Deposition platform for flexible substrates and method of operation thereof

US10689760B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10689760-B2
Application numberUS-201615351279-A
CountryUS
Kind codeB2
Filing dateNov 14, 2016
Priority dateMar 28, 2013
Publication dateJun 23, 2020
Grant dateJun 23, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An apparatus for processing a flexible substrate is provided including a vacuum chamber having a first chamber portion, second chamber portion and third chamber portion. The apparatus further includes an unwinding shaft supporting the flexible substrate to be processed and a winding shaft supporting the flexible substrate after processing, wherein the unwinding shaft and the winding shaft are disposed in the first chamber portion, a first wall separating the first chamber portion from the second chamber portion, wherein the first wall is inclined with respect to a vertical and horizontal orientation, a coating drum having a first portion disposed in the second chamber portion and a second portion disposed in the third chamber portion, and a plurality of processing stations disposed at least partially in the third chamber portion, wherein a majority of the plurality of the processing stations are disposed below a rotational axis of the coating drum.

First claim

Opening claim text (preview).

The invention claimed is: 1. An apparatus for processing a flexible substrate, comprising: a vacuum chamber having a first chamber portion, a second chamber portion and a third chamber portion, the first chamber portion and second chamber portion being separated by a wall inclined at an angle relative to a vertical orientation, wherein the angle is at least 20 degrees; an unwinding shaft for supporting the flexible substrate to be processed and a winding shaft for supporting the flexible substrate after processing, wherein the unwinding shaft and the winding shaft are disposed in the first chamber portion; a first gap sluice separating the first chamber portion from the second chamber portion at a first position, the first gap sluice configured to open and close to provide a first vacuum seal between the first chamber portion and the second chamber portion at the first position; a second gap sluice separating the first chamber portion from the second chamber portion at a second position, the second gap sluice configured to open and close to provide a second vacuum seal between the first chamber portion and the second chamber portion at the second position, wherein the first position is spaced apart from the second position in a vertical and horizontal direction; a coating drum having a first portion disposed in the second chamber portion and a second portion disposed in the third chamber portion, the coating drum having a rotational axis; and a plurality of processing stations disposed at least partially in the third chamber portion, wherein a majority of the plurality of the processing stations are disposed below the rotational axis of the coating drum. 2. The apparatus of claim 1 , wherein the first gap sluice is offset from the second gap sluice by about 20° and about 70° with respect to a vertical orientation. 3. The apparatus of claim 1 , wherein the rotational axis of the coating drum is disposed below a rotational axis of the unwinding shaft and a rotational axis of the winding shaft. 4. The apparatus of claim 1 , wherein each processing station comprises a deposition source, and each processing station is disposed at a vertical location of the rotational axis of the coating drum or below the rotational axis of the coating drum. 5. The apparatus of claim 1 , wherein the first gap sluice is configured to close on the flexible substrate to create the first vacuum seal. 6. The apparatus of claim 1 , wherein a majority of the second portion of the coating drum is located below the rotational axis of the coating drum. 7. The apparatus of claim 6 , wherein at least some of the second portion of the coating drum is located above the rotational axis of the coating drum.

Assignees

Inventors

Classifications

  • using internal electrodes · CPC title

  • for coating elongated substrates · CPC title

  • Inert gas curtains · CPC title

  • characterised by the method of coating (C23C16/04 takes precedence) · CPC title

  • characterised by sealing means · CPC title

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Frequently asked questions

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What does patent US10689760B2 cover?
An apparatus for processing a flexible substrate is provided including a vacuum chamber having a first chamber portion, second chamber portion and third chamber portion. The apparatus further includes an unwinding shaft supporting the flexible substrate to be processed and a winding shaft supporting the flexible substrate after processing, wherein the unwinding shaft and the winding shaft are d…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification C23C16/545. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 23 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).