Plasma processing apparatus

Patent metadata

Field	Value
Publication number	US-10903053-B2
Application number	US-201916549408-A
Country	US
Kind code	B2
Filing date	Aug 23, 2019
Priority date	Jun 17, 2016
Publication date	Jan 26, 2021
Grant date	Jan 26, 2021

Abstract

A plasma processing apparatus includes a chamber, a window plate disposed in an upper portion of the chamber and having a fastening hole defined therein, an injector having a body part including a plurality of nozzles and configured to be fastened to the fastening hole, and a flange part extending radially from the body part to partially cover a bottom surface of the window plate when the body part is fastened to the fastening hole, and a stopper configured to be fastened to the body part on an upper surface of the window plate to hold the injector in the fastening hole when the body part is fastened to the fastening hole.

First claim

What is claimed is:

1. A plasma processing apparatus comprising:
a chamber;
a window plate disposed in an upper portion of the chamber and having a hole; and
an injector configured to be disposed in the hole, the injector having a plurality of distribution nozzles for distributing a process gas, and a plurality of injection nozzles connected to the plurality of distribution nozzles and inclined along a circumference of the injector toward a lower surface of the injector,
wherein the injector comprises
a first body in which the plurality of distribution nozzles are disposed, and
a second body having an accommodating groove to which the first body is accommodated and in which the plurality of injection nozzles are disposed.

2. The plasma processing apparatus of claim 1 , wherein the plurality of injection nozzles are inclined in the same direction with respect to a central axis of the injector, respectively.

3. The plasma processing apparatus of claim 2 , wherein the same direction is a counterclockwise direction.

4. The plasma processing apparatus of claim 1 , wherein the accommodating groove comprises a first accommodating groove disposed in a central portion of the first body, and a second accommodating groove disposed around the first accommodating groove, and
wherein a bottom surface of the first accommodating groove is located at a lower vertical level than a bottom surface of the second accommodating groove.

5. The plasma processing apparatus of claim 4 , wherein a lower surface of the first body is spaced apart from the bottom surface of the first accommodating groove and from the bottom surface of the second accommodating groove by a predetermined distance.

6. The plasma processing apparatus of claim 4 , wherein the first accommodating groove has a cylindrical structure, and the second accommodating groove has a ring-shaped structure disposed around the first accommodating groove.

7. The plasma processing apparatus of claim 4 , wherein the plurality of injection nozzles extend downwardly from the second accommodating groove to connect to the lower surface of the injector.

8. The plasma processing apparatus of claim 4 , wherein the plurality of distribution nozzles comprise first distribution nozzles disposed in a center portion of the first body and located inside the first accommodating groove, and second distribution nozzles disposed around the first distribution nozzles and located inside the second accommodating groove.

9. The plasma processing apparatus of claim 8 , wherein the second distribution nozzles are connected to the injection nozzles in the second accommodating groove.

10. The plasma processing apparatus of claim 1 , wherein, when the first body of the injector is disposed in the accommodating groove, the injector has a space defined between the first body and the second body for accommodating the process gas between the first body and the second body.

11. The plasma processing apparatus of claim 1 , wherein the second body has a flange part extending radially outwardly to partially cover a bottom surface of the window plate.

12. A plasma processing apparatus comprising:
a chamber;
a window plate disposed in an upper portion of the chamber and having a hole;
a support member disposed in a lower portion of the chamber;
an antenna disposed above the window plate;
a power source for supplying power to the antenna; and
an injector having a body part configured to be fastened to the hole, the body part having a plurality of nozzles and a planar lower surface,
wherein the plurality of nozzles comprise a plurality of first nozzles disposed radially in a horizontal and lateral direction from a central axis of the body part and to be at an acute angle to a horizontal line perpendicular to the central axis of the body part, and a plurality of second nozzles disposed to be inclined along a circumference of the injector toward a lower surface of the injector and to be at an acute angle to a vertical line parallel to the central axis of the body part,
wherein the body part comprises
a first body, and
a second body having an accommodating groove to which the first body is accommodated and in which the plurality of nozzles are disposed.

13. The plasma processing apparatus of claim 12 , wherein the plurality of first nozzles extend radially from the central axis to be connected to an outer lateral surface of the body part.

14. The plasma processing apparatus of claim 12 , wherein the plurality of second nozzles are spirally disposed along the circumference of the injector toward the lower surface of the injector.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Kim Hak Young
• Hong Jung Pyo
• Sun Jong Woo
• Sung Doug Yong
• Lim Yong Ho
• Jeon Yun Kwang
• Jung Hwa Jun

Classifications

• H10P72/0421

  for drying etching · CPC title

• H01J2237/334

  Etching · CPC title

• H01J37/3244 Primary

  Gas supply means · CPC title

• H01J37/32119

  Windows · CPC title

• H01J37/32449

  Gas control, e.g. control of the gas flow · CPC title