Deposition mask, method of manufacturing deposition mask device, and method of manufacturing deposition mask

Patent metadata

Field	Value
Publication number	US-10991883-B2
Application number	US-201716096480-A
Country	US
Kind code	B2
Filing date	Dec 26, 2017
Priority date	Jan 10, 2017
Publication date	Apr 27, 2021
Grant date	Apr 27, 2021

Abstract

A deposition mask has a central axis extending in a first direction, arranged at a central position in a second direction orthogonal to the first direction. Spaced apart point P 1 and Q 1 are provided on one side of the central axis, and spaced apart points Q 1 and Q 2 are provided on another side of the central axis. When a dimension from point P 1 to point Q 1 is X 1 , a dimension from point P 2 to a point Q 2 is X 2 , and a design value is α x , the deposition mask satisfies the following.



α
X

-

X
⁢

⁢
1

+

X
⁢

⁢
2

2



≤

40
⁢

⁢
µm

⁢

⁢
and

[

Formula
⁢

⁢
1

]



X
⁢

⁢
1

-

X
⁢

⁢
2



≤

60
⁢

⁢
µm

[

Formula
⁢

⁢
2

]

First claim

The invention claimed is:

1. A deposition mask extending in a first direction, the deposition mask comprising:
a central axis line extending in the first direction and arranged at a central position in a second direction orthogonal to the first direction;
a point P 1 and a point Q 1 provided on one side of the central axis line and spaced apart from each other along the first direction;
a point P 2 and a point Q 2 provided on the other side of the central axis line and spaced apart from each other along the first direction,
wherein the point P 1 and the point P 2 are arranged to be symmetric with each other with respect to the central axis line during deposition, and
the point Q 1 and the point Q 2 are arranged to be symmetric with each other with respect to the central axis line during deposition, and
when a dimension from the point P 1 to the point Q 1 is X 1 , a dimension from the point P 2 to the point Q 2 is X 2 , and a design value is α x , the deposition mask satisfies the following,



α
X

-

X
⁢

⁢
1

+

X
⁢

⁢
2

2



≤

40
⁢

⁢
µm

[

Formula
⁢

⁢
1

]



X
⁢

⁢
1

-

X
⁢

⁢
2



≤

60
⁢

⁢
µm

[

Formula
⁢

⁢
2

]

wherein
the deposition mask comprises:
a first ear portion and a second ear portion that form a pair of end portions in the first direction;
through-holes provided between the first ear portion and the second ear portion; and
a first edge and a second side edge that form a pair of side edges in a second direction perpendicular to the first direction,

wherein
the point P 1 and the point P 2 are formed on a side closest to the first ear portion and are positioned at center points of corresponding through-holes,
the point Q 1 and the points Q 2 are formed on a side closest to the second ear portion and are positioned at center points of corresponding through-holes,
the through-holes corresponding to the point P 1 and the point Q 1 are formed on a side closest to the first side edge, and
the through-holes corresponding to the point P 2 and point Q 2 are formed on a side closest to the second side edge.

2. The deposition mask according to claim 1 , wherein
a plurality of effective regions in which the through-holes are formed is provided between the first ear portion and the second ear portion,
the plurality of effective regions includes a first effective region and a second effective region arranged along the first direction of the deposition mask,
the first effective region is arranged on the side of the first ear portion, the second effective region is arranged on the side of the second ear portion,
the point P 1 and the point P 2 are positioned at the center points of the corresponding through-holes formed in the first effective region,
the point Q 1 and the point Q 2 are positioned at the center points of the corresponding through-holes formed in the second effective region,
the first effective region is arranged on a side closest to the first ear portion among the plurality of effective regions, and
the second effective region is arranged on a side closest to the second ear portion among the plurality of effective regions.

3. A method of manufacturing a deposition mask device comprising:
preparing the deposition mask according to claim 1 ; and
applying a tension in the first direction to the deposition mask so that the deposition mask is stretched to be installed to a frame.

Assignees

• Dainippon Printing Co Ltd

Inventors

• Ikenaga Chikao

Classifications

• H10K71/166

  using selective deposition, e.g. using a mask · CPC title

• C23F1/02 Primary

  Local etching · CPC title

• C23C14/12

  Organic material · CPC title

• C23C14/24

  Vacuum evaporation · CPC title

• C23C14/042 Primary

  using masks · CPC title