Physical vapor deposition chamber particle reduction apparatus and methods

Patent metadata

Field	Value
Publication number	US-10763091-B2
Application number	US-201715681022-A
Country	US
Kind code	B2
Filing date	Aug 18, 2017
Priority date	Aug 18, 2017
Publication date	Sep 1, 2020
Grant date	Sep 1, 2020

Abstract

Physical vapor deposition processing chambers and methods of processing a substrate such as an EUV mask blank in a physical vapor deposition chamber are disclosed. An electric field and a magnetic field are utilized to deflect particles from a substrate being processed in the chamber.

First claim

What is claimed is:

1. A physical vapor deposition chamber comprising:
a chamber wall defining an inner volume within the physical vapor deposition chamber;
a backing plate configured to support a sputtering target, the backing plate disposed in an upper section of the inner volume;
a substrate support having a support surface to support a substrate below the backing plate;
a central region between the backing plate and the substrate support;
a process kit including a shield surrounding the central region, the shield comprising a cylindrical body having an inner surface, an upper portion and a lower portion;
a first electrode assembly positioned on an inner surface of the shield and within the central region; and
a magnet positioned on the inner surface of the shield and within the central region, the first electrode assembly positioned and configured to create an electromagnetic field that laterally displaces particles generated during a physical vapor deposition process that cause defects, and the first electrode assembly and the magnet cooperate to prevent the particles that cause defects from contacting a substrate on the substrate support during the physical vapor deposition process.

2. The physical vapor deposition chamber of claim 1 , the magnet positioned at the lower portion of the shield and the first electrode assembly positioned at the upper portion of the shield.

3. The physical vapor deposition chamber of claim 2 , further comprising a second electrode assembly positioned on an inner surface and at the upper portion of the shield and a power supply to supply a voltage to the first electrode assembly and the second electrode assembly.

4. The physical vapor deposition chamber of claim 3 , wherein the first electrode assembly and the second electrode assembly are arc-shaped.

5. The physical vapor deposition chamber of claim 4 , further comprising a controller configured to selectively apply predetermined voltage differences between the first electrode assembly and the second electrode assembly to create an electric field that laterally displace particles generated during the physical vapor deposition process.

6. The physical vapor deposition chamber of claim 5 , wherein the magnet comprises an electromagnet, the physical vapor deposition chamber comprises a second power supply and a second controller that selectively applies current such that that the electromagnet creates a magnetic field that deflects particles generated during the physical vapor deposition process away from the substrate support.

7. The physical vapor deposition chamber of claim 6 , further comprising a magnet cover which covers the electromagnet.

8. A method of processing a substrate in a physical vapor deposition chamber, the method comprising:
placing a substrate on a substrate support within an inner volume of the physical vapor deposition chamber defined by a chamber wall, the inner volume including an upper section and a lower section, the substrate support in the lower section;
sputtering material from a target of source material located above the substrate support in an upper section, there being a central region between the target of source material and the substrate support and process kit including a shield surrounding the central region, the shield comprising a cylindrical body having an inner surface, an upper portion and a lower portion, and a magnet positioned on an inner surface of the lower portion of the shield and within the central region; and
applying a voltage to a first electrode assembly positioned on an inner surface of the upper portion of the shield to laterally displace particles generated during a physical vapor deposition process that cause defects, and the first electrode assembly and the magnet cooperate to prevent the particles that cause defects from contacting a substrate on the substrate support during the physical vapor deposition process.

9. The method of claim 8 , wherein there is a second electrode assembly positioned on an inner surface and at the upper portion of the shield, the method further comprising applying a voltage to the first electrode assembly and the second electrode assembly.

10. The method of claim 9 , further comprising selectively applying predetermined voltage differences between the first electrode assembly and the second electrode assembly to create an electric field that laterally displace particles generated during the physical vapor deposition process.

11. The method of claim 10 , wherein the magnet comprises an electromagnet, and the method further comprises selectively applying current so the electromagnet so that that the electromagnet generates a magnetic field that deflects particles generated during the physical vapor deposition process away from the substrate support.

12. The method of claim 11 , further comprising creating a static electromagnetic field.

13. The method of claim 11 , further comprising creating a dynamic electromagnetic field.

14. The method of claim 11 , further comprising separately tuning the magnetic field and the electric field.

15. The apparatus of claim 1 , further comprising a cover ring configured to rest on an upwardly extending inner portion of the shield when the substrate support is in a lower, loading position and to rest on an outer periphery of the substrate support when the substrate support is in an upper, deposition position to protect the substrate support from sputter deposition.

16. The apparatus of claim 15 , wherein the magnet is positioned above the cover ring.

17. The method of claim 8 , wherein there is a cover ring configured to rest on an upwardly extending inner portion of the shield when the substrate support is in a lower, loading position and to rest on an outer periphery of the substrate support when the substrate support is in an upper, deposition position to protect the substrate support from sputter deposition.

18. The method of claim 17 , wherein the magnet is positioned above the cover ring.

Assignees

• Applied Materials Inc

Inventors

• Jindal Vibhu
• Bhat Sanjay
• Foad Majeed A

Classifications

• H01J37/32669

  Particular magnets or magnet arrangements for controlling the discharge · CPC title

• H01J37/32651

  Shields, e.g. dark space shields, Faraday shields · CPC title

• C23C14/345

  using substrate bias · CPC title

• C23C14/3407

  Cathode assembly for sputtering apparatus, e.g. Target · CPC title

• H01J37/3458 Primary

  Electromagnets in particular for cathodic sputtering apparatus (electromagnets in general H01F7/06) · CPC title