System and method for fabricating a strain sensing device directly on a structure

US10770206B1 · US · B1

Patent metadata
FieldValue
Publication numberUS-10770206-B1
Application numberUS-201916377302-A
CountryUS
Kind codeB1
Filing dateApr 8, 2019
Priority dateApr 8, 2019
Publication dateSep 8, 2020
Grant dateSep 8, 2020

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Various deficiencies in the prior art are addressed by systems, methods, architectures, mechanisms and/or apparatus configured for fabricating a strain sensing device directly on a structure by printing a material on the structure, the material exhibiting a piezo-resistive effect, and sintering a strain sensing pattern from the material such that the strain sensing pattern becomes electrically conductive.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for fabricating a strain sensing device directly on a structure, the method comprising: printing a material on the structure, the material exhibiting a piezo-resistive effect; sintering a strain sensing pattern from the material such that the strain sensing pattern becomes electrically conductive; and attaching a pin connector to the electrically conductive strain sensing pattern. 2. The method of claim 1 , further comprising printing an insulating layer on the structure. 3. The method of claim 1 , further comprising drying the printed material on the structure. 4. The method of claim 1 , wherein the structure is a functional structure comprising one of a support beam and a wing of a vehicle. 5. The method of claim 1 , wherein the structure is a curved structure. 6. The method of claim 5 , further comprising mapping the curvature of the structure, wherein the printing and sintering steps are configured to conform to a map of the curvature of the structure. 7. The method of claim 1 , wherein the material comprises one of graphene, silver, and copper. 8. The method of claim 1 , wherein printing the material on the structure utilizes additive manufacturing. 9. The method of claim 1 , wherein sintering comprises one of thermal and laser sintering. 10. A strain sensing device manufactured directly on a structure by the method recited in claim 1 . 11. The strain sensing device of claim 10 , further comprising an insulating layer formed on the structure. 12. The strain sensing device of claim 10 , further comprising a pin connector connected to the electrically conductive strain sensing pattern. 13. The strain sensing device of claim 10 , wherein the structure is a functional structure comprising one of a support beam and a wing of a vehicle. 14. The strain sensing device of claim 10 , wherein the material comprises one of graphene, silver, and copper. 15. The strain sensing device of claim 10 , wherein sintering comprises one of thermal and laser sintering. 16. A method for fabricating a strain sensing device directly on a structure, the method comprising: printing a first material on the structure, the first material exhibiting a piezo-resistive effect; sintering a first strain sensing pattern from the first material such that the first strain sensing pattern becomes electrically conductive; printing an insulating layer on the first material; printing a second material on the insulating layer, the second material exhibiting a piezo-resistive effect; and sintering a second strain sensing pattern from the second material such that the second strain sensing pattern become electrically conductive. 17. The method of claim 16 , further comprising printing an insulating layer between the structure and first material. 18. The method of claim 16 , further comprising drying the printed first and second materials. 19. The method of claim 16 , further comprising attaching a pin connector to the electrically conductive first and second strain sensing patterns. 20. The method of claim 16 , wherein the first and second materials each comprise one of graphene, silver, and copper. 21. The method of claim 16 , wherein sintering comprises one of thermal and laser sintering. 22. The method of claim 16 , wherein the first and second materials are the same. 23. The method of claim 16 , wherein the first and second strain sensing patterns are the same.

Assignees

Inventors

Classifications

  • G01L1/18Primary

    using properties of piezo-resistive materials, i.e. materials of which the ohmic resistance varies according to changes in magnitude or direction of force applied to the material · CPC title

  • constructional details of the strain gauges (adjustable resistors H01C10/00) · CPC title

  • H01C17/065Primary

    by thick film techniques, e.g. serigraphy · CPC title

  • adjustable by mechanical pressure or force · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10770206B1 cover?
Various deficiencies in the prior art are addressed by systems, methods, architectures, mechanisms and/or apparatus configured for fabricating a strain sensing device directly on a structure by printing a material on the structure, the material exhibiting a piezo-resistive effect, and sintering a strain sensing pattern from the material such that the strain sensing pattern becomes electrically …
Who is the assignee on this patent?
Us Gov Air Force
What technology area does this patent fall under?
Primary CPC classification G01L1/18. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Sep 08 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).