Susceptor support

Patent metadata

Field	Value
Publication number	US-10837121-B2
Application number	US-201715470268-A
Country	US
Kind code	B2
Filing date	Mar 27, 2017
Priority date	Mar 28, 2016
Publication date	Nov 17, 2020
Grant date	Nov 17, 2020

Abstract

Embodiments described herein generally relate to a susceptor support for supporting a susceptor in a deposition process. The susceptor support includes a shaft, a plate with a first major surface coupled to the shaft, and a support element extending from a second major surface of the plate. The plate may be made of a material that is optically transparent to the radiation energy from a plurality of energy sources disposed below the plate. The plate may have a thickness that is small enough to minimize radiation transmission loss and large enough to be thermally and mechanically stable to support the susceptor during processing. The thickness of the plate may range from about 2 mm to about 20 mm.

First claim

The invention claimed is:

1. An apparatus, comprising:
a shaft;
a plate having a bottom surface in contact with the shaft, wherein the plate comprises quartz, fused quartz, alumina, sapphire, or yttria, and the plate has a thickness ranging from about 2 mm to about 20 mm; and
a support element extending from a top surface of the plate, wherein the support element comprises a plurality of cylindrical posts, and each cylindrical post of the plurality of cylindrical posts comprises a wall and a tapered portion connected to the wall.

2. The apparatus of claim 1 , wherein the plate has a thickness ranging from about 4 mm to about 8 mm.

3. The apparatus of claim 1 , wherein the tapered portion comprises a linear taper.

4. The apparatus of claim 1 , wherein the tapered portion comprises a curved taper.

5. The apparatus of claim 1 , further comprising a hollow cylinder extending from the top surface of the plate, wherein the plurality of cylindrical posts are disposed radially outward of the hollow cylinder.

6. The apparatus of claim 1 , wherein the support element comprises quartz, fused quartz, silicon carbide, silicon nitride, silicon carbide coated graphite, glassy carbon coated graphite, silicon nitride coated graphite, glassy carbon, graphite, silicon carbide coated quartz, or glassy carbon coated quartz.

7. A process chamber, comprising:
a first enclosure member;
a second enclosure member;
a susceptor support, wherein at least a portion of the susceptor support is disposed between the first enclosure member and the second enclosure member, wherein the susceptor support comprises:
a shaft;
a plate having a bottom surface in contact with the shaft, wherein the plate comprises quartz, fused quartz, alumina, sapphire, or yttria, and the plate has a thickness ranging from about 2 mm to about 20 mm; and
a support element extending from a top surface of the plate, wherein the support element comprises a plurality of cylindrical posts, and each cylindrical post of the plurality of cylindrical posts comprises a wall and a tapered portion connected to the wall; and

a plurality of energy sources disposed facing the second enclosure member.

8. The process chamber of claim 7 , further comprising a susceptor disposed on the susceptor support, wherein a distance between the susceptor and the susceptor support ranges from about 10 mm to about 60 mm.

9. An apparatus, comprising:
a shaft;
a plate having a bottom surface in contact with the shaft, wherein the plate comprises quartz, fused quartz, alumina, sapphire, or yttria, and the plate has a thickness ranging from about 2 mm to about 20 mm; and
a support element extending from a top surface of the plate, wherein the support element comprises a hollow cylinder having an inside diameter and a thickness, and a sum of the inside diameter and the thickness is less than a diameter of the plate.

10. The apparatus of claim 9 , wherein the support element comprises quartz, fused quartz, silicon carbide, silicon nitride, silicon carbide coated graphite, glassy carbon coated graphite, silicon nitride coated graphite, glassy carbon, graphite, silicon carbide coated quartz, or glassy carbon coated quartz.

11. The apparatus of claim 9 , further comprising a plurality of cylindrical posts extending from the top surface of the plate.

12. The apparatus of claim 11 , wherein the plurality of cylindrical posts is disposed radially outward of the hollow cylinder.

13. The apparatus of claim 11 , wherein each of the plurality of cylindrical posts comprises a wall and a tapered portion connected to the wall.

14. The apparatus of claim 13 , wherein the tapered portion comprises a linear taper.

Assignees

• Applied Materials Inc

Inventors

• Collins Richard O
• Sanchez Errol Antonio C
• Carlson David K
• Samir Mehmet Tugrul

Classifications

• H10P72/7614 Primary

  characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title

• H10P72/7606

  characterised by edge clamping, e.g. clamping ring · CPC title

• H10P72/7624 Primary

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• C23C16/4583 Primary

  the substrate being supported substantially horizontally · CPC title

• C30B25/105

  by irradiation or electric discharge · CPC title