Semiconductor manufactured nano-structures for microbe or virus trapping or destruction

US2017191912A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2017191912-A1
Application numberUS-201614988887-A
CountryUS
Kind codeA1
Filing dateJan 6, 2016
Priority dateJan 6, 2016
Publication dateJul 6, 2017
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A device for isolating a microbe or a virion includes a semiconductor substrate; and a trench formed in the semiconductor substrate and extending from a surface of the semiconductor substrate to a region within the semiconductor substrate; wherein the trench has dimensions such that the microbe or the virion is trapped within the trench.

First claim

Opening claim text (preview).

1 .- 20 . (canceled) 21 . A device for isolating a first microbe or a virion from a smaller second microbe or virion in a mixed solution, comprising: a first semiconductor layer having a plurality of first holes extending from a first surface to a second surface of the first semiconductor layer; a second semiconductor layer arranged beneath the first semiconductor layer and having a plurality of second holes extending from a first surface to a second surface of the second semiconductor layer, each second hole of the plurality of second holes having a diameter that is constant across an entire length thereof and smaller than each first hole of the plurality of first holes, and having sidewalls that are substantially parallel to one another; and an elongated gap positioned between a bottom surface of the first semiconductor layer and a top surface of the second semiconductor layer and having an outlet at an end portion between the bottom surface of the first semiconductor layer and the top surface of the second semiconductor layer, the elongated gap having dimensions for expelling the first microbe or the virion; wherein the plurality of first holes are formed such that the first microbe or virion and smaller second microbe or virion both pass directly through the plurality of first holes without being trapped, the plurality of second holes are such that the smaller second microbe or virion will pass directly through the plurality of second holes without being trapped, and the first microbe or virion is expelled through the elongated gap. 22 .- 24 . (canceled)

Assignees

Inventors

Classifications

  • using physical processes · CPC title

  • specially adapted for handling suspended solids or molecules independently from the bulk fluid flow, e.g. for trapping or sorting beads or physically stretching molecules · CPC title

  • characterised by the manufacture of the container or its components · CPC title

  • G01N1/405Primary

    by adsorption or absorption · CPC title

  • having a very large number of wells, microfabricated wells · CPC title

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Frequently asked questions

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What does patent US2017191912A1 cover?
A device for isolating a microbe or a virion includes a semiconductor substrate; and a trench formed in the semiconductor substrate and extending from a surface of the semiconductor substrate to a region within the semiconductor substrate; wherein the trench has dimensions such that the microbe or the virion is trapped within the trench.
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification G01N1/405. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Jul 06 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).