Coating composition for use with an overcoated photoresist

Patent metadata

Field	Value
Publication number	US-10788751-B2
Application number	US-201615253005-A
Country	US
Kind code	B2
Filing date	Aug 31, 2016
Priority date	Aug 31, 2015
Publication date	Sep 29, 2020
Grant date	Sep 29, 2020

Abstract

Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a crosslinker component that comprises a structure of the following Formula (I):

First claim

What is claimed is:

1. A method for forming a photoresist relief image, comprising:
a) applying on a substrate a layer of a coating composition comprising:
1) a resin; and
2) a crosslinker that comprises a structure of Formula (I):

wherein in Formula (I):
each R is independently selected from hydrogen, optionally substituted alkyl, optionally substituted heteroalkyl, optionally substituted carbocyclic aryl, or optionally substituted heteroaryl,
with at least one R group being a cyclohexyl moiety;
R′ and R″ are each independently selected from hydrogen, optionally substituted alkyl or optionally substituted heteroalkyl, optionally substituted carbocyclic aryl, or optionally substituted heteroaryl; and

b) applying a layer of a photoresist composition above the coating composition layer; and
c) imaging the photoresist composition layer and developing the imaged photoresist composition layer.

2. The method of claim 1 wherein the crosslinker component has a molecular weight of at least 400 daltons.

3. The method of claim 1 wherein the crosslinker component has a molecular weight of less than 1500 daltons.

4. The method of claim 1 wherein the crosslinker component has a degradation temperature of greater than 250° C.

5. The method of claim 1 wherein each R group is other than hydrogen.

6. The method of claim 1 wherein the coating composition layer is thermally treated to cure the composition coating layer before applying the photoresist composition layer.

7. The method of claim 1 wherein the crosslinker is selected from the group consisting of the following structures:

8. A coated substrate comprising:
a substrate having thereon:

a) a coating composition comprising:
1) a resin; and
2) a crosslinker component;

b) a layer of a photoresist composition above the coating composition layer,
wherein the crosslinker component prior to reaction with the resin comprises a structure of Formula (I):

wherein in Formula (I):
each R is independently selected from hydrogen, optionally substituted alkyl, optionally substituted heteroalkyl, optionally substituted carbocyclic aryl, or optionally substituted heteroaryl,
with at least one R being a cyclohexyl moiety;

R′ and R″ are each independently selected from hydrogen, optionally substituted alkyl or optionally substituted heteroalkyl, optionally substituted carbocyclic aryl, or optionally substituted heteroaryl.

9. The coated substrate of claim 8 wherein the crosslinker is:

10. A crosslinker that comprises a structure selected from:

11. The crosslinker of claim 10 wherein the crosslinker comprises the following structure:

12. A coating composition for use with an overcoated photoresist, the coating comprising:
1) a resin; and
2) a crosslinker that comprises a structure of Formula (I):

wherein in Formula (I):
each R is independently selected from hydrogen, optionally substituted alkyl, optionally substituted heteroalkyl, optionally substituted carbocyclic aryl, or optionally substituted heteroaryl,
with at least one R group comprises an optionally substituted cyclohexyl group;
R′ and R″ are each independently selected from hydrogen, optionally substituted alkyl or optionally substituted heteroalkyl, optionally substituted carbocyclic aryl, or optionally substituted heteroaryl.

13. The composition of claim 12 wherein the crosslinker comprises the following structure:

Assignees

• Rohm & Haas Elect Mat
• Rohm & Haas Elect Materials Korea Ltd

Inventors

• Grandbois Matthew
• Kim Myung Yeol
• Ryu Eui Hyun
• Sim Jae Hwan
• Jang Min Kyung
• Lee Jung-June

Classifications

• H10P76/2043

  using an anti-reflective coating · CPC title

• H10P76/2041

  Photolithographic processes · CPC title

• H10P50/692

  characterised by their composition, e.g. multilayer masks or materials · CPC title

• H10P14/6342

  Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating · CPC title

• H10P14/68

  Organic materials, e.g. photoresists · CPC title