Plasma processing apparatus

Patent metadata

Field	Value
Publication number	US-10971341-B2
Application number	US-201816125988-A
Country	US
Kind code	B2
Filing date	Sep 10, 2018
Priority date	Sep 15, 2017
Publication date	Apr 6, 2021
Grant date	Apr 6, 2021

Abstract

A plasma processing apparatus includes a processing vessel, an upper structure that is provided on an upper portion of the processing vessel and generates plasma in a lower region thereof, a structure holding ring that is fixed around the upper structure, an arm that supports the ring and is movable up and down, a screw (including a bolt) that is fixed to one of the ring and the arm, and has a tip end abutting the other, and a pin that is provided in the ring or the arm, and passes through a hole for restricting horizontal movement of the ring.

First claim

What is claimed is:

1. A plasma processing apparatus comprising:
a processing vessel;
an upper structure that is provided on an upper portion of the processing vessel and generates plasma in a lower region thereof;
a structure holding ring that is fixed around the upper structure;
an arm that supports the ring and is movable up and down;
a screw that is fixed to one of the ring and the arm, and has a tip abutting the other; and
a pin that is provided in the ring or the arm, and passes through a hole for restricting horizontal movement of the ring, wherein
the pin is movable within the hole,
the screw does not fix the ring to the arm, and
the tip of the screw is slidable in a horizontal direction on a reference surface that the tip abuts.

2. A plasma processing apparatus comprising:
a processing vessel;
an upper structure that is provided on an upper portion of the processing vessel and generates plasma in a lower region thereof;
a structure holding ring that is fixed around the upper structure;
an arm that supports the ring and is movable up and down;
a screw that is fixed to one of the ring and the arm, and has a tip abutting the other; and
a pin that is provided in the ring or the arm, and passes through a hole for restricting horizontal movement of the ring, wherein
the pin is movable within the hole,
the tip of the screw comprises a rotatable ball,
the screw does not fix the ring to the arm, and
the ball of the screw is slidable in a horizontal direction on a reference surface that the rotatable ball abuts.

Assignees

• Tokyo Electron Ltd

Inventors

• Son Ryou
• Satou Ryouhei
• Kuwahara Yuichi
• Tawaraya Syuntaro

Classifications

• H10P72/0421

  for drying etching · CPC title

• H01J37/32458 Primary

  Vessel · CPC title

• H01J37/32192

  Microwave generated discharge (H01J37/32357, H01J37/32366, H01J37/32394, H01J37/32403 take precedence) · CPC title

• H01J37/32899 Primary

  Multiple chambers, e.g. cluster tools · CPC title

• H01J2237/334

  Etching · CPC title