Gas distribution for chemical vapor deposition/infiltration

Patent metadata

Field	Value
Publication number	US-10975467-B2
Application number	US-201916598843-A
Country	US
Kind code	B2
Filing date	Oct 10, 2019
Priority date	Sep 19, 2017
Publication date	Apr 13, 2021
Grant date	Apr 13, 2021

Abstract

A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.

First claim

What is claimed is:

1. A system comprising:
a chamber comprising an inlet portion and an outlet portion, wherein the inlet portion is configured to house a porous preform;
a first inlet for introducing a gaseous precursor into the inlet portion of the chamber;
a first gas distribution plate disposed between the inlet portion and the outlet portion of the chamber, the first gas distribution plate defining a first internal cavity;
a second gas distribution plate disposed between the first gas distribution plate and the outlet portion of the chamber, the second gas distribution plate defining a second internal cavity;
a second inlet for introducing a gaseous mitigation agent into the first internal cavity defined in the first gas distribution plate, wherein the first gas distribution plate and the second gas distribution plate are configured such that the gaseous mitigation agent is configured to sequentially flow through both the first internal cavity and the second internal cavity before mixing with a reaction gas from the inlet portion of the chamber; and
an exhaust conduit coupled in fluidic communication with the outlet portion of the chamber.

2. The system of claim 1 , wherein the first gas distribution plate is configured to distribute the gaseous mitigation agent through the first internal cavity before the gaseous mitigation agent flows into the second internal cavity of the second gas distribution plate, wherein the second gas distribution plate comprises a plurality of pass-through tubes, wherein the second gas distribution plate facilitates mixing the gaseous mitigation agent with the reaction gas from the plurality of pass-through tubes.

3. The system of claim 1 , wherein the second inlet is configured to introduce the gaseous mitigation agent into the first internal cavity via a first cavity inlet, wherein the gaseous mitigation agent is configured to flow from the first internal cavity to the second internal cavity via a plurality of second cavity inlets extending between the first gas distribution plate and the second gas distribution plate.

4. The system of claim 3 , wherein the first cavity inlet is a central conduit and the plurality of second cavity inlets are offshoot conduits that are positioned around the central conduit.

Assignees

• Goodrich Corp

Inventors

• She Ying
• Menon Naveen G
• Dardas Zissis A
• Filburn Thomas P
• Cai Xiaodan

Classifications

• C23C16/045 Primary

  Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates · CPC title

• C04B35/571

  obtained from {Si-containing} polymer precursors {or organosilicon monomers} · CPC title

• C04B35/80

  Fibres, filaments, whiskers, platelets, or the like · CPC title

• C23C16/4412

  Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title

• C04B2235/614

  Gas infiltration of green bodies or pre-forms · CPC title