Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound

Patent metadata

Field	Value
Publication number	US-11003079-B2
Application number	US-201816205502-A
Country	US
Kind code	B2
Filing date	Nov 30, 2018
Priority date	Jun 3, 2016
Publication date	May 11, 2021
Grant date	May 11, 2021

Abstract

The composition for film formation includes a compound including a group of the formula (1) and a solvent. In the formula (1), R 1 to R 4 each independently represent a hydrogen atom, a monovalent organic group having 1 to 20 carbon atoms, or R 1 to R 4 taken together represent a cyclic structure having 3 to 20 ring atoms together with the carbon atom or a carbon chain to which R 1 to R 4 bond. Ar 1 represents a group obtained by removing (n+3) hydrogen atoms from an aromatic ring of an arene having 6 to 20 carbon atoms. n is an integer of 0 to 9. R 5 represents a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms.

First claim

What is claimed is:

1. A composition for film formation comprising:
an aromatic ring-containing compound represented by formula (i); and
a solvent:

wherein in the formula (i),
R 1 and R 2 each independently represent a monovalent organic group having 1 to 20 carbon atoms, R 3 and R 4 each independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms, and optionally at least part of R 1 to R 4 taken together represent a cyclic structure having 3 to 20 ring atoms together with the carbon atom or a carbon chain to which the at least part of R 1 to R 4 bond,
Ar 1 represents a group obtained by removing (n+3) hydrogen atoms from an aromatic ring of an arene having 6 to 20 carbon atoms,
n is an integer of 0 to 9,
m is an integer of 2 to 6,
R 5 represents a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, and optionally in a case in which R 5 is present in a plurality of number, two or more of the plurality of R 5 s taken together represent a cyclic structure having 6 to 20 ring atoms together with an atomic chain to which the two or more of the plurality of R 5 s bond,
a plurality of R 1 s are identical or different, a plurality of R 2 s are identical or different, a plurality of R 3 s are identical or different, a plurality of R 4 s are identical or different, and in the case in which R 5 is present in a plurality of number, the plurality of R 5 s are identical or different, and
R 6 represents at least one selected from the group consisting of a group represented by formula (2-1), a group represented by formula (2-2), a group represented by formula (2-3), a group represented by formula (2-4), and a group represented by formula (2-5):

wherein in the formulae (2-1) to (2-5), * denotes a binding site to the carbon atom in the aromatic ring of Ar 1 in the formula (i),
in the formula (2-1), R A represents a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; n1 is an integer of 0 to 4, wherein in a case in which n1 is 2 or greater, a plurality of R A s are identical or different; and m1 is an integer of 2 to 6, wherein n1+m1≤6,
in the formula (2-2), R B represents a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; n2 is an integer of 0 or 1; and m2 is an integer of 2 or 3, wherein n2+m2≤3,
in the formula (2-3), R C represents a hydrogen atom, a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; n3 is an integer of 0 to 2, wherein in a case in which n3 is 2, a plurality of R C s are identical or different; and m3 is an integer of 2 to 4, wherein n3+m3=4,
in the formula (2-4), R D1 and R D2 each independently represent a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; and n4a and n4b are each independently an integer of 0 to 4, wherein in a case in which n4a is 2 or greater, a plurality of R D1 s are identical or different, and in a case in which n4b is 2 or greater, a plurality of R D2 s are identical or different, and
in the formula (2-5), R E1 to R E3 each independently represent a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; and n5a, n5b and n5c are each independently an integer of 0 to 4, wherein in a case in which n5a is 2 or greater, a plurality of R E1 s are identical or different, in a case in which n5b is 2 or greater, a plurality of R E2 s are identical or different, and in a case in which n5c is 2 or greater, a plurality of R E3 s are identical or different.

2. The composition for film formation according to claim 1 , wherein the aromatic ring-containing compound has a molecular weight of no less than 300 and no greater than 3,000.

3. The composition for film formation according to claim 1 , wherein R 1 and R 2 in the formula (i) each independently represent a substituted or unsubstituted aryl group or a substituted or unsubstituted heteroaryl group.

4. The composition for film formation according to claim 1 , wherein R 3 in the formula (i) represents a hydrogen atom.

5. The composition for film formation according to claim 1 , wherein the arene which Ar 1 in the formula (i) is derived from is benzene or naphthalene.

6. The composition for film formation according to claim 1 , wherein a content of the compound in the composition is no less than 1% by mass and no greater than 50% by mass.

7. The composition for film formation according to claim 1 , wherein the composition is suitable for formation of a resist underlayer film.

8. A resist underlayer film-forming method comprising:
applying the composition for film formation according to claim 1 directly or indirectly on an upper face side of a substrate to form a film on the upper face side of the substrate; and
heating the film to form a resist underlayer film.

9. A compound represented by formula (i):

wherein in the formula (i),
R 1 to and R 2 each independently represent a monovalent organic group having 1 to 20 carbon atoms, R 3 and R 4 each independently represent a hydrogen atom, or a monovalent organic group having 1 to 20 carbon atoms, and optionally at least part of R 1 to R 4 taken together represent a cyclic structure having 3 to 20 ring atoms together with the carbon atom or a carbon chain to which the at least part of R 1 to R 4 bond,
Ar 1 represents a group obtained by removing (n+3) hydrogen atoms from an aromatic ring of an arene having 6 to 20 carbon atoms,
n is an integer of 0 to 9,
m is an integer of 2 to 6,
R 5 represents a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, and optionally in a case in which R 5 is present in a plurality of number, two or more of the plurality of R 5 s taken together represent a cyclic structure having 6 to 20 ring atoms together with an atomic chain to which the two or more of the plurality of R 5 s bond,
a plurality of R 1 s are identical or different, a plurality of R 2 s are identical or different, a plurality of R 3 s are identical or different, a plurality of R 4 s are identical or different, and in the case in which R 5 is present in a plurality of number, the plurality of R 5 s are identical or different, and
R 6 represents at least one selected from the group consisting of a group represented by formula (2-1), a group represented by formula (2-2), a group represented by formula (2-3), a group represented by formula (2-4), and a group represented by formula (2-5):

wherein in the formulae (2-1) to (2-5), * denotes a binding site to the carbon atom in the aromatic ring of Ar 1 in the formula (i),
in the formula (2-1), R A represents a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; n1 is an integer of 0 to 4, wherein in a case in which n1 is 2 or greater, a plurality of R A s are identical or different; and m1 is an integer of 2 to 6, wherein n1+m1≤6,
in the formula (2-2), R B represents a hydro

Assignees

• Jsr Corp

Inventors

• Nosaka Naoya
• Wakamatsu Gouji
• Abe Tsubasa
• Matsumura Yuushi
• Miyake Masayuki
• Takimoto Yoshio

Classifications

• H10P76/20

  of masks comprising organic materials · CPC title

• C09D161/12

  with polyhydric phenols · CPC title

• C08G8/20

  with polyhydric phenols · CPC title

• C08J5/18

  Manufacture of films or sheets · CPC title

• C08F34/02

  in a ring containing oxygen (coumarone-indene polymers C08F244/00) · CPC title