Chuck, substrate-holding apparatus, pattern-forming apparatus, and method of manufacturing article

Patent metadata

Field	Value
Publication number	US-10754262-B2
Application number	US-201816204563-A
Country	US
Kind code	B2
Filing date	Nov 29, 2018
Priority date	Jun 1, 2016
Publication date	Aug 25, 2020
Grant date	Aug 25, 2020

Abstract

A chuck according to an embodiment of the present invention includes first and second support portions 10 each of which has a repetition structure of a convex portion 11 and a concave portion 13 on a base. A substrate is held by bringing each convex portion 11 into contact with the substrate and exhausting gas in each concave portion 13 such that the concave portion 13 has a negative pressure with respect to a space between the first support portion 10 and the second support portion 10 . At least one support portion of the first support portion 10 and the second support portion 10 includes at least four convex portions 11 and three concave portions 13.

First claim

The invention claimed is:

1. A chuck comprising:
first and second support portions each of which has a repetition structure of a convex portion and a concave portion on a base,
wherein at least one support portion of the first support portion and the second support portion includes at least four of the convex portions and three concave portions, and
wherein a substrate is held by bringing each convex portion into contact with the substrate and exhausting gas in each concave portion such that a pressure with respect to three of spaces surrounded by the substrate and the three concave portions is lower than a pressure with respect to a space surrounded by the substrate and a concave portion between the first support portion and the second support portion.

2. The chuck according to claim 1 , wherein the four convex portions and the three concave portions are arranged in a direction from a center of the chuck toward an outer circumference of the chuck.

3. The chuck according to claim 2 , wherein a width of a central concave portion of the three concave portions in the direction is more than widths of the other two concave portions of the three concave portions.

4. The chuck according to claim 1 , further comprising: a plurality of support portions each of which has the repetition structure on the base, wherein the at least one support portion is located nearer than the plurality of support portions to a center of the chuck.

5. The chuck according to claim 1 , wherein the first and second support portions have an annular shape and are arranged on the base in a multiple arrangement.

6. The chuck according to claim 1 , wherein an opening for exhausting the gas in the three concave portions is a common opening.

7. The chuck according to claim 1 , wherein the base and the first and second support portions are integrally molded.

8. The chuck according to claim 1 , further comprising:
an opening provided to each of the three concave portions and configured to exhaust gas in the three of spaces which are surrounded by the substrate and each of the three concave portions.

9. The chuck according to claim 1 , further comprising:
an opening provided between the first support portion and the second support portion and configured to supply gas in the space surrounded by the substrate and the concave portion between the first support portion and the second support portion.

10. The chuck according to claim 9 , wherein the opening is connected to a gas-supplying portion that supplies gas.

11. A substrate-holding apparatus for holding a substrate, comprising:
a chuck including first and second support portions each of which has a repetition structure of a convex portion and a concave portion on a base; and
an exhaust portion configured to exhaust the gas in each concave portion of the chuck to hold the substrate,
wherein at least one support portion of the first support portion and the second support portion includes at least four of the convex portions and three concave portions, and
wherein a substrate is held by bringing each convex portion into contact with the substrate and exhausting gas in each concave portion such that a pressure with respect to three of spaces surrounded by the substrate and the three concave portions is lower than a pressure with respect to a space surrounded by the substrate and a concave portion between the first support portion and the second support portion.

12. The substrate-holding apparatus according to claim 11 , wherein the exhaust portion adjusts pressures of the concave portion of the first support portion and the concave portion of the second support portion to different pressures on a basis of information about flatness of the substrate.

13. The substrate-holding apparatus according to claim 12 , wherein the information is about distribution of a thickness of the substrate.

14. A pattern-forming apparatus for forming a pattern on a substrate with an original, comprising:
a chuck including first and second support portions each of which has a repetition structure of a convex portion and a concave portion on a base; and
an exhaust portion configured to exhaust the gas in each concave portion of the chuck to hold the substrate,
wherein at least one support portion of the first support portion and the second support portion includes at least four of the convex portions and three concave portions, and
wherein a substrate is held by bringing each convex portion into contact with the substrate and exhausting gas in each concave portion such that a pressure with respect to three of spaces surrounded by the substrate and the three concave portions is lower than a pressure with respect to a space surrounded by the substrate and a concave portion between the first support portion and the second support portion.

15. A method of manufacturing an article, comprising:
a step of forming a pattern on a substrate with a pattern-forming apparatus for forming a pattern on a substrate with an original; and
a step of processing the substrate on which the pattern is formed to manufacture the article,
wherein the pattern-forming apparatus includes:
a chuck including first and second support portions each of which has a repetition structure of a convex portion and a concave portion on a base; and
an exhaust portion configured to exhaust the gas in each concave portion of the chuck to hold the substrate,
wherein at least one support portion of the first support portion and the second support portion includes at least four of the convex portions and three concave portions, and
wherein a substrate is held by bringing each convex portion into contact with the substrate and exhausting gas in each concave portion such that a pressure with respect to three of spaces surrounded by the substrate and the three concave portions is lower than a pressure with respect to a space surrounded by the substrate and a concave portion between the first support portion and the second support portion.

16. A chuck for holding a substrate, the chuck comprising:
first and second support portions each of which has a repetition structure of a convex portion and a concave portion on a base,
wherein at least one support portion of the first support portion and the second support portion includes at least four of the convex portions and three concave portions;
a first opening provided to each of the three concave portions and configured to exhaust gas in the three of spaces which are surrounded by the substrate and each of the three concave portions; and
a second opening provided between the first support portion and the second support portion and configured to supply gas in the space surrounded by the substrate and a concave portion between the first support portion and the second support portion.

17. A chuck for holding a substrate comprising:
first and second support portions each of which has an annular shape and is arranged on a base,
wherein at least one support portion of the first support portion and the second support portion includes at least four of the convex portions and three concave portions, and
wherein a substrate is held by bringing each convex portion into contact with the substrate and exhausting gas in each concave portion such that a pressure with respect to three of spaces surrounded by the substrate and the three concave portions is lower than a pressure with respect to a space surrounded by the substrate and a concave portion between the first support portion and the second support portion.

18. The chuck according to claim 17 , wherein each

Assignees

• Canon Kk

Inventors

• Matsumoto Toru

Classifications

• H10P72/70

  for supporting or gripping · CPC title

• H10P72/7614

  characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title

• H10P72/78 Primary

  using vacuum or suction, e.g. Bernoulli chucks · CPC title

• H10P72/7611

  characterised by edge profile or support profile · CPC title

• H10P72/7604 Primary

  the wafers being placed on a susceptor, stage or support · CPC title