Method and system for graphene formation

Patent metadata

Field	Value
Publication number	US-9150418-B2
Application number	US-201313774188-A
Country	US
Kind code	B2
Filing date	Feb 22, 2013
Priority date	Feb 24, 2012
Publication date	Oct 6, 2015
Grant date	Oct 6, 2015

Abstract

A method for forming graphene includes providing a substrate and subjecting the substrate to a reduced pressure environment. The method also includes providing a carrier gas and a carbon source and exposing at least a portion of the substrate to the carrier gas and the carbon source. The method further includes performing a surface treatment process on the at least a portion of the substrate and converting a portion of the carbon source to graphene disposed on the at least a portion of the substrate.

First claim

What is claimed is:

1. A method of forming a film of graphene, the method comprising:
placing a substrate on a holder in a processing chamber at a reduced pressure, wherein the processing chamber includes at least one atmospheric gas;
performing a room temperature surface treatment process on at least a portion of the substrate;
providing a carbon containing material in the processing chamber;
exposing the substrate to the carbon containing material; and
converting, at roo…

Assignees

• California Inst Of Techn

Inventors

• Boyd David A

Classifications

• H10P70/12

  Electricity · mapped topic

• H10P14/3602

  Electricity · mapped topic

• H10P14/3406

  Electricity · mapped topic

• H10P14/2923

  Electricity · mapped topic

• H10P14/24

  Electricity · mapped topic