Surface-treated plated material, connector terminal, connector, FFC terminal, FFC, FPC and electronic part

US10868383B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10868383-B2
Application numberUS-201715764474-A
CountryUS
Kind codeB2
Filing dateJan 30, 2017
Priority dateJan 30, 2017
Publication dateDec 15, 2020
Grant dateDec 15, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A surface-treated plated material is provided. The surface-treated plated material can suppress generation of whiskers, maintain good solderability and low contact resistance even when exposed to an elevated temperature environment, and have lower insertion force for terminals/connectors. The surface-treated plated material comprises a substrate provided with an upper layer, and the upper layer comprises a plated material containing Sn or In. A surface of the plated material contains at least one compound represented by a certain general formula and at least one compound represented by a certain general formula. One or more compounds selected from a group D of constituent compounds represented by certain general formulae are further applied onto a surface on the upper layer side.

First claim

Opening claim text (preview).

What is claimed is: 1. A surface-treated plated material, comprising a substrate provided with an upper layer, the upper layer comprising a plated material containing Sn or In, wherein the plated material comprises: a lower layer comprising one or more selected from a group A of constituent elements consisting of Ni, Cr, Mn, Fe, Co, and Cu, the lower layer being formed on the substrate; an intermediate layer comprising one or more selected from said group A of constituent elements and one or two selected from a group B of constituent elements consisting of Sn and In, the intermediate layer being formed on the lower layer; and an upper layer comprising an alloy of one or two selected from said B group of constituent elements and one or more selected from a group C of constituent elements consisting of Ag, Au, Pt, Pd, Ru, Rh, Os, and Ir, the upper layer being formed on the intermediate layer, and wherein a surface of the plated material contains at least one compound represented by the following general formula [1] or [2] and at least one compound represented by the following general formula [3], and wherein one or more compounds selected from a group D of constituent compounds represented by the following general formulae [4] to [8] are further applied onto a surface on the upper layer side: in which formula [1] or [2], R 1 and R 2 each independently represents an alkyl or a substituted alkyl, and M 1 represents hydrogen or an alkali metal; in which formula [3], R 3 represents an alkali metal or hydrogen; in which formula [4], R 4 and R 5 each independently represents an alkyl or a substituted alkyl, M 2 represents an alkali metal or an alkaline earth metal, and n represents an integer; in which formula [5], R 6 represents hydrogen, an alkyl, or a substituted alkyl, and R 7 represents an alkali metal, hydrogen, an alkyl, or a substituted alkyl; C n H m    6 in which formula [6], n and m each represents an integer; in which formula [7], R 8 represents an alkyl or a substituted alkyl; R 9 —O—R 10 —OH   8 in which formula [8], R 9 and R 10 each independently represents an alkyl or a substituted alkyl. 2. The surface-treated plated material according to claim 1 , wherein the total applied amount of the D constituent compound(s) present on the surface of the plated material is from 0.005 μg/mm 2 to 10.0 μg/mm 2 . 3. The surface-treated plated material according to claim 1 , wherein a thickness of the lower layer is 0.05 μm or more and less than 5.00 μm, wherein a thickness of the intermediate layer is 0.01 μm or more and less than 0.40 μm, and wherein a thickness of the upper layer is 0.02 μm or more and less than 1.00 μm. 4. The surface-treated plated material according to claim 1 , wherein the upper layer contains from 10 at. % to 50 at. % of the one or two metals of the group B of constituent elements. 5. The surface-treated plated material according to claim 1 , wherein the upper layer comprises a ζ (zeta) phase of a SnAg alloy containing from 11.8 at. % to 22.9 at. % of Sn. 6. The surface-treated plated material according to claim 1 , wherein the upper layer comprises an ε (epsilon) phase of Ag 3 Sn. 7. The surface-treated plated material according to claim 1 , wherein the upper layer comprises a ζ (zeta) phase of a SnAg alloy containing from 11.8 at. % to 22.9 at. % of Sn and an ε (epsilon) phase of Ag 3 Sn. 8. The surface-treated plated material according to claim 1 , wherein the upper layer only comprises an ε (epsilon) phase of Ag 3 Sn. 9. The surface-treated plated material according to claim 1 , wherein the upper layer comprises an ε (epsilon) phase of Ag 3 Sn and βSn of a Sn single phase. 10. The surface-treated plated material according to claim 1 , wherein the upper layer comprising a ζ (zeta) phase of a SnAg alloy containing from 11.8 at. % to 22.9 at. % of Sn, an ε (epsilon) phase of Ag 3 Sn, and βSn of a single Sn phase. 11. The surface-treated plated material according to claim 1 , wherein the intermediate layer contains 35 at. % or more of the one or two metals of the group B of constituent elements. 12. The surface-treated plated material according to claim 1 , wherein the intermediate layer comprises Ni 3 Sn 4 . 13. The surface-treated plated material according to claim 1 , wherein the intermediate layer comprises Ni 3 Sn 4 and βSn of a single Sn phase. 14. The surface-treated plated material according to claim 1 , wherein it comprises a ratio of thicknesses of the upper layer to the intermediate layer of from 9:1 to 3:7 in the upper layer:the intermediate layer. 15. The surface-treated plated material according to claim 1 , wherein it comprises an indentation hardness on a surface of the upper layer of 1000 MPa or more and 10000 MPa or less, the indentation hardness being obtained by measuring a dent struck with a load of 3 mN on the surface of the upper layer by an ultra-micro hardness tester. 16. The surface-treated plated material according to claim 1 , wherein it comprises an arithmetic mean height (Ra) of a surface of the upper layer of 0.3 μm or less. 17. The surface-treated plated material according to claim 1 , wherein it comprises a maximum height (Rz) of a surface of the upper layer of 3 μm or less. 18. The surface-treated plated material according to claim 1 , wherein it comprises the one or more metals of the group A of constituent elements in a total 50% by mass or more of Ni, Cr, Mn, Fe, Co, and Cu, and further comprises one or more selected from the group consisting of B, P, Sn, and Zn. 19. The surface-treated plated material according to claim 1 , wherein it comprises the one or two metals of the group B of constituent elements in a total 50% by mass or more of Sn and In, the remaining alloy component being one or more metals selected from the group consisting of Ag, Au, Bi, Cd, Co, Cr, Cu, Fe, Mn, Mo, Ni, Pb, Sb, W, and Zn. 20. The surface-treated plated material according to claim 1 , wherein it comprises the one or more metals of the group C of constituent elements in the total 50% by mass or more of Ag, Au, Pt, Pd, Ru, Rh, Os, and Ir, the remaining alloy component being one or more metals selected from the group consisting of Bi, Cd, Co, Cu, Fe, In, Mn, Mo, Ni, Pb, Sb, Se, Sn, W, TI, and Zn. 21. The surface-treated plated material according to claim 1 , wherein the intermediate layer is comprised of Ni 3 Sn and Ni 3 Sn 2 . 22. The surface-treated plated material according to claim 1 , wherein the intermediate layer is comprised of Ni 3 Sn 2 . 23. The surface-treated plated material according to claim 1 , wherein the intermediate layer is comprised of Ni 3 Sn 4 . 24. The surface-treated plated material according to claim 1 , further comprising a layer comprising an alloy of the one or more metals of the group A of constituent elements and the one or more metals of the group C of constituent elements, be

Assignees

Inventors

Classifications

  • Electroplating characterised by the article coated · CPC title

  • Terminals having a press fit or a compliant portion and a shank passing through a hole in the printed circuit board · CPC title

  • of metals not provided for in groups C25D3/04 - C25D3/50 · CPC title

  • with zinc as the next major constituent · CPC title

  • Alloys based on silver · CPC title

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What does patent US10868383B2 cover?
A surface-treated plated material is provided. The surface-treated plated material can suppress generation of whiskers, maintain good solderability and low contact resistance even when exposed to an elevated temperature environment, and have lower insertion force for terminals/connectors. The surface-treated plated material comprises a substrate provided with an upper layer, and the upper layer…
Who is the assignee on this patent?
Jx Nippon Mining & Metals Corp
What technology area does this patent fall under?
Primary CPC classification C25D5/505. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 15 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 9 related publications on this page (citations in our corpus or others sharing the same primary CPC).