Alignment systems employing actuators providing relative displacement between lid assemblies of process chambers and substrates, and related methods

Patent metadata

Field	Value
Publication number	US-10858735-B2
Application number	US-201916561329-A
Country	US
Kind code	B2
Filing date	Sep 5, 2019
Priority date	Sep 10, 2014
Publication date	Dec 8, 2020
Grant date	Dec 8, 2020

Abstract

Alignment systems employing actuators provide relative displacement between lid assemblies of process chambers and substrates, and related methods are disclosed. A process chamber includes chamber walls defining a process volume in which a substrate may be placed and the walls support a lid assembly of the process chamber. The lid assembly contains at least one of an energy source and a process gas dispenser. Moreover, an alignment system may include at least one each of a bracket, an interface member, and an actuator. By attaching the bracket to the chamber wall and securing the interface member to the lid assembly, the actuator may communicate with the bracket and the interface member to provide relative displacement between the chamber wall and the lid assembly. In this manner, the lid assembly may be positioned relative to the substrate to improve process uniformity across the substrate within the process chamber.

First claim

What is claimed is:

1. A method of aligning a lid assembly of a process chamber and processing a substrate therein, comprising:
sealing an opening of the process chamber with the lid assembly;
moving a reference location on the lid assembly relative to a chamber wall of the process chamber in a first direction from a first position in a horizontal plane to a second position in the horizontal plane, the opening of the process chamber remaining sealed during the moving of the reference location on the lid assembly from the first position to the second position;
moving the reference location on the lid assembly relative to the chamber wall of the process chamber in a second direction from the second position in the horizontal plane to a third position in the horizontal plane, the opening of the process chamber remaining sealed by the lid assembly during the moving of the reference location on the lid assembly from the second position to the third position; and
processing a substrate inside the process chamber after moving the reference location on the lid assembly from the second position to the third position, wherein the opening of the process chamber remains sealed by the lid assembly from before the moving of the reference location on the lid assembly from the second position to the third position until after the substrate is processed inside the process chamber.

2. The method of claim 1 , wherein the first direction is substantially orthogonal to the second direction.

3. The method of claim 1 , wherein moving the reference location on the lid assembly from the first position to the second position is performed in response to measurements determined from one or more images captured by a camera wafer positioned inside the process chamber.

4. The method of claim 1 , wherein moving the reference location on the lid assembly from the first position to the second position is performed in response to measuring one or more features on a substrate positioned inside the process chamber.

5. The method of claim 1 , wherein moving the reference location on the lid assembly from the first position to the second position is performed when a substrate is positioned inside the process chamber.

6. The method of claim 1 , wherein the lid assembly comprises an energy source configured to generate a plasma inside the process chamber and a gas dispenser.

7. A method of aligning a lid assembly of a process chamber and processing a substrate therein, comprising:
sealing an opening of the process chamber with the lid assembly;
moving a reference location on the lid assembly relative to a chamber wall of the process chamber in a first direction from a first position in a first plane to a second position in the first plane, the opening of the process chamber remaining sealed during the moving of the reference location on the lid assembly from the first position to the second position;
moving the reference location on the lid assembly relative to the chamber wall of the process chamber in the first direction from the second position in the first plane to a third position in the first plane, the opening of the process chamber remaining sealed by the lid assembly during the moving of the reference location on the lid assembly from the second position to the third position and the first plane is located a first distance from a substrate support disposed in the process chamber; and
processing a substrate inside the process chamber after moving the reference location on the lid assembly from the second position to the third position, wherein the opening of the process chamber remains sealed by the lid assembly from before the moving of the reference location on the lid assembly from the second position to the third position until after the substrate is processed inside the process chamber.

8. The method of claim 7 , wherein moving the reference location on the lid assembly from the first position to the second position is performed in response to measurements determined from one or more images captured by a camera wafer positioned inside the process chamber.

9. The method of claim 7 , wherein moving the reference location on the lid assembly from the first position to the second position is performed in response to measuring one or more features on a substrate positioned inside the process chamber.

10. The method of claim 7 , wherein moving the reference location on the lid assembly from the first position to the second position is performed when a substrate is positioned inside the process chamber.

11. The method of claim 7 , wherein the lid assembly comprises an energy source configured to generate a plasma inside the process chamber and a gas dispenser.

12. A method of aligning a lid assembly of a process chamber and processing a substrate therein, comprising:
sealing an opening of the process chamber with the lid assembly, wherein the process chamber comprises a substrate support configured to support a substrate in a first horizontal plane;
moving a reference location on the lid assembly relative to a chamber wall of the process chamber in a first direction from a first position in a second horizontal plane to a second position in the second horizontal plane in response to one or more measurements taken from inside the process chamber, wherein the opening of the process chamber remains sealed by the lid assembly during the moving of the reference location on the lid assembly from the first position to the second position; and
processing a substrate inside the process chamber after moving the reference location on the lid assembly from the first position to the second position, wherein the opening of the process chamber remains sealed by the lid assembly from before the moving of the reference location on the lid assembly from the first position to the second position until after the substrate is processed inside the process chamber.

13. The method of claim 12 , wherein the one or more measurements comprise one more measurements determined from one or more images captured by a camera wafer positioned inside the process chamber.

14. The method of claim 13 , wherein the one or measurements determined from the one or more images comprises a positional error of the lid assembly relative to an optical axis of the camera wafer.

15. The method of claim 12 , wherein the one or more measurements comprise one more measurements of one or more features on a substrate positioned inside the process chamber.

16. The method of claim 12 , further comprising continuously monitoring the one or more measurements from inside the process chamber during a process performed on a substrate inside the process chamber and continuously using the one or more measurements to control a position of the reference location on the lid assembly relative to the chamber wall.

17. The method of claim 12 , wherein moving the reference location on the lid assembly from the first position to the second position is performed when a substrate is positioned inside the process chamber.

18. The method of claim 12 , wherein the lid assembly comprises an energy source configured to generate a plasma inside the process chamber and a gas dispenser.

Assignees

• Applied Materials Inc

Inventors

• Wang Danny D
• Lamb Jason Michael
• Choi Jun Tae
• Choudhury Rupankar
• Hua Zhong Qiang
• Rocha-Alvarez Juan Carlos

Classifications

• C23C16/507

  using external electrodes, e.g. in tunnel type reactors · CPC title

• C23C16/455

  characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber · CPC title

• C23C16/4409 Primary

  characterised by sealing means · CPC title

• B01J3/006

  Processes utilising sub-atmospheric pressure; Apparatus therefor · CPC title

• B01J3/002

  Component parts of these vessels not mentioned in B01J3/004, B01J3/006, B01J3/02 - B01J3/08; Measures taken in conjunction with the process to be carried out, e.g. safety measures · CPC title