Exposure apparatus and exposure method, and flat panel display manufacturing method
US-11086236-B2 · Aug 10, 2021 · US
using an addressed light valve, e.g. a liquid crystal device
using an addressed light valve, e.g. a liquid crystal device · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/2057 |
| Official title | {using an addressed light valve, e.g. a liquid crystal device} |
| Display label | using an addressed light valve, e.g. a liquid crystal device |
| Total patents | 103 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly growing.
| Year | Patents |
|---|---|
| 2015 | 6 |
| 2016 | 10 |
| 2017 | 6 |
| 2018 | 11 |
| 2019 | 11 |
| 2020 | 15 |
| 2021 | 4 |
| 2022 | 10 |
| 2023 | 7 |
| 2024 | 12 |
| 2025 | 10 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Method and device for exposure of photosensitive layer
US-10852528-B2 · Dec 1, 2020 · US
Exposure apparatus and exposure method, and flat panel display manufacturing method
US-2020363730-A1 · Nov 19, 2020 · US
Exposure apparatus and exposure method, and flat panel display manufacturing method
US-2020326638-A1 · Oct 15, 2020 · US
Half tone scheme for maskless lithography
US-2020264517-A1 · Aug 20, 2020 · US
Exposure apparatus and exposure method, and flat panel display manufacturing method
US-10732517-B2 · Aug 4, 2020 · US
Exposure apparatus and exposure method, and flat panel display manufacturing method
US-10732510-B2 · Aug 4, 2020 · US
Immersion liquid, exposure apparatus, and exposure process
US-10712675-B2 · Jul 14, 2020 · US
Quarter wave light splitting
US-10705431-B2 · Jul 7, 2020 · US
Devices and methods for non-planar photolithography of nail polish
US-10684547-B2 · Jun 16, 2020 · US
Imprint apparatus and product manufacturing method
US-2020150529-A1 · May 14, 2020 · US
Mask plate, exposure system and exposure method
US-10620541-B2 · Apr 14, 2020 · US
Method and device for exposure of photosensitive layer
US-2020089121-A1 · Mar 19, 2020 · US
Tuneable flat panel UV exposure system for screen printing
US-10576733-B2 · Mar 3, 2020 · US
Maskless exposure apparatus and method, and manufacturing method of a semiconductor device including the maskless exposure method
US-2020041907-A1 · Feb 6, 2020 · US
Systems, devices, and methods for printing on three-dimensional objects
US-10551744-B2 · Feb 4, 2020 · US
Method of making a lithographic printing plate precursor containing a diazonium compound
US-2019391495-A1 · Dec 26, 2019 · US
Half tone scheme for maskless lithography
US-10495979-B1 · Dec 3, 2019 · US
Quarter wave light splitting
US-2019339622-A1 · Nov 7, 2019 · US
Multi-configuration digital lithography system
US-10459341-B2 · Oct 29, 2019 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F7/2057?
- CPC G03F7/2057 is the Cooperative Patent Classification code for “using an addressed light valve, e.g. a liquid crystal device.”
- How many patents are filed under CPC G03F7/2057 (using an addressed light valve, e.g. a liquid crystal device)?
- Our database includes 103 publications tagged with this CPC code.
- Is patent activity under CPC G03F7/2057 growing?
- Publication counts under this code: 12 in 2024 vs 10 in 2025 (latest complete years).