Electrostatic chuck

Patent metadata

Field	Value
Publication number	US-10923382-B2
Application number	US-201816131245-A
Country	US
Kind code	B2
Filing date	Sep 14, 2018
Priority date	Mar 14, 2016
Publication date	Feb 16, 2021
Grant date	Feb 16, 2021

Abstract

An electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater plate. The heater plate is provided between the ceramic dielectric substrate and the base plate. The heater plate includes first and second support plates, first and second resin layers, and a heater element. Each of the first and second resin layers is provided between the first support plate and the second support plate. The heater element includes first and second electrically conductive portions. The first electrically conductive portion is provided between the first resin layer and the second resin layer. The second electrically conductive portion is separated from the first electrically conductive portion in an in-plane direction. The first resin layer contacts the second resin layer between the first electrically conductive portion and the second electrically conductive portion.

First claim

What is claimed is:

1. An electrostatic chuck, comprising:
a ceramic dielectric substrate where a processing object is placed;
a base plate supporting the ceramic dielectric substrate and being provided at a position separated from the ceramic dielectric substrate in a stacking direction; and
a heater plate provided between the ceramic dielectric substrate and the base plate,
the heater plate including
a first support plate including a metal and being provided between the ceramic dielectric substrate and the base plate,
a second support plate including a metal and being provided between the first support plate and the base plate,
a first resin layer provided between the first support plate and the second support plate,
a second resin layer provided between the first resin layer and the second support plate,
a heater element provided between the first resin layer and the second resin layer, the heater element emitting heat due to a current flowing, the heater element including a first electrically conductive portion and a second electrically conductive portion, the second electrically conductive portion being separated from the first electrically conductive portion in an in-plane direction perpendicular to the stacking direction, and
a first hollow portion defined by the second resin layer, the first resin layer, and a first side end portion in the in-plane direction of the first electrically conductive portion,

the first resin layer contacting the second resin layer between the first electrically conductive portion and the second electrically conductive portion,
the first electrically conductive portion having an upper surface opposing the first resin layer, and
a boundary between the first hollow portion and the second resin layer approaching a virtual plane away from the first side end portion in the in-plane direction, the virtual plane extending in the in-plane direction and passing through the upper surface.

2. The electrostatic chuck according to claim 1 , wherein
the first electrically conductive portion includes a second side end portion separated from the first side end portion in the in-plane direction, and
the heater plate has a second hollow portion, the second hollow portion being defined by the second side end portion, the first resin layer, and the second resin layer.

3. The electrostatic chuck according to claim 1 , wherein a width along the stacking direction of the first hollow portion is not more than a width along the stacking direction of the first electrically conductive portion.

4. The electrostatic chuck according to claim 1 , wherein a width along the stacking direction of the first hollow portion becomes narrower away from the first side end portion in the in-plane direction.

5. The electrostatic chuck according to claim 1 , wherein
the first electrically conductive portion has a lower surface opposing the second resin layer, and
a width along the in-plane direction of one surface of the upper surface or the lower surface is narrower than a width along the in-plane direction of the other surface of the upper surface or the lower surface.

6. The electrostatic chuck according to claim 5 , wherein the one surface and a side surface of the first electrically conductive portion are connected by a curved surface.

7. The electrostatic chuck according to claim 5 , wherein a side surface of the first electrically conductive portion is rougher than the other surface.

8. The electrostatic chuck according to claim 5 , wherein
a distance between a center virtual plane and one support plate of the first support plate or the second support plate is shorter than the distance between the center virtual plane and the other support plate of the first support plate or the second support plate, the center virtual plane extending in the in-plane direction and passing through a center in the stacking direction of the first electrically conductive portion, and
the one surface is positioned between the one support plate and the center virtual plane.

9. The electrostatic chuck according to claim 1 , wherein the first support plate is electrically coupled to the second support plate.

10. The electrostatic chuck according to claim 9 , wherein a surface area of a region where the first support plate is coupled to the second support plate is narrower than a surface area of an upper surface of the first support plate and narrower than a surface area of a lower surface of the second support plate.

11. The electrostatic chuck according to claim 1 , wherein
an upper surface of the first support plate includes a first unevenness, and
a lower surface of the second support plate includes a second unevenness.

12. The electrostatic chuck according to claim 11 , wherein
the first unevenness follows a configuration of the heater element, and
the second unevenness follows a configuration of the heater element.

13. The electrostatic chuck according to claim 12 , wherein a distance between a recess of the first unevenness and a recess of the second unevenness is shorter than a distance between a protrusion of the first unevenness and a protrusion of the second unevenness.

14. The electrostatic chuck according to claim 11 , wherein a height of the first unevenness is different from a height of the second unevenness.

15. The electrostatic chuck according to claim 1 , wherein
the heater element includes a heater electrode having a band configuration, and
the heater electrode is provided in a state of being mutually-independent in a plurality of regions.

16. The electrostatic chuck according to claim 1 , wherein
a plurality of the heater elements is provided, and
the plurality of heater elements is provided in a state of being independent in mutually-different layers.

17. The electrostatic chuck according to claim 1 , wherein the heater plate further includes a bypass layer provided between the first support plate and the second support plate, the bypass layer being electrically conductive.

18. The electrostatic chuck according to claim 17 , wherein the heater element is electrically coupled to the bypass layer and electrically insulated from the first support plate and the second support plate.

19. The electrostatic chuck according to claim 17 , wherein the heater plate further has a hollow portion provided at a side of the bypass layer.

20. The electrostatic chuck according to claim 19 , wherein
a side end of the first hollow portion is shifted toward the first support plate side or the second support plate side with respect to a center in a thickness direction of the first electrically conductive portion, and
a side end of the hollow portion at the side of the bypass layer is shifted in the same direction as the side end of the first hollow portion with respect to a center in a thickness direction of the bypass layer.

21. The electrostatic chuck according to claim 17 , wherein
the heater element has a first surface on the first support plate side, and a second surface on the second support plate side,
a width of the first surface is different from a width of the second surface,
the bypass layer has a third surface on the first support plate side, and a fourth surface on the second support plate side,
a width of the third surface is different from a width of the fourth surface, and
a width size relationship of the third surface to the fourth surface is the same as a width size relationship of the first surface to the second surface.

22. The elec

Assignees

• Toto Ltd

Inventors

• Uefuji Jumpei
• Sasaki Hitoshi
• Yamaguchi Kosuke
• Maehata Kengo
• Yoshii Yuichi

Classifications

• H10P72/0432 Primary

  mainly by conduction · CPC title

• H10P72/72

  using electrostatic chucks · CPC title

• H10P72/722 Primary

  Details of electrostatic chucks · CPC title

• B32B18/00

  Layered products essentially comprising ceramics, e.g. refractory products · CPC title

• H01L21/6831

  Electricity · mapped topic