A lithography model for three-dimensional patterning device
US-2015378264-A1 · Dec 31, 2015 · US
US11050213B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11050213-B2 |
| Application number | US-202016910846-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 24, 2020 |
| Priority date | Dec 21, 2015 |
| Publication date | Jun 29, 2021 |
| Grant date | Jun 29, 2021 |
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Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
Opening claim text (preview).
What is claimed is: 1. A method carried out by a photolithography tool including an illumination system and a scanner, the method comprising: (a) the scanner requesting a requested repetition rate; (b) the illumination system making a first determination whether the requested repetition rate is an acceptable repetition rate; (c) the illumination system making a second determination whether a parameter associated with step (a) is within specification; and (d) the illumination system generating a signal causing the scanner to operate at the requested rate if the first determination is affirmative, otherwise causing the scanner to operate at a default repetition rate if the second determination is negative, otherwise reverting to step (a) if the first determination is negative and the second determination is affirmative. 2. A method as claimed in claim 1 wherein the parameter is a number of times step (a) has been performed after a request to change to a new repetition rate. 3. A method as claimed in claim 1 wherein the parameter is an amount of time after a request to change to a new repetition rate. 4. A photolithography tool including a scanner and an illumination system, wherein the scanner includes a module for requesting a repetition rate for the illumination system and the illumination system includes a module configured to indicate to the scanner whether the requested repetition rate is allowed, and wherein the scanner further includes a module configured to cause the illumination system to operate at the requested repetition rate if the illumination system indicates the requested repetition rate is allowed and otherwise to request another repetition rate if the illumination system indicates the requested repetition rate is not allowed, wherein the scanner is further configured to cause the illumination system to operate at a default repetition rate if a number of times the illumination system sequentially indicates a requested repetition rate is not allowed exceeds a predetermined number. 5. A method carried out by a photolithography tool including an illumination system and a scanner, the method comprising: (a) transitioning to a gas refill mode; (b) operating the illumination system at a repetition rate R; (c) measuring at least one performance variable while the illumination system is operating at the repetition rate R; (d) making a determination whether the at least one performance variable is within a predetermined acceptable range; (e) storing in association with the repetition rate R an indication whether the determination is affirmative; (f) repeating steps (b) through (e) a desired number of times; and (g) transitioning out of a gas refill mode. 6. A method as claimed in claim 5 wherein step (d) is performed by the illumination system and wherein the at least one performance variable is at least one of bandwidth, wavelength, beam width stability, and energy stability. 7. A system comprising: a laser capable of running at multiple repetition rates; a laser control unit operatively connected to the laser for driving the laser to operate sequentially at a plurality of the repetition rates to establish a set of scanned repetition rates; a measurement unit arranged to measure an output from the laser for measuring at least one operating parameter of the laser for each member of the set of scanned repetition rates; a scoring unit operatively connected to the measurement unit for determining a score for each member of the set of scanned repetition rates based at least in part on the measured operating parameter; a storage unit operatively connected to the scoring unit for storing first values based on the scores and respective second values indicative of the repetition rate for which the score was determined, for each of the plurality of repetition rates, and the laser control unit being operatively connected to the storage unit and configured to determine a repetition rate at which to operate the laser based at least in part on the score of the repetition rate and wherein the plurality of repetition rates scanned to establish a set of scanned repetition rates does not include a set of disallowed repetition rates. 8. A system as claimed in claim 7 wherein the set of disallowed repetition rates includes repetition rates predetermined to result in out-of-specification performance. 9. A system as claimed in claim 7 wherein the set of disallowed repetition rates is preset and static. 10. A system as claimed in claim 7 wherein the set of disallowed repetition rates is adjusted dynamically during one or more exposure periods for the laser. 11. A system as claimed in claim 7 wherein the laser control unit operatively connected to the laser for driving the laser to scan through a plurality of repetition rates is configured to step the laser through a series of repetition rates where the difference in repetition rate between steps is maintained substantially constant. 12. A system as claimed in claim 7 wherein the laser control unit operatively connected to the laser for driving the laser to scan through a plurality of repetition rates is configured to step the laser through a series of repetition rates where the difference in repetition rate between steps is increased with repetition rate. 13. A system as claimed in claim 7 wherein the laser control unit operatively connected to the laser for driving the laser to scan through a plurality of repetition rates is configured to step the laser through a series of repetition rates where the difference in repetition rate between steps is decreased with repetition rate. 14. A system as claimed in claim 7 wherein the laser control unit is additionally configured to determine a repetition rate at which to operate the laser based at least in part on the score of the repetition rate and information about a current process. 15. A system as claimed in claim 7 wherein the laser control unit is additionally configured to adjust a second operating parameter as it scans the scanned repetition rates. 16. A system as claimed in claim 15 wherein the second operating parameter is bandwidth. 17. A system as claimed in claim 15 wherein the second operating parameter is gain. 18. A system as claimed in claim 15 wherein the second operating parameter is offset change. 19. A system as claimed in claim 15 wherein the second operating parameter is maximum bandwidth. 20. A system as claimed in claim 15 wherein the second operating parameter is peak energy sigma.
Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption · CPC title
comprising an excimer or exciplex · CPC title
Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength · CPC title
one of the reflectors being constituted by a diffraction grating · CPC title
Control of working procedures; Failure detection; Spectral bandwidth calculation · CPC title
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