Power diode

Patent metadata

Field	Value
Publication number	US-10991832-B2
Application number	US-201816135898-A
Country	US
Kind code	B2
Filing date	Sep 19, 2018
Priority date	Sep 21, 2017
Publication date	Apr 27, 2021
Grant date	Apr 27, 2021

Abstract

A power diode includes a semiconductor body coupled to an anode metallization and to a cathode metallization. The semiconductor body has a drift region of a first conductivity type and an anode region of a second conductivity type. The anode region includes: a contact zone arranged in contact with the anode metallization; a field stop zone arranged below the contact zone; and a body zone arranged below the field stop zone and above the drift region. An electrically activated dopant concentration of the anode region has a profile, along a vertical direction, according to which: a first maximum is present within the contact zone; a second maximum is present within the field stop zone; and the dopant concentration continuously decreases from the first maximum to a local minimum, and continuously increases from the local minimum to the second maximum.

First claim

What is claimed is:

1. A power diode, comprising a semiconductor body coupled to an anode metallization and to a cathode metallization, wherein the semiconductor body has a drift region of a first conductivity type and an anode region of a second conductivity type, the anode region comprising:
a contact zone arranged in contact with the anode metallization;
a field stop zone arranged below the contact zone; and
a body zone arranged below the field stop zone and above the drift region;
wherein an electrically activated dopant concentration of the anode region has a profile, along a vertical direction, according to which:
a first maximum is present within the contact zone;
a second maximum is present within the field stop zone;
the dopant concentration continuously decreases from the first maximum to a local minimum, and continuously increases from the local minimum to the second maximum; and
the second maximum is within a range of 70% to 130% of the first maximum, wherein, according to the profile, the dopant concentration continuously decreases from the second maximum to an inflexion point at which a rate of change of the dopant concentration with respect to the vertical direction has a local maximum, and wherein during a blocking state of the power diode, the electrical field stops below the inflexion point.

2. The power diode of claim 1 , wherein the second maximum is an absolute maximum of the dopant concentration of the anode region.

3. The power diode of claim 1 , wherein the local minimum is within a range of 10% to 50% of the first maximum.

4. The power diode of claim 1 , wherein the electrically activated dopant concentration at each of the first maximum and the second maximum is greater than 10 17 cm −3 .

5. The power diode of claim 1 , wherein the maximum electrically activated dopant concentration within the body zone is within a range of 1/50 to ⅕ of the electrically activated dopant concentration at the first maximum and the second maximum.

6. The power diode of claim 1 , wherein, at least within the contact zone and the field stop zone, an electric conductivity is substantially proportional to the electrically activated dopant concentration.

7. The power diode of claim 1 , wherein, according to the profile, the dopant concentration continuously decreases from the inflexion point throughout the body zone until a transition formed between the body zone and the drift region.

8. The power diode of claim 7 , wherein a first concentration gradient present above the inflexion point is greater than a second concentration gradient present below the inflexion point by a factor of at least three.

9. The power diode of claim 1 , wherein the anode region has, along the vertical direction, five equal shares, wherein each of the first maximum and the second maximum are positioned within an uppermost one of the equal shares.

10. The power diode of claim 1 , wherein each of the first maximum and the second maximum are positioned within a distance of 2000 nm from the anode metallization, measured from a transition between the contact zone and the anode metallization along the vertical direction.

11. The power diode of claim 1 , wherein:
a total extension of the anode region in the vertical direction amounts to no more than 20% of a total extension of the drift region in the vertical direction;
the total extension of the anode region in the vertical direction is within a range of 500 nm to 15000 nm;
the total extension of the drift region in the vertical direction is within a range of 10 μm to 1000 μm; and/or
the power diode is formed in a wafer having a thickness, in the vertical direction, within a range of 10 μm to 1000 μm.

12. The power diode of claim 1 , wherein the profile within each of the contact zone and the field stop zone is an implantation profile.

13. The power diode of claim 1 , wherein a dose for each of the contact zone and the field stop zone is smaller than 2*10 13 cm −2 .

14. The power diode of claim 1 , wherein a dose for body zone is smaller than 1*10 13 cm −2 .

15. The power diode of claim 1 , wherein the profile within the body zone is a diffusion profile.

16. The power diode of claim 1 , wherein a distance between the second maximum and a peak of an electric field during a blocking state of the power diode is at least 500 nm.

17. The power diode of claim 1 , wherein the drift region is configured for a blocking voltage of at least 500 V.

18. The power diode of claim 1 , wherein the semiconductor body further comprises a cathode region of the first conductivity type, and wherein the drift region is coupled to the cathode metallization through the cathode region.

19. A power diode, comprising a semiconductor body coupled to an anode metallization and to a cathode metallization, wherein the semiconductor body has a drift region of a first conductivity type and an anode region of a second conductivity type, the anode region comprising:
a contact zone arranged in contact with the anode metallization;
a field stop zone arranged below the contact zone; and
a body zone arranged below the field stop zone and above the drift region;
wherein an electrically activated dopant concentration of the anode region has a profile, along a vertical direction, according to which:
a first maximum is present within the contact zone;
a second maximum is present within the field stop zone;
the dopant concentration continuously decreases from the first maximum to a local minimum, and continuously increases from the local minimum to the second maximum; and
the second maximum is within a range of 70% to 130% of the first maximum, and
wherein the field stop zone is completely separated from the anode electrode by the contact zone.

Assignees

• Infineon Technologies Austria Ag

Inventors

• Mauder Anton
• Barusic Mario

Classifications

• H10P30/204

  into Group IV semiconductors · CPC title

• H10P30/21

  of electrically active species · CPC title

• H10P30/20

  into semiconductor materials, e.g. for doping · CPC title

• H10D8/00 Primary

  Diodes (variable-capacitance diodes H10D1/64; gated diodes H10D12/00) · CPC title

• H10D62/128

  Anode regions of diodes · CPC title