Electroplating device

Patent metadata

Field	Value
Publication number	US-10968530-B2
Application number	US-201916260153-A
Country	US
Kind code	B2
Filing date	Jan 29, 2019
Priority date	Feb 22, 2018
Publication date	Apr 6, 2021
Grant date	Apr 6, 2021

Abstract

In-plane uniformity of a membrane electroplated on a polygon substrate is improved. An electroplating device includes an anode holder configured to hold an anode, a substrate holder configured to hold a polygon substrate, and a regulation plate provided between the anode holder and the substrate holder. The regulation plate has a body portion having a first polygon opening following an outer shape of the polygon substrate, and wall portions protruding on a substrate holder side from edges of the first polygon opening. The wall portions protrude over a first distance on the substrate holder side in first regions which contain middle portions of sides of the first polygon opening, and are notched in second regions which contain corner portions of the first polygon opening, or protrude over a second distance smaller than the first distance on the substrate holder side.

First claim

What is claimed is:

1. An electroplating device, comprising:
an anode holder, which is configured to hold an anode;
a substrate holder, which is configured to hold a polygon substrate; and
a regulation plate, which is provided between the anode holder and the substrate holder; wherein
the regulation plate has a body portion having a first polygon opening following an outer shape of the polygon substrate, and wall portions protruding on a substrate holder side from edges of the first polygon opening, wherein the wall portions comprises first regions and second regions; and
the wall portions protrude over a first distance on the substrate holder side in the first regions which contain middle portions of sides of the first polygon opening, and are notched in the second regions which contain corner portions of the first polygon opening, or protrude over a second distance smaller than the first distance on the substrate holder side in the second regions which contain the corner portions of the first polygon opening.

2. The electroplating device according to claim 1 , wherein the first regions of the wall portions viewed from a direction perpendicular to a plate surface of the body portion are trapezoidal shapes with outside sides which are longer.

3. The electroplating device according to claim 1 , further comprising a diaphragm which is arranged to block the first polygon opening of the regulation plate and allows metal ions to permeate and prevents additives from permeating.

4. The electroplating device according to claim 1 , further comprising an anode mask mounted to the anode holder, wherein the anode mask has an anode mask body portion having a second polygon opening following the outer shape of the polygon substrate, and anode mask wall portions protruding on the substrate holder side from edges of the second polygon opening, and
the anode mask wall portions protrude over a third distance on the substrate holder side in third regions which contain middle portions of sides of the second polygon opening, and are notched in fourth regions which contain corner portions of the second polygon opening, or protrude over a fourth distance smaller than the third distance on the substrate holder side in the fourth regions which contain the corner portions of the second polygon opening.

Assignees

• Ebara Corp

Inventors

• Shamoto Mitsuhiro
• Nakada Tsutomu
• Shimoyama Masashi

Classifications

• H10P72/76

  using mechanical means, e.g. clamps or pinches · CPC title

• H10P72/0476 Primary

  comprising at least one plating chamber · CPC title

• C25D17/002 Primary

  Cell separation, e.g. membranes, diaphragms · CPC title

• C25D17/06 Primary

  Suspending or supporting devices for articles to be coated · CPC title

• C25D5/08

  Electroplating with moving electrolyte e.g. jet electroplating {(using locally applied jets of electrolyte C25D5/026)} · CPC title