Vertical vacuum channel transistor

Patent metadata

Field	Value
Publication number	US-10991537-B2
Application number	US-201916402302-A
Country	US
Kind code	B2
Filing date	May 3, 2019
Priority date	May 3, 2019
Publication date	Apr 27, 2021
Grant date	Apr 27, 2021

Abstract

A vertical vacuum transistor with a sharp tip structure, and associated fabrication process, is provided that is compatible with current vertical CMOS fabrication processing. The resulting vertical vacuum channel transistor advantageously provides improved operational characteristics including a higher operating frequency, a higher power output, and a higher operating temperature while at the same time providing a higher density of vertical transistor devices during the manufacturing process.

First claim

What is claimed is:

1. A vertical vacuum channel transistor, comprising:
a sharp tip structure comprising two tip portions, wherein one tip portion of the two tip portions is an emitter of the vertical vacuum channel transistor and another tip portion of the two tip portions is a collector of the vertical vacuum channel transistor;
a vacuum channel between the two tip portions; and

a gate of the vertical vacuum channel transistor, wherein a metal contact for each of the emitter, the collector and the gate of the vertical vacuum channel transistor is formed in a respective trench for each of the emitter, the collector and the gate of the vertical vacuum channel transistor that each extend downward in a vertical direction from a common top surface, wherein the two tip portions are formed from a silicon germanium (SiGe) material, wherein the silicon germanium (SiGe) material is a portion of an inverted T-shaped fin structure, and further comprising:
a bottom spacer formed on a horizontal surface of the inverted T-shaped fin structure;
a high-K dielectric layer formed on sidewalls of the inverted T-shaped fin structure; and
a metal gate layer formed on the high-K dielectric layer, wherein the high-K dielectric layer is also formed on a top surface of the bottom spacer.

2. The vertical vacuum channel transistor of claim 1 , wherein the one tip portion and the another tip portion are separated by the vacuum channel that is less than 150 nm in length.

3. The vertical vacuum channel transistor of claim 1 , where the bottom spacer is formed from a silicon nitride (SiN) material.

4. The vertical vacuum channel transistor of claim 1 , wherein the bottom spacer is an isolation layer that separates the gate and the metal contact for the emitter.

5. A vertical vacuum channel transistor, comprising:
a sharp tip structure comprising two tip portions, wherein one tip portion of the two tip portions is an emitter of the vertical vacuum channel transistor and another tip portion of the two tip portions is a collector of the vertical vacuum channel transistor;
a vacuum channel between the two tip portions; and
a gate of the vertical vacuum channel transistor, wherein the two tip portions are formed from a silicon germanium (SiGe) material, and wherein the one tip portion and the another tip portion are separated by the vacuum channel that is less than 150 nm in length, wherein the silicon germanium (SiGe) material is a portion of an inverted T-shaped fin structure, and further comprising:
a bottom spacer formed on a horizontal surface of the inverted T-shaped fin structure;
a high-K dielectric layer formed on sidewalls of the inverted T-shaped fin structure; and
a metal gate layer formed on the high-K dielectric layer, wherein the high-K dielectric layer is also formed on a top surface of the bottom spacer.

6. The vertical vacuum transistor of claim 5 , where the bottom spacer is formed from a silicon nitride (SiN) material.

7. The vertical vacuum channel transistor of claim 5 , wherein the bottom spacer is an isolation layer that separates the gate and a metal contact for the emitter.

Assignees

• IBM

Inventors

• Ok Injo
• Lee Choonghyun
• Seo Soon-Cheon
• Kim Seyoung

Classifications

• H10D62/832

  being Group IV materials comprising two or more elements, e.g. SiGe · CPC title

• H01J21/105 Primary

  with microengineered cathode and control electrodes, e.g. Spindt-type · CPC title

• H01J19/24

  Cold cathodes, e.g. field-emissive cathode · CPC title

• H01J9/28

  Manufacture of leading-in conductors · CPC title

• H01J19/44 Primary

  Insulation between electrodes or supports within the vacuum space · CPC title