Vertical array of resistive switching devices having restricted filament regions and tunable top electrode volume

Patent metadata

Field	Value
Publication number	US-10991763-B2
Application number	US-201916685228-A
Country	US
Kind code	B2
Filing date	Nov 15, 2019
Priority date	Jun 8, 2018
Publication date	Apr 27, 2021
Grant date	Apr 27, 2021

Abstract

Embodiments of the invention are directed to a vertical resistive device. A non-limiting example of the vertical resistive device includes a horizontal plate having a conductive electrode region and a filament region. An opening extends through the filament region and is defined by sidewalls of the filament such that the filament region is positioned outside of the opening. A conductive pillar is positioned within the opening and is communicatively coupled to the filament region.

First claim

What is claimed is:

1. A vertical resistive device comprising:
a horizontal plate comprising a conductive electrode region and a filament region;
an opening extending through the filament region and defined by sidewalls of the filament region, wherein the filament region is positioned outside of the opening; and
a pillar positioned within the opening and communicatively coupled to the filament region,
wherein the pillar comprises a reactive electrode and a metal fill material.

2. The device of claim 1 further comprising:
a first dielectric layer across from the conductive electrode region and the filament region of the horizontal plate; and
a second dielectric layer on an opposite side the horizontal plate than the first dielectric layer and positioned across from the conductive electrode region and the filament region of the horizontal plate;
wherein the opening also extends through the first dielectric layer and the second dielectric layer;
wherein sidewalls of the opening are also defined by sidewalls of the first dielectric layer and sidewalls of the second dielectric layer.

3. The device of claim 2 , wherein the filament region is bound by the horizontal plate, the first dielectric layer, the second dielectric layer, and the pillar.

4. The device of claim 1 , wherein:
the pillar comprises a cylindrical shape; and
the filament region comprises a ring shape and extends around the pillar.

5. The device of claim 1 , wherein the reactive electrode comprises a bottom layer comprising titanium nitride (TiN) and having a thickness dimension from about 0.3 nm to about 3.0 nm.

6. The device of claim 5 , wherein the reactive electrode comprises:
an intermediate layer comprising (M)AlC, where M is a transition metal selected from the group consisting of titanium (Ti), tantalum (Ta), and Niobium (Nb), wherein the intermediate layer comprises a thickness dimension from about 1 nm to about 10 nm; and
a top layer comprising TiN and having a thickness dimension from about 1 nm to about 3 nm.

7. The device of claim 5 , wherein the metal fill material comprises one or more low-resistivity metals selected from the group consisting of tungsten (W), aluminum (Al), and copper (Cu).

8. The device of claim 1 , wherein:
the conductive electrode functions as a bottom electrode of a resistive switching device (RSD);
the filament region functions as an insulator region of the RSD; and
the pillar functions as a top electrode of the RSD.

9. The device of claim 8 , wherein an oxygen vacancy concentration of the RSD is controlled by a thickness of a plurality of metals forming the top electrode, wherein a first one of the plurality of metals forming the top electrode comprises a transition metal.

10. The device of claim 9 , wherein the oxygen vacancy concentration of the RSD is further controlled by a percentage of a second one of the plurality of metals forming the top electrode.

11. The device of claim 10 , wherein the second one of the plurality of metals forming the top electrode comprises Al.

12. The device of claim 1 , wherein the horizontal plate comprise titanium nitride (TiN) or tungsten (W).

13. The device of claim 2 , wherein the first dielectric layer and the second dielectric layer comprise silicon nitride (SiN) or silicon dioxide (SiO 2 ).

14. The device of claim 1 , wherein the filament region comprises a metal oxide comprising a compound selected from the group consisting of HfO 2 or Ta 2 O 5 or ZrO 2 .

15. A method of forming a vertical resistive device, the method comprising:
forming a stack comprising:
a horizontal plate comprising a conductive electrode region and a filament region;
an opening extending through the filament region and defined by sidewalls of the filament region, wherein the filament region is positioned outside of the opening; and
a pillar positioned within the opening and communicatively coupled to the filament region;

wherein the pillar comprises a reactive electrode and a metal fill material.

16. The method of claim 15 , wherein:
the stack further comprises:
a first dielectric layer across from the conductive electrode region and the filament region of the horizontal plate; and
a second dielectric layer on an opposite side the horizontal plate than the first dielectric layer and positioned across from the conductive electrode region and the filament region of the horizontal plate;
the opening also extends through the first dielectric layer and the second dielectric layer; and
sidewalls of the opening are also defined by sidewalls of the first dielectric layer and sidewalls of the second dielectric layer.

17. The method of claim 16 , wherein the filament region is bound by the horizontal plate, the first dielectric layer, the second dielectric layer, and the pillar.

18. The method of claim 15 , wherein:
the reactive electrode comprises:
a bottom layer comprising titanium nitride (TiN) and having a thickness dimension from about 0.3 nm to about 3.0 nm;
an intermediate layer comprising (M)AlC, where M is a transition metal selected from the group consisting of titanium (Ti), tantalum (Ta), and Niobium (Nb), wherein the intermediate layer comprises a thickness dimension from about 1 nm to about 10 nm; and
a top layer comprising TiN and having a thickness dimension from about 1 nm to about 3 nm; and
the metal fill material comprises one or more low-resistivity metals selected from the group consisting of tungsten (W), aluminum (Al), and copper (Cu).

19. The method of claim 15 , wherein:
the conductive electrode functions as a bottom electrode of a resistive switching device (RSD);
the filament region functions as an insulator region of the RSD;
the pillar functions as a top electrode of the RSD; and
an oxygen vacancy concentration of the RSD is controlled by:
a thickness of a plurality of metals forming the top electrode, wherein a first one of the plurality of metals forming the top electrode comprises a transition metal; and
a percentage of one of the plurality of metals forming the top electrode.

20. The method of claim 16 , wherein:
the horizontal plate comprise titanium nitride (TiN) or tungsten (W);
the first dielectric layer and the second dielectric layer comprise silicon nitride (SiN) or silicon dioxide (SiO 2 ); and
the filament region comprises a metal oxide comprising a compound selected from the group consisting of HfO 2 or Ta 2 O 5 or ZrO 2 .

Assignees

• IBM

Inventors

• Ando Takashi
• Bruce Robert L
• Miyazoe Hiroyuki
• Rozen John

Classifications

• H01L45/1675

  Electricity · mapped topic

• H01L45/1616

  Electricity · mapped topic

• H01L45/1683

  Electricity · mapped topic

• H01L45/08

  Electricity · mapped topic

• H01L27/249 Primary

  Electricity · mapped topic