characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

• H10P72/7621

  characterised by supporting two or more semiconductor substrates · CPC title

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P72/0602

  Temperature monitoring · CPC title

• H10P72/0471

  comprising at least one ion or electron beam chamber · CPC title