Nitrogen injection for ARC lamps

US10966286B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10966286-B2
Application numberUS-201615380139-A
CountryUS
Kind codeB2
Filing dateDec 15, 2016
Priority dateDec 30, 2015
Publication dateMar 30, 2021
Grant dateMar 30, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Systems and methods for reducing contamination of one or more arc lamps are provided. One example implementation is directed to a millisecond anneal system. The millisecond anneal system includes a processing chamber for thermally treating a substrate using a millisecond anneal process. The system further includes one or more arc lamps. Each of the one or more arc lamps is coupled to a water loop for circulating water through the arc lamp during operation of the arc lamp. The system includes a reagent injection source configured to introduce a reagent, such as nitrogen gas, into water circulating through the arc lamp during operation of the arc lamp.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of operating a water loop for circulating water through an arc lamp in a millisecond anneal system, the method comprising: obtaining, by one or more control devices comprising one or more processors; data indicative of a pH-value of water circulating through the water loop; obtaining, by the one or more control devices, data indicative of the state of arc lamp operation; adjusting a pH-value of the water circulating through the arc lamp based at least in part on the data indicative of the pH-value of the water; wherein adjusting the pH-value of the water circulating through the arc lamp comprises controlling, by the one or more control devices, a flow of nitrogen gas into the water circulating through the arc lamp. 2. The method of claim 1 , wherein adjusting a pH-value of the water circulating through the arc lamp comprises: determining, by the one or more control devices, an operating position for a nitrogen injection valve for injecting nitrogen into the water loop based at least in part on the data indicative of the pH-value of water circulating through the arc lamp and the data indicative of the state of arc lamp operation; and controlling, by the one or more control devices, the nitrogen injection valve based on the determined operating position. 3. The method of claim 2 , wherein the operating position for the nitrogen injection valve is determined to be open when the pH-value of the water is above an upper limit and the state of arc lamp operation is an on state. 4. The method of claim 3 , wherein the operating position for the nitrogen injection valve is determined to be closed when the state of arc lamp operation is an off state. 5. The method of claim 4 , wherein the operating position for the nitrogen injection valve is determined to be closed when the pH-value of the water is below a lower limit. 6. The method of claim 5 , wherein the upper limit is about 7.0 and the lower limit is about 6.5. 7. A method of operating a water loop for circulating water through an arc lamp in a millisecond anneal system, the method comprising: obtaining, by one or more control devices comprising one or more processors, data indicative of a pH-value of water circulating through the water loop; obtaining, by the one or more control devices, data indicative of the state of arc lamp operation; adjusting a pH-value of the water circulating through the arc lamp based at least in part on the data indicative of the pH-value of the water, wherein adjusting a pH-value of the water circulating through the arc lamp comprises: determining, by the one or more control devices, an operating position for a nitrogen injection valve for injecting nitrogen into the water loop based at least in part on the data indicative of the pH-value of water circulating through the arc lamp and the data indicative of the state of arc lamp operation; and controlling, by the one or more control devices, the nitrogen injection valve based on the determined operating position, and wherein the operating position for the nitrogen injection valve is determined to be open when the pH-value of the water is above an upper limit and the state of arc lamp operation is an on state. 8. A method of operating a water loop for circulating water through an arc lamp in a millisecond anneal system, the method comprising: obtaining, by one or more control devices comprising one or more processors, data indicative of a pH-value of water circulating through the water loop; obtaining, by the one or more control devices, data indicative of the state of arc lamp operation; and controlling, by the one or more control devices, a flow of non-plasma-generating gas into the water circulating through the arc lamp based at least in part on the data indicative of the pH of the water circulating through the arc lamp and the data indicative of the state of arc lamp operation to adjust a pH-value of the water circulating through the arc lamp. 9. The method of claim 8 , wherein the non-plasma-generating gas comprises nitrogen.

Assignees

Inventors

Classifications

  • Temperature monitoring · CPC title

  • characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

  • mainly by radiation · CPC title

  • mainly by convection · CPC title

  • heating or cooling of electrodes · CPC title

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What does patent US10966286B2 cover?
Systems and methods for reducing contamination of one or more arc lamps are provided. One example implementation is directed to a millisecond anneal system. The millisecond anneal system includes a processing chamber for thermally treating a substrate using a millisecond anneal process. The system further includes one or more arc lamps. Each of the one or more arc lamps is coupled to a water lo…
Who is the assignee on this patent?
Mattson Tech Inc, Beijing E Town Semiconductor Tech Co Ltd
What technology area does this patent fall under?
Primary CPC classification H05B3/0047. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 30 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).