Electron microscopy

Patent metadata

Field	Value
Publication number	US-11067486-B2
Application number	US-201716320961-A
Country	US
Kind code	B2
Filing date	Jul 28, 2017
Priority date	Jul 29, 2016
Publication date	Jul 20, 2021
Grant date	Jul 20, 2021

Abstract

Aspects and embodiments relate to electron microscopy sample preparation apparatus; and a method of preparing an electron microscopy sample. Aspects and embodiments provide electron microscopy sample preparation apparatus. The apparatus comprises a support holder configured to receive an electron microscopy sample support, the electron microscopy sample support configured to receive a fluid sample. The apparatus comprising a gas outlet configured to direct a flow of gas towards a surface of the electron microscopy sample support to adjust fluid supported by the electron microscopy sample support. Aspects and embodiments recognise that in order to be successfully imaged, a specimen must be adequately prepared for imaging. Successful and reproducible preparation of an electron microscopy sample or specimen may be key to obtaining useful results from microscopy techniques. It will be appreciated that incorrect or unsuccessful preparation of a specimen for examination, may result in damage to a specimen, poor and/or irreproducible results.

First claim

The invention claimed is:

1. Electron microscopy sample preparation apparatus; said apparatus comprising:
a support holder configured to receive an electron microscopy sample support, said electron microscopy sample support configured to receive a fluid sample; and
a gas outlet configured to direct a flow of gas towards a surface of said electron microscopy sample support at an angle of incidence selected such that said flow of said gas is operable to adjust said fluid sample by removing excess fluid sample supported by said electron microscopy sample support.

2. Apparatus according to claim 1 , wherein said gas outlet is configured such that said flow of gas is directable towards said surface such that flow of said gas is substantially parallel to said surface.

3. Apparatus according to claim 1 wherein said gas outlet is configured to be moveable such that said gas flow has an adjustable angle of incidence with respect to flow of said gas towards said surface.

4. Apparatus according to claim 1 , wherein said flow of gas from said gas outlet configured for adjusting said fluid sample supported by said electron microscopy sample support further comprises operation by one or more of: causing non-uniform evaporation of fluid sample supported by said electron microscopy sample support to obtain a fluid sample thickness gradient across said sample support causing uniform evaporation of fluid sample supported by said electron microscopy sample support to obtain a uniform fluid sample thickness across said sample support; and causing cooling of fluid sample supported by said electron microscopy sample support to vitrify said fluid sample on said sample support.

5. Apparatus according to claim 1 , wherein said apparatus comprises: at least one gas outlet configured to direct said flow of gas substantially symmetrically towards opposing surfaces of said electron microscopy sample support to adjust fluid sample supported by said electron microscopy sample support.

6. Apparatus according to claim 1 , wherein said apparatus comprises: a fluid source configured to introduce said fluid sample to said sample support.

7. Apparatus according to claim 1 wherein said apparatus comprises: a timing unit configured to implement one or more of: a wait period between introduction of fluid sample to said sample support and activating said gas flow from said gas outlet an active period between activation and cessation of said gas flow from said outlet a relaxation period between cessation of said gas flow from said outlet and a further action taken in relation to a sample support held in said sample holder.

8. Apparatus according to claim 7 , wherein said timing unit is configurable to adjust one or more of said wait period, active period or relaxation period.

9. Apparatus according to claim 1 , wherein said gas outlet is configured to direct said flow of gas to cleave said fluid sample received on said sample support.

10. Apparatus according to claim 1 , wherein said gas outlet is configured to direct said flow of gas to cleave said fluid sample received on said sample support into a retained portion of said fluid sample retained on said sample support and a removed portion of said fluid sample removed from said sample support.

11. Apparatus according to claim 1 , comprising a fluid sample depositor operable to deposit said fluid sample on said sample support.

12. Apparatus according to claim 11 , wherein said apparatus comprises a control unit operable to control said fluid sample depositor, said gas outlet and said cooling device to deposit said fluid sample, cleave said fluid sample and vitrify said retained portion within a processing period.

13. Apparatus according to claim 12 , wherein said processing period comprises a time period within which greater than a selected proportion of said specimens in said retained portion are prevented from at least one of disassociating and reorientating to an aligned orientation.

14. Apparatus according to claim 13 , wherein said time period is less than around 100 ms.

15. A method of preparing an electron microscopy sample preparation; said method comprising:
inserting an electron microscopy sample support into a support holder;
providing a fluid sample to said electron microscopy sample support; and
directing a flow of gas towards a surface of said electron microscopy sample support at an angle of incidence selected such that said flow of said gas is operable to adjust said fluid sample by removing excess fluid sample supported by said electron microscopy sample support.

Assignees

• Res & Innovation Uk

Inventors

• Lamers Meindert Hugo
• Fernandez-Leiro Rafael
• Firman Joshua

Classifications

• G01N1/2813 Primary

  Producing thin layers of samples on a substrate, e.g. smearing, spinning-on (G01N1/30 takes precedence) · CPC title

• H01J37/20

  Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support · CPC title

• B01L3/5085

  for multiple samples, e.g. microtitration plates · CPC title

• H01J2237/002

  Cooling arrangements · CPC title

• G01N30/12

  by evaporation · CPC title