Measurement device and semiconductor manufacturing system including the same

Patent metadata

Field	Value
Publication number	US-10872792-B2
Application number	US-201815894217-A
Country	US
Kind code	B2
Filing date	Feb 12, 2018
Priority date	Sep 12, 2017
Publication date	Dec 22, 2020
Grant date	Dec 22, 2020

Abstract

A measurement device includes an emitter configured to emit an electromagnetic signal to an object to be measured. A first detector is disposed to measure a first portion of the electromagnetic signal that is reflected by the object to be measured. A second detector is disposed to measure a second portion of the electromagnetic signal that is transmitted through the object to be measured. The emitter is configured to emit the electromagnetic signal in a direction substantially perpendicular to a surface of the object to be measured.

First claim

What is claimed is:

1. A measurement device comprising:
an emitter configured to emit an electromagnetic signal to an object to be measured;
a first detector disposed to measure a first portion of the electromagnetic signal that is reflected by a first surface of the object to be measured and a second portion of the electromagnetic signal that is reflected by a second surface of the object to be measured;
a second detector disposed to measure a third portion of the electromagnetic signal that is transmitted through the object to be measured, wherein the emitter is configured to emit the electromagnetic signal in a direction substantially perpendicular to a surface of the object to be measured; and
a processor configured to calculate a refractive index of the object to be measured based on the electromagnetic signal measured by the first detector and the second detector,
wherein the first surface of the object to be measured is adjacent to the emitter, wherein the first detector is further configured to measure a first time difference defined as a difference between a time taken for the first portion of the electromagnetic signal to be reflected by the first surface of the object and reach the first detector and a time taken for the second portion of the electromagnetic signal to be reflected by the second surface of the object to be measured and reach the first detector, and herein the second detector is further configured to measure a second time difference defined as a difference between a time taken for the third portion of the electromagnetic signal to be transmitted by a mold and a package substrate and reach the second detector and a time taken for the third portion of the electromagnetic signal to be transmitted by the package substrate and reach the second detector.

2. The measurement device of claim 1 , wherein the processor is configured to calculate a thickness of the object to be measured based on the first time difference, the second time difference, and the calculated refractive index.

3. The measurement device of claim 1 , wherein the emitter, the first detector, and the second detector are each configured to move relative to the object to be measured in a direction parallel to a plane of the first measurement surface.

4. The measurement device of claim 1 , wherein a portion of the first measurement surface that the electromagnetic signal reaches, vertically overlaps a portion of the second measurement surface that the electromagnetic signal reaches.

5. A measurement device comprising:
an emitter configured to emit an electromagnetic signal to an object to be measured;
a first detector spaced apart from the emitter with the object to be measured disposed therebetween; and
a second detector spaced apart from the first detector with the object to be measured disposed therebetween, the second detector being adjacent to the emitter,
wherein the emitter is configured to emit the electromagnetic signal in a direction substantially perpendicular to a surface of the object to be measured,
wherein the object to be measured has a first measurement surface adjacent to the emitter and a second measurement surface opposite to the first measurement surface,
wherein the first detector is further configured to measure a first time difference defined as a difference between a time taken for a first portion of the electromagnetic signal to be reflected by the first measurement surface and reach the first detector and a time taken for the first portion of the electromagnetic signal to be reflected by the second measurement surface and reach the first detector, and
wherein the second detector is further configured to measure a second time difference defined as a difference between a time taken for a second portion of the electromagnetic signal to be transmitted by a mold and a package substrate and reach the second detector and a time taken for the second portion of the electromagnetic signal to be transmitted by the package substrate and reach the second detector.

6. The measurement device of claim 5 , further comprising a splitter disposed between the emitter and the object to be measured, configured to transmit at least a portion of the electromagnetic signal emitted by the emitter, and configured to reflect at least a portion of the first portion of the electromagnetic signal reflected by the object to be measured.

7. The measurement device of claim 5 , wherein the object to be measured comprises:
the package substrate extending in a horizontal direction and having a consistent vertical thickness;
a semiconductor chip disposed on the package substrate; and
the mold disposed on the package substrate and covering the semiconductor chip,
wherein the first detector, the second detector, and the emitter are each configured to move relative to the object to be measured in the horizontal direction with respect to the object to be measured.

8. The measurement device of claim 7 , wherein the measurement device is configured to measure a thickness and a refractive index of the mold.

9. The measurement device of claim 7 , wherein the first detector is further configured to measure the first portion of the electromagnetic signal reflected by a top surface and a bottom surface of the mold.

10. The measurement device of claim 7 , wherein the second detector is configured to measure the second portion of the electromagnetic signal transmitted by the package substrate, or measure the second portion of the electromagnetic signal transmitted by the package substrate and the mold.

11. A semiconductor package manufacturing system comprising:
a package mounter configured to manufacture a semiconductor package including a package substrate, a semiconductor chip, and a mold;
a mold measurement device configured to measure a refractive index and a thickness of the mold; and
a transporter configured to transfer the semiconductor package to the mold measurement device,
wherein the package mounter comprises:
a package mounting station configured to mount the semiconductor chip on the package substrate and provide the mold to cover the semiconductor chip; and
a manufacturing processor configured to control the package mounting station, and the mold measurement device comprises:
an emitter configured to emit an electromagnetic signal to the semiconductor package;
a first detector disposed to measure a first portion of the electromagnetic signal reflected by the semiconductor package;
a second detector disposed to measure a second portion of the electro magnetic signal transmitted by the semiconductor package; and
a measurement processor configured to calculate the refractive index and the thickness of the mold based on the electromagnetic signal measured by the first and second detectors,
wherein the emitter is configured to emit the electromagnetic signal in a direction substantially perpendicular to a surface of the semiconductor package,
wherein the mold has a bottom surface in contact with the package substrate and a top surface opposite the bottom surface,
wherein the first detector is further configured to measure a first time difference defined as a difference between a time taken by the first portion of the electromagnetic signal reflected by a portion of the top surface to reach the first detector and a time taken by the first portion of the electromagnetic signal reflected by a portion of the bottom surface vertically overlapping the portion of the top surface to reach the first detector, and
wherein the second detector is further configured to measure a second time difference defined as a difference between a time taken by the second portion of the electromagnetic signal transmitted by th

Assignees

• Samsung Electronics Co Ltd
• Samsung Electronics Ltd

Inventors

• Kim Sang-Soo
• Park Sung-Kyu
• Kim Seung-Hwan
• Kim Yun-Young
• Park Jun-Woo

Classifications

• H10P74/203

  Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects · CPC title

• H10P72/0604 Primary

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• G01N21/3581 Primary

  using far infrared light; using Terahertz radiation · CPC title

• G01B11/06

  for measuring thickness {; e.g. of sheet material (thickness measurement by thermal means G01B21/085)} · CPC title

• G01N21/9501

  Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20) · CPC title