Self-contained metrology wafer carrier systems

US10818528B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10818528-B2
Application numberUS-201916248220-A
CountryUS
Kind codeB2
Filing dateJan 15, 2019
Priority dateJun 27, 2016
Publication dateOct 27, 2020
Grant dateOct 27, 2020

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Self-contained metrology wafer carrier systems and methods of measuring one or more characteristics of semiconductor wafers. The wafer carrier system may include a housing configured for transport within the automated material handling system. A support is configured to support a semiconductor wafer within a housing. A metrology system is disposed within the housing. The metrology system is operable to measure at least one characteristic of the wafer. The metrology system may include a sensing unit and a computing unit operably connected to the sensing unit.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus transportable by an automated material handling system to a plurality of stations, the apparatus comprising: a front opening unified pod configured to be engaged with the automated material handling system for transport within the automated material handling system to the plurality of stations; a platform within the front opening unified pod, the platform configured to support a semiconductor wafer; an enclosure within the front opening unified pod; a metrology system including a sensor within the enclosure and a computing unit that is connected with the sensor, the sensor configured to obtain data regarding the semiconductor wafer; a micro-motion motor configured to move the platform relative to the metrology system; and a power source configured to power the computing unit, the sensor, or both, the power source located inside the front opening unified pod. 2. The apparatus of claim 1 wherein the metrology system includes a network adaptor operably connected with the computing unit, the network adaptor configured to communicate the data over a communication link. 3. The apparatus of claim 1 wherein the power source comprises a battery. 4. The apparatus of claim 1 wherein the power source comprises a rechargeable battery. 5. An apparatus transportable by an automated material handling system to a plurality of stations, the apparatus comprising: a front opening unified pod configured to be engaged with the automated material handling system for transport within the automated material handling system to the plurality of stations; a platform within the front opening unified pod, the platform configured to support semiconductor wafer; an enclosure within the front opening unified pod; a metrology system including a sensor within the enclosure, the sensor configured to obtain data regarding the semiconductor wafer; and a micro-motion motor configured to move the platform relative to the metrology system. 6. The apparatus of claim 5 wherein the metrology system includes a network adaptor configured to communicate the data over a communication link. 7. The apparatus of claim 6 wherein the network adaptor is a wireless transmitter. 8. The apparatus of claim 6 wherein the network adaptor is a transmitter. 9. The apparatus of claim 5 wherein the sensor includes an ellipsometer, a reflectometer, a pyrometer, or a combination thereof. 10. The apparatus of claim 5 wherein the sensor includes an emitting portion and a collecting portion, the emitting portion includes a laser, a polarizer operably connected to the laser, and a focuser operably connected to the polarizer, and the collecting portion includes a detector, an analyzer operably connected to the detector, and a lens collector operably connected to the analyzer. 11. The apparatus of claim 5 wherein the enclosure is arranged to wholly enclose the metrology system. 12. A method comprising: supporting a semiconductor wafer in a front opening unified pod; transporting the front opening unified pod by an automated material handling system to a plurality of stations in a semiconductor fabrication plant; moving the semiconductor wafer relative to a metrology system while the semiconductor wafer is in the front opening unified pod; and measuring data regarding the semiconductor wafer with the metrology system while the semiconductor wafer is within the front opening unified pod. 13. The method of claim 12 further comprising: communicating the data to a remote computer outside of the front opening unified pod. 14. The method of claim 12 further comprising: wirelessly transmitting the data to a remote computer outside of the front opening unified pod. 15. The method of claim 12 wherein the metrology system is configured to measure one or more characteristics of the semiconductor wafer at one or more measurement points on the semiconductor wafer. 16. The method of claim 12 wherein the automated material handling system transports the front opening unified pod to the plurality of stations in the semiconductor fabrication plant without being transported to a metrology station. 17. The method of claim 12 further comprising: docking the front opening unified pod at one of the plurality of stations to communicate the data to a remote computer outside of the front opening unified pod. 18. The method of claim 12 wherein the plurality of stations are process tools configured to process the semiconductor wafer.

Assignees

Inventors

Classifications

  • characterised by movements or sequence of movements of transfer devices · CPC title

  • Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects · CPC title

  • characterised by the properties tested or measured, e.g. structural or electrical properties · CPC title

  • characterised by the construction of the closed carrier · CPC title

  • specially adapted for a single substrate · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10818528B2 cover?
Self-contained metrology wafer carrier systems and methods of measuring one or more characteristics of semiconductor wafers. The wafer carrier system may include a housing configured for transport within the automated material handling system. A support is configured to support a semiconductor wafer within a housing. A metrology system is disposed within the housing. The metrology system is ope…
Who is the assignee on this patent?
Globalfoundries Inc
What technology area does this patent fall under?
Primary CPC classification H10P72/14. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 27 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).