Techniques to engineer nanoscale patterned features using ions

Patent metadata

Field	Value
Publication number	US-11043380-B2
Application number	US-201815978722-A
Country	US
Kind code	B2
Filing date	May 14, 2018
Priority date	Jun 25, 2015
Publication date	Jun 22, 2021
Grant date	Jun 22, 2021

Abstract

A method of patterning a substrate. The method may include providing a surface feature on the substrate, the surface feature having a first dimension along a first direction within a substrate plane, and a second dimension along a second direction within the substrate plane, wherein the second direction is perpendicular to the first direction; and directing first ions in a first exposure to the surface feature along the first direction at a non-zero angle of incidence with respect to a perpendicular to the substrate plane, in a presence of a reactive ambient containing a reactive species; wherein the first exposure etches the surface feature along the first direction, wherein after the directing, the surface feature retains the second dimension along the second direction, and wherein the surface feature has a third dimension along the first direction different than the first dimension.

First claim

What is claimed is:

1. A method of patterning a substrate, comprising:
providing a first layer disposed directly on a second layer in the substrate, the first layer comprising a set of holes, wherein the set of holes comprises an array of isolated trenches that are elongated along a first direction before the first exposure, and wherein the set of holes have a first spacing along the first direction between adjacent holes of the set of holes, the second layer being a continuous layer extending under a portion of the first layer and having an upper surface that is exposed within the holes in the first layer; and
directing first ions in a first exposure to the first layer and the upper surface of the second layer along a trajectory, the trajectory forming a non-zero angle of incidence with respect to a perpendicular to a substrate plane, wherein the trajectory is aligned along a first direction within the plane of the substrate, the first exposure comprising a reactive ion etch, wherein the set of holes are selectively etched along the first direction with respect to a second direction, perpendicular to the first direction, and
wherein, after the first exposure, the set of holes are characterized by a second spacing along the first direction, less than the first spacing.

2. The method of claim 1 , comprising:
after the first exposure, performing an etch to transfer the set of holes into the second layer, wherein the etch takes place in a vertical direction along the perpendicular to the plane of the substrate.

3. The method of claim 1 , wherein the first ions form a ribbon beam having a long axis parallel to the second direction and a short axis parallel to the first direction.

4. The method of claim 1 , wherein the trajectory comprises a first trajectory, wherein the first exposure further comprises directing second ions to the surface feature along a second trajectory, opposite the first trajectory, at a non-zero angle of incidence with respect to the perpendicular.

5. The method of claim 1 , wherein the set of holes comprise a set of contact holes in a memory array.

6. The method of claim 1 , wherein the set of holes are not etched along the second direction.

7. The method of claim 1 , wherein the array of isolated trenches comprises a two dimensional array.

8. The method of claim 7 , wherein the array of trenches are not etched along the second direction.

9. The method of claim 7 , wherein the array of trenches comprises a first position before the first exposure, and a second position after the first exposure, shifted along the first direction with respect to the first position.

10. The method of claim 7 , wherein the trajectory comprises a first trajectory, wherein the first exposure further comprises directing second ions to the surface feature along a second trajectory, opposite the first trajectory, at a non-zero angle of incidence with respect to the perpendicular, wherein a position of the array of trenches is not shifted by the first exposure.

Assignees

• Varian Semiconductor Equipment Ass Inc

Inventors

• Ruffell Simon
• Hautala John
• Brand Adam
• Dai Huixiong

Classifications

• H10P76/4085

  characterised by the processes involved to create the masks · CPC title

• H10P50/695

  characterised by the process involved to create the mask, e.g. lift-off masks or sidewalls or to modify the mask · CPC title

• H10W20/089

  using processes for implementing desired shapes or dispositions of the openings, e.g. double patterning · CPC title

• H10P76/204 Primary

  of organic photoresist masks · CPC title

• H10P50/283

  by chemical means · CPC title