Magnetic field sensor based on topological insulator and insulating coupler materials

US10734571B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10734571-B2
Application numberUS-201816026381-A
CountryUS
Kind codeB2
Filing dateJul 3, 2018
Priority dateAug 11, 2015
Publication dateAug 4, 2020
Grant dateAug 4, 2020

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Abstract

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Embodiments are directed to a sensor having a first electrode, a second electrode and a detector region electrically coupled between the first electrode region and the second electrode region. The detector region includes a first layer having a topological insulator. The topological insulator includes a conducting path along a surface of the topological insulator, and the detector region further includes a second layer having a first insulating magnetic coupler, wherein a magnetic field applied to the detector region changes a resistance of the conducting path.

First claim

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What is claimed is: 1. A method of forming a sensor, the method comprising: forming a first electrode region; forming a second electrode region; forming a detector region; electrically coupling the detector region to the first electrode and the second electrode; forming the detector region to include a first layer comprising a topological insulator; the topological insulator having an insulating region in a body of the topological insulator; the topological insulator further having a conducing path along a surface of the topological insulator, wherein a steady state condition of the topological insulator comprises the insulation region acting as an insulator and the conducting path along the surface of the topological insulator acting as a current conductor; forming the detector region to further include a second layer comprising a first insulating magnetic coupler configured to amplify the magnetic field applied to the detector region; wherein a magnetic field applied to the detector region is sufficient to change the steady state condition of the topological insulator by developing energy gaps in the conducting path along the surface of the topological insulator that are sufficient to change a resistance of the conducting path; and forming the detector region to further comprise a third layer comprising a second insulating magnetic coupler; wherein the second insulating magnetic coupler amplifies the magnetic field applied to the detector region. 2. The method of claim 1 , wherein: the topological insulator comprises implanted magnetic particles; and the implanted magnetic particles amplify the magnetic field applied to the detector region. 3. The method of claim 1 further comprising forming a vacuum enclosure over at least a surface of the detector region. 4. The method of claim 1 further comprising: forming a substrate; wherein the surface of the topological insulator is formed by: forming a horizontal region that is substantially parallel to a surface of the substrate; and forming a vertical region that is substantially perpendicular to the surface of the substrate: wherein the magnetic field applied to the detector region comprises a magnetic field perpendicular the horizontal region or a magnetic field perpendicular the vertical region. 5. The method of claim 1 , wherein the detector region comprises a third layer comprising a second insulating magnetic coupler. 6. The method of claim 5 , wherein the second insulating magnetic coupler amplifies the magnetic field applied to the detector region. 7. The method of claim 6 , wherein the second insulating coupler amplifies the magnetic field based at least in part on a magnetic exchange effect between the first layer and the third layer. 8. A method of forming a sensor, the method comprising: forming a first electrode region; forming a second electrode region; forming a detector region; and electrically coupling the detector region to the first electrode region and the second electrode region; the detector region comprising a first layer comprising a topological insulator; the topological insulator having an insulating region in a body of the topological insulator; the topological insulator further having a conducing path along a surface of the topological insulator, wherein a steady state condition of the topological insulator comprises the insulation region acting as an insulator and the conducting path along the surface of the topological insulator acting as a current conductor; the detector region further comprising a second layer comprising a first insulating magnetic coupler; wherein a magnetic field applied to the detector region is sufficient to change a resistance of the conducting path by: developing energy gaps in the conducting path along the surface of the topological insulator that are sufficient to change a resistance of the conducting path along the surface of the topological insulator; and breaking a time-reversal symmetry characteristic of the topological insulator; and wherein the first insulating magnetic coupler amplifies the magnetic field applied to the detector region based at least in part on a magnetic exchange effect between the first layer and the second layer. 9. The method of claim 8 , wherein: the detector region comprises a third layer comprising a second insulating magnetic coupler. 10. The method of claim 8 , wherein the second insulating magnetic coupler amplifies the magnetic field applied to the detector region. 11. The method of claim 10 , wherein the second insulating coupler amplifies the magnetic field based at least in part on a magnetic exchange effect between the first layer and the third layer. 12. A method of forming a sensor, the method comprising: forming a first electrode region; forming a second electrode region; and forming a detector region electrically coupled between the first electrode region and the second electrode region; forming the detector region such that it comprises a first layer comprising a topological insulator; the topological insulator having an insulating region in a body of the topological insulator; the topological insulator further having a conducing path along a surface of the topological insulator, wherein a steady state condition of the topological insulator comprises the insulation region acting as an insulator and the conducting path along the surface of the topological insulator acting as a current conductor; and forming the detector region such that it further comprises a second layer comprising a first insulating magnetic coupler; wherein the first insulating magnetic coupler is positioned on or sufficiently close to the topological insulator such that the first insulating magnetic coupler amplifies a magnetic field applied to the detector region to a level that is sufficient to break a time reversal symmetry characteristic of the topological insulator; and wherein the magnetic field, which has been amplified by the first insulating magnetic coupler and applied to the detector region, is sufficient to change the steady state condition of the topological insulator by developing energy gaps in the conducting path along the surface of the topological insulator that are sufficient to change a resistance of the conducting path. 13. The method of claim 12 , wherein the change to the resistance is sufficient to change the conducting path to an insulator.

Assignees

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Classifications

  • Magnetoresistive devices · CPC title

  • Manufacture or treatment · CPC title

  • of molecules labeled with magnetic beads (magnetic particles for bio assay G01N33/54326) · CPC title

  • H10N50/80Primary

    Constructional details · CPC title

  • Magnetoresistive devices · CPC title

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What does patent US10734571B2 cover?
Embodiments are directed to a sensor having a first electrode, a second electrode and a detector region electrically coupled between the first electrode region and the second electrode region. The detector region includes a first layer having a topological insulator. The topological insulator includes a conducting path along a surface of the topological insulator, and the detector region furthe…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification G01R33/1269. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 04 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).