Antenna and plasma processing apparatus

US10825658B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10825658-B2
Application numberUS-201816014628-A
CountryUS
Kind codeB2
Filing dateJun 21, 2018
Priority dateJun 22, 2017
Publication dateNov 3, 2020
Grant dateNov 3, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

In an antenna including a dielectric window and a slot plate provided on one surface of the dielectric window, in a case where a reference position g is a center position in a width direction of each slot S and a center position in a length direction in the slot plate, the reference position g of each slot is located on a virtual circle centered on a center of gravity G0, and line segments connecting the reference positions g of the slots S and virtual point G1 to which the slots belong are located radially from a virtual point G1, angles (β1 to β4) between adjacent line segments are equal to each other, and angles (θ1 to θ4) formed by the length directions of the slots S at the reference positions g and the line segments to which the slots belong are equal to each other.

First claim

Opening claim text (preview).

What is claimed is: 1. An antenna comprising: a dielectric window; and a slot plate provided on one surface of the dielectric window, wherein a plurality of center points are defined on a first circle that surrounds a center of the slot plate and, surrounding each center point of the plurality of center points, a respective second circle is defined, such that, along each second circle, a set including four or more slots is disposed to form a respective slot group, each slot including a reference position that is defined at a center position in a width direction of the slot and a center position in a length direction of the slot, the reference position of each slot is located on the respective second circle and connected to the respective center point to which the slot belongs by a line segment that extends radially from the respective center point to the respective reference position, such that the plurality of line segments constitute adjacent line segments forming a plurality of first angles that are each equal to each other, and a plurality of alignment angles is formed, with each respective one of the alignment angles being between a respective line segment and a line extending along the length direction of the respective slot, such that the plurality of alignment angles are each equal to each other. 2. The antenna according to claim 1 , wherein a shape of each slot is a shape extending linearly so that an orientation in the length direction does not change. 3. The antenna according to claim 2 , wherein a shape of each slot is a rectangle shape or an elongated hole shape. 4. The antenna according to claim 1 , wherein a shape of each slot is an arc shape. 5. A plasma processing apparatus comprising: the antenna according to claim 1 ; a processing vessel to which the antenna is attached; a base which is provided inside the processing vessel and faces the dielectric window, and on which a substrate to be processed is placed; and a microwave generator that supplies a microwave to the antenna. 6. The antenna according to claim 1 , wherein for each slot, the respective alignment angle is more than 45°. 7. The antenna according to claim 1 , wherein the dielectric window comprises a first annular recess. 8. The antenna according to claim 7 , wherein the first annular recess includes an inner tapered surface and an outer tapered surface. 9. The antenna according to claim 7 , wherein in the first annular recess, a plurality of second recesses, each having a circular shape, are formed at equal intervals along a circumferential direction of the first annular recess. 10. The antenna according to claim 9 , wherein of the plurality of center points, a location of each center point coincides with a center of a respective second recess of the plurality of second recesses. 11. The antenna according to claim 9 , wherein when viewed along a thickness direction of the slot plate, each second recess is surrounded by a respective slot group. 12. The antenna according to claim 1 , wherein a length of each slot in the length direction of the respective slot is greater than a width of the respective slot in the width direction of the respective slot. 13. The antenna according to claim 12 , wherein a length of each slot in the length direction of the respective slot is less than or equal to 3λ/2, where λ is a wavelength of a microwave radiated from the dielectric window.

Assignees

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Classifications

  • of silicon-containing layers · CPC title

  • with electric discharge tube · CPC title

  • Antennas · CPC title

  • using an ionized gas · CPC title

  • Housings not intimately mechanically associated with radiating elements, e.g. radome · CPC title

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Frequently asked questions

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What does patent US10825658B2 cover?
In an antenna including a dielectric window and a slot plate provided on one surface of the dielectric window, in a case where a reference position g is a center position in a width direction of each slot S and a center position in a length direction in the slot plate, the reference position g of each slot is located on a virtual circle centered on a center of gravity G0, and line segments conn…
Who is the assignee on this patent?
Tokyo Electron Ltd
What technology area does this patent fall under?
Primary CPC classification H01J37/3222. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 03 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).