Lithographic apparatus and device manufacturing method
US-9494869-B2 · Nov 15, 2016 · US
US10748571B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10748571-B2 |
| Application number | US-201815876062-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 19, 2018 |
| Priority date | Aug 9, 2017 |
| Publication date | Aug 18, 2020 |
| Grant date | Aug 18, 2020 |
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A device includes a housing unit and a number of magnets. The housing unit includes a number of holes therein. The magnets are positioned in the holes. The magnets have a same pole orientation. It is appreciated that the magnets are positioned in the holes to form a mechanically balanced and magnetically unbalanced structure.
Opening claim text (preview).
What is claimed is: 1. A system comprising: a first mechanically balanced and magnetically unbalanced device comprising: a first housing unit comprising a first plurality of holes therein; and a first plurality of magnets positioned in the first plurality of holes, wherein the first plurality of magnets have a same pole orientation, wherein the first plurality of magnets positioned in the first plurality of holes form a mechanically balanced and magnetically unbalanced structure about a first center axis running perpendicular to the first housing unit and equidistant from the first plurality of holes; a substrate; and a first target positioned between the substrate and the first mechanically balanced and magnetically unbalanced device, wherein the first mechanically balanced and magnetically unbalanced device is configured to cause atoms from the first target to deposit on a surface of the substrate facing the first target. 2. The system of claim 1 further comprising: a second mechanically balanced and magnetically unbalanced device comprising: a second housing unit comprising a second plurality of holes therein; and a second plurality of magnets positioned in the second plurality of holes, wherein the second plurality of magnets have a same pole orientation, wherein the second plurality of magnets positioned in the second plurality of holes form a mechanically balanced and magnetically unbalanced structure about a second center axis running perpendicular to the second housing unit and equidistant from the second plurality of holes; and a second target positioned between another surface of the substrate and the second mechanically balanced and magnetically unbalanced device, wherein the second mechanically balanced and magnetically unbalanced device is configured to cause atoms from the second target to deposit on the another surface of the substrate facing the second target. 3. The system of claim 2 further comprising: a plasma ionized chamber housing the first mechanically balanced and magnetically unbalanced device, the first target, the substrate, the second target, and the second mechanically balanced and magnetically unbalanced device. 4. The system of claim 1 , wherein the first target comprises FePt. 5. The system of claim 1 , wherein deposition of the atoms from the first target on the surface of the substrate facing the first target occurs at a temperature between 250-350° C. 6. The system of claim 1 , wherein the first mechanically balanced and magnetically unbalanced device is stationary with respect to the substrate. 7. The system of claim 1 , wherein deposition of the atoms from the first target on the surface of the substrate facing the first target forms a face centered cube ordered structure for a heat assisted magnetic recording (HAMR). 8. The system of claim 1 , wherein the first plurality of holes are positioned equidistant from one another about the first center axis, and wherein the first plurality of magnets have a same dimension and composition. 9. The system of claim 1 , wherein the first plurality of holes are positioned at unequal distances from one another about the first center axis, and wherein the first plurality of magnets have different dimensions with respect to one another to form the mechanically balanced and magnetically unbalanced structure. 10. The system of claim 1 , wherein the first plurality of holes are positioned at unequal distances from one another about the first center axis, and wherein the first plurality of magnets have different masses with respect to one another to form the mechanically balanced and magnetically unbalanced structure. 11. A system comprising: a first device that is mechanically balanced and magnetically unbalanced about a first center axis running perpendicular to the first housing unit and equidistant from the first plurality of holes; a first target positioned between the first device and a first surface of a substrate; a second device that is mechanically balanced and magnetically unbalanced about a second center axis running perpendicular to the second housing unit and equidistant from the second plurality of holes; and a second target positioned between the second device and a second surface of the substrate, wherein the first surface and the second surface of the substrate face away from one another, wherein the first device is configured to cause atoms from the first target to deposit on the first surface of the substrate facing the first target, and wherein the second device is configured to cause atoms from the second target to deposit on the second surface of the substrate facing the second target, wherein atom deposition from the first target and the second target occurs at a temperature ranging from 250-350° C., and wherein the first device, the second device, the first target and the second target are stationary with respect to the substrate during atom deposition. 12. The system of claim 11 , wherein the first target comprises FePtX, where X is one of Cu, Ag, CuAg, Mo, Co, and Ni. 13. The system of claim 11 , wherein deposition of the atoms from the first target on the first surface of the substrate facing the first target forms a face centered cube ordered structure for a heat assisted magnetic recording (HAMR). 14. A device comprising: a housing unit comprising a plurality of holes therein; and a plurality of magnets positioned in the plurality of holes, wherein the plurality of magnets have a same pole orientation, wherein the plurality of magnets positioned in the plurality of holes form a mechanically balanced and magnetically unbalanced structure about a center axis running perpendicular to the housing unit and equidistant from the plurality of holes. 15. The device of claim 14 , wherein the plurality of holes are positioned equidistant from one another about the center axis, and wherein the plurality of magnets have a same dimension and composition. 16. The device of claim 14 , wherein the plurality of holes are positioned at unequal distances from one another about the center axis, and wherein the plurality of magnets have different dimensions with respect to one another to form the mechanically balanced and magnetically unbalanced structure. 17. The device of claim 14 , wherein holes of the plurality of holes are positioned at unequal distances from one another about the center axis, and wherein the plurality of magnets have different masses with respect to one another to form the mechanically balanced and magnetically unbalanced structure. 18. The device of claim 14 , wherein the housing unit and the plurality of magnets are stationary. 19. The device of claim 14 , wherein the plurality of holes and the plurality of magnets are arranged in a circular fashion about the center axis. 20. The device of claim 14 , wherein the plurality of holes and the plurality of magnets are arranged in two concentric circles about the center axis.
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