Magnetic field sensor based on topological insulator and insulating coupler materials

US9716221B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9716221-B2
Application numberUS-201514950576-A
CountryUS
Kind codeB2
Filing dateNov 24, 2015
Priority dateAug 11, 2015
Publication dateJul 25, 2017
Grant dateJul 25, 2017

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Abstract

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Embodiments are directed to a sensor having a first electrode, a second electrode and a detector region electrically coupled between the first electrode region and the second electrode region. The detector region includes a first layer having a topological insulator. The topological insulator includes a conducting path along a surface of the topological insulator, and the detector region further includes a second layer having a first insulating magnetic coupler, wherein a magnetic field applied to the detector region changes a resistance of the conducting path.

First claim

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What is claimed is: 1. A method of forming a sensor comprising: forming a first electrode; forming a second electrode; forming a detector region; electrically coupling the detector region to the first electrode and the second electrode; forming the detector region to include a first layer comprising a topological insulator; the topological insulator having a conducing path along a surface of the topological insulator; forming the detector region to further include a second layer comprising a first insulating magnetic coupler; wherein a magnetic field applied to the detector region changes a resistance of the conducting path; wherein the first insulating magnetic coupler amplifies the magnetic field applied to the detector region; and forming the detector region to further comprise a third layer comprising a second insulating magnetic coupler; wherein the second insulating magnetic coupler amplifies the magnetic field applied to the detector region. 2. The method of claim 1 , wherein: the topological insulator comprises implanted magnetic particles; and the implanted magnetic particles amplify the magnetic field applied to the detector region. 3. The method of claim 1 further comprising forming a vacuum enclosure over at least a surface of the detector region. 4. The method of claim 1 further comprising: forming a substrate; wherein the surface of the topological insulator is formed by: forming a horizontal region that is substantially parallel to a surface of the substrate; and forming a vertical region that is substantially perpendicular to the surface of the substrate: wherein the magnetic field applied to the detector region comprises a magnetic field perpendicular the horizontal region or a magnetic field perpendicular the vertical region.

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What does patent US9716221B2 cover?
Embodiments are directed to a sensor having a first electrode, a second electrode and a detector region electrically coupled between the first electrode region and the second electrode region. The detector region includes a first layer having a topological insulator. The topological insulator includes a conducting path along a surface of the topological insulator, and the detector region furthe…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification H01L43/02. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 25 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).