Semiconductor manufactured nano-structures for microbe or virus trapping or destruction

US11060960B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11060960-B2
Application numberUS-201916449760-A
CountryUS
Kind codeB2
Filing dateJun 24, 2019
Priority dateJan 6, 2016
Publication dateJul 13, 2021
Grant dateJul 13, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A device for isolating a microbe or a virion includes a semiconductor substrate; and a trench formed in the semiconductor substrate and extending from a surface of the semiconductor substrate to a region within the semiconductor substrate; wherein the trench has dimensions such that the microbe or the virion is trapped within the trench.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for damaging or destroying a microbe or a virion, comprising: forming an array of semiconductor protrusions extending from a surface of a semiconductor substrate, the semiconductor protrusions comprising nanospikes, the array of semiconductor protrusions having nanoscale dimensions, the array of semiconductor protrusions comprising a fractal pattern of spike sizes; wherein the fractal pattern comprises a first spike size and a second spike size, wherein a topmost surface of first nanospikes having the first spike size and a topmost surface of second nanospikes having the second spike size are coplanar, and wherein a bottommost surface of the first nanospikes and a bottommost surface of the second nanospikes are not coplanar; and disposing the microbe or the virion on the array of protrusions. 2. The method of claim 1 , wherein the microbe or the virion is damaged or destroyed after being disposed on the array of protrusions. 3. The method of claim 2 , wherein the nanospikes puncture the microbe or the virion. 4. The method of claim 1 , wherein the nanospikes comprise a rod shape. 5. The method of claim 1 , wherein the semiconductor substrate is a flexible film. 6. The method of claim 5 , wherein the flexible film is formed into a tubular shape, and the array of protrusions extend into a central region of the tubular shape. 7. The method of claim 1 further comprising forming a diamond-shaped epitaxial growth on a terminal end of each semiconductor protrusion of the array of protrusions.

Assignees

Inventors

Classifications

  • Cards, e.g. flat sample carriers usually with flow in two horizontal directions · CPC title

  • having a very large number of wells, microfabricated wells · CPC title

  • specially adapted for handling suspended solids or molecules independently from the bulk fluid flow, e.g. for trapping or sorting beads or physically stretching molecules · CPC title

  • Trapping microscopic beads · CPC title

  • comprising only one inlet and multiple receiving wells, e.g. for separation, splitting · CPC title

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Frequently asked questions

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What does patent US11060960B2 cover?
A device for isolating a microbe or a virion includes a semiconductor substrate; and a trench formed in the semiconductor substrate and extending from a surface of the semiconductor substrate to a region within the semiconductor substrate; wherein the trench has dimensions such that the microbe or the virion is trapped within the trench.
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification G01N1/405. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jul 13 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).