Ceramic matrix composite manufacturing

US10712005B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10712005-B2
Application numberUS-201715650400-A
CountryUS
Kind codeB2
Filing dateJul 14, 2017
Priority dateJul 14, 2017
Publication dateJul 14, 2020
Grant dateJul 14, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of manufacturing a ceramic matrix composite component may include introducing a gaseous precursor into an inlet portion of a chamber that houses a porous preform and introducing a gaseous mitigation agent into an outlet portion of the chamber that is downstream of the inlet portion of the chamber. The gaseous precursor may include methyltrichlorosilane (MTS) and the gaseous mitigation agent may include hydrogen gas. The introduction of the gaseous precursor may result in densification of the porous preform(s) and the introduction of the gaseous mitigation agent may shift the reaction equilibrium to disfavor the formation of harmful and/or pyrophoric byproduct deposits, which can accumulate in an exhaust conduit 340 of the system.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of manufacturing a ceramic matrix composite component, the method comprising: introducing a gaseous precursor into an inlet portion of a chamber such that the gaseous precursor infiltrates a porous preform housed in the inlet portion of the chamber to densify the porous preform; and introducing a gaseous mitigation agent into an outlet portion of the chamber that is downstream of the inlet portion of the chamber such that the gaseous mitigation agent flows through a gas mixing substrate loaded within a gas mixing space defined by the outlet portion of the chamber; wherein the porous preform is only disposed in the inlet portion of the chamber; wherein the gas mixing substrate is only disposed in the outlet portion of the chamber; and wherein introducing the gaseous precursor and introducing the gaseous mitigation agent are performed simultaneously, with the gaseous mitigation agent only flowing through the outlet portion of the chamber and not flowing through the inlet portion of the chamber. 2. The method of claim 1 , wherein the gaseous precursor comprises methyltrichlorosilane (MTS). 3. The method of claim 2 , wherein the gaseous mitigation agent comprises hydrogen gas. 4. The method of claim 3 , wherein introducing the gaseous precursor is performed at a first molar flow rate and introducing the gaseous mitigation agent is performed at a second molar flow rate that is greater than the first molar flow rate. 5. The method of claim 4 , wherein the second molar flow rate is between 50% and 300% higher than the first molar flow rate. 6. The method of claim 4 , wherein the second molar flow rate is between 100% and 200% higher than the first molar flow rate. 7. The method of claim 3 , wherein the gaseous precursor also comprises hydrogen gas. 8. The method of claim 7 , wherein the methyltrichlorosilane comprises about 5% of the gaseous precursor. 9. The method of claim 1 , wherein the gaseous mitigation agent comprises introducing the gaseous mitigation agent into an upstream side of the outlet portion of the chamber.

Assignees

Inventors

Classifications

  • F23R3/007Primary

    constructed mainly of ceramic components · CPC title

  • C04B35/80Primary

    Fibres, filaments, whiskers, platelets, or the like · CPC title

  • Non-oxide ceramics · CPC title

  • Gases other than oxygen used as reactant, e.g. nitrogen used to make a nitride phase · CPC title

  • Silicon carbide · CPC title

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Frequently asked questions

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What does patent US10712005B2 cover?
A method of manufacturing a ceramic matrix composite component may include introducing a gaseous precursor into an inlet portion of a chamber that houses a porous preform and introducing a gaseous mitigation agent into an outlet portion of the chamber that is downstream of the inlet portion of the chamber. The gaseous precursor may include methyltrichlorosilane (MTS) and the gaseous mitigation …
Who is the assignee on this patent?
Goodrich Corp
What technology area does this patent fall under?
Primary CPC classification F23R3/007. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Jul 14 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).